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You searched on: Topic Area: Characterization, Nanometrology, and Nanoscale Measurements

Displaying records 41 to 50 of 126 records.
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41. Use of TSOM for sub-11 nm node pattern defect detection and HAR features
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/30/2013
Authors: Ravikiran Attota, Abraham Arceo, Bunday Benjamin
Abstract: In-line metrologies currently used in the semiconductor industry are being challenged by the aggressive pace of device scaling and the adoption of novel device architectures. In defect inspection, conventional bright field techniques will not likely ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913698

42. Enhancing 9 nm Node Dense Patterned Defect Optical Inspection using Polarization, Angle, and Focus
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/10/2013
Authors: Bryan M Barnes, Francois R. Goasmat, Martin Y Sohn, Hui Zhou, Abraham Arceo
Abstract: To measure the new SEMATECH 9 nm node Intentional Defect Array (IDA) and subsequent small, complex defects, a methodology has been used to exploit the rich information content generated when simulating or acquiring several images of sub-wavelength-si ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913542

43. Intercomparison between optical and x-ray scatterometry measurements of FinFET structures
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/8/2013
Authors: Paul Lemaillet, Thomas Avery Germer, Regis J Kline, Daniel Franklin Sunday, Chengqing C. Wang, Wen-Li Wu
Abstract: In this paper, we present a comparison of profile measurements of vertical field effect transistor (FinFET) fin arrays by optical critical dimension (OCD) metrology and critical dimension small angle X-ray scattering (CD-SAXS) metrology. Spectroscopi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913230

44. Robust Elemental Mapping of Nanostructures at Ultrahigh Resolution using Event-Streamed Spectrum Imaging in an Aberration-Corrected Analytical Electron Microscope
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/1/2013
Authors: Andrew A Herzing, Ian M. Anderson
Abstract: We detail the application of X-ray energy dispersive spectroscopy (XEDS) event-streamed spectral imaging (ESSI) in an aberration-corrected analytical electron microscope (AEM) as a reliable method for the acquisition of ultra-high spatial resolution ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910229

45. Metrology For Organic Monolayers On Cobalt Surfaces
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/27/2013
Authors: Sujitra Jeanie Pookpanratana, Leigh Kent Lydecker, Hyuk-Jae Jang, Curt A Richter, Christina Ann Hacker
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912903

46. Quantitative Characterization and Applications of A 193 nm Scatterfield Microscope
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/25/2013
Authors: Martin Y Sohn, Bryan M Barnes, Richard M Silver
Abstract: With decreasing feature sizes in semiconductor manufacturing, there is an acute demand for measurements of both critical dimensions (CD) and defects on the nanometer scale that must also be non-destructive measurement and provide high throughput1. Sc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912991

47. Gold nanorod separation and characterization by asymmetric-flow field flow fractionation with UV-Vis detection
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 11/14/2012
Authors: Julien C. Gigault, Tae Joon Cho, Robert I. MacCuspie, Vincent A Hackley
Abstract: The application of asymmetrical-flow field flow fractionation (A4F) for gold nanorod (GNR) fractionation and characterization was comprehensively investigated. We report on two novel aspects of this application. The first addresses the analytical cha ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911860

48. Nanoscale Reference Materials for Environmental, Health, and Safety Measurements: Needs, Gaps, and Opportunities
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 11/7/2012
Authors: Aleksandr B. Stefaniak, Vincent A Hackley, Gert Roebben, Kensei Ehara, Steve Hankin, Michael T Postek, Iseult Lynch, Wei-En Fu, Thomas P.J. Linsinger, Andreas Th?nemann
Abstract: There is a need to understand and manage potential risks posed to workers, the public, and the environment from exposure to engineered nanomaterials. In response, several organizations have developed lists of relevant nano-objects and of physico-che ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910519

49. Quantifying Dithiothreitol Displacement of Functional Ligands from Gold Nanoparticles
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 10/27/2012
Authors: De-Hao D. Tsai, Frank W DelRio, Sherrie R. Elzey, Suvajyoti S. Guha, Michael Russel Zachariah, Vincent A Hackley, Melanie P Shelton
Abstract: Dithiothreitol (DTT)-based displacement is widely utilized for separating ligands from their gold nanoparticle (AuNP) conjugates, a critical step for differentiating and quantifying surface-bound functional ligands and therefore the effective surface ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911354

50. Temperature-dependent mechanical-resonance frequencies and damping in ensembles of gallium nitride nanowires
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 10/22/2012
Authors: Kristine A Bertness, Norman A Sanford, J. R. Montague, H.S. Park, Victor M. Bright, C. T. Rogers
Abstract: We have measured singly clamped cantilever mechanical-resonances in ensembles of as-grown gallium nitridenanowires (GaN NWs), from 12 K to 320 K. Resonance frequencies are approximately linearly dependent on temperature near 300 K ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910038



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