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You searched on: Topic Area: Nanomanufacturing

Displaying records 51 to 60 of 81 records.
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51. International photomask linewidth comparison by NIST and PTB
Topic: Nanomanufacturing
Published: 10/17/2008
Authors: James Edward Potzick, Ronald G Dixson, Richard Quintanilha, Michael T. Stocker, Andras Vladar, Egbert Buhr, Bernd Bodermann, Wolfgang Hassler-Grohne, Harald Bosse, C.G. Frase
Abstract: In preparation of the international Nano1 linewidth comparison on photomasks between 8 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to tes ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824713

52. Re-calibration of the NIST SRM 2059 Master Standard using Traceable Atomic Force Microscope Metrology
Topic: Nanomanufacturing
Published: 10/17/2008
Authors: Ronald G Dixson, James Edward Potzick, Ndubuisi George Orji
Abstract: The National Institute of Standards and Technology (NIST) has had a robust program in photomask dimensional metrology since the late 70s when the late Diana Nyyssonen and coworkers developed the first chrome-on-glass (COG) Standard Reference Materi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824724

53. Contactless Differential Conductivity Detection
Topic: Nanomanufacturing
Published: 10/12/2008
Authors: Gordon Allan Shaw, David J Ross, Steven Earl Fick, Wyatt N Vreeland
Abstract: We propose a new technique, contactless differential conductivity detection (CDCD,) to improve the detection limit of contactless conductivity detection for capillary and microchannel electrophoresis. By exploiting a 3-electrode differential configu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824689

54. Accuracy Considerations for Critical Dimension Semiconductor Metrology
Topic: Nanomanufacturing
Published: 9/9/2008
Authors: Ronald G Dixson, Ndubuisi George Orji, B Bunday, J Allgair
Abstract: As the size of integrated circuit features continues to decrease, the accuracy of measurements becomes more important. Due to greater emphasis on precision rather than accuracy, many of the measurements made in semiconductor fabs are not traceable to ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824699

55. Through-focus scanning optical microscope imaging method for nano-scale dimensional analysis
Topic: Nanomanufacturing
Published: 9/1/2008
Authors: Ravikiran Attota, Richard M Silver
Abstract: We present a novel optical technique that produces nanometer dimensional measurement sensitivity using a conventional bright-field optical microscope, by analyzing two-dimensional through-focus scanning optical microscope (TSOM) images constructed us ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824668

56. Cellulose Nanocrystals the Next Big Nano-thing?
Topic: Nanomanufacturing
Published: 8/6/2008
Authors: Michael T Postek, Andras Vladar, John A Dagata, Natalia Farkas, Bin Ming, Ronald Sabo, Theodore H Wegner
Abstract: Biomass surrounds us from the smallest alga to the largest redwood tree. Even the largest trees owe their strength to a newly-appreciated class of nanomaterials known as cellulose nanocrystals (CNC). Cellulose, the world s most abundant natural, rene ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824683

57. Metrology at the Nanoscale: What are the Grand Challenges?
Topic: Nanomanufacturing
Published: 8/6/2008
Authors: Kevin W Lyons, Michael T Postek
Abstract: Nanometrology provides the means to measure and characterize nanometer scale process and product performance and covers an expanse of topics including instrumentation, measurement methods (off-line and in-process applications), and standards. To meet ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824701

58. Simulated SEM Images for Resolution Measurement
Topic: Nanomanufacturing
Published: 7/30/2008
Authors: Petr Cizmar, Andras Vladar, Bin Ming, Michael T Postek
Abstract: Resolution is a key performance metric, which often defines the quality of a scanning electron microscope (SEM). Traditionally, there is the subjective measurement of the distance between two points on special ''resolution'' samples and there are sev ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823050

59. High resolution full-field imaging of nanostructures using compact extreme ultraviolet lasers
Topic: Nanomanufacturing
Published: 7/21/2008
Authors: Norman A Sanford, F Brizuela, Kristine A Bertness
Abstract: Recent advances in the development of high peak brightness table-top extreme ultraviolet (EUV) and soft x-ray (SRX) lasers have opened new opportunities for the demonstration of compact full-field EUV/SXR microscopes capable of capturing images with ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908697

60. Reducing Thermal Noise in Molecular Force Spectroscopy
Topic: Nanomanufacturing
Published: 6/2/2008
Author: Gordon Allan Shaw
Abstract: Molecular force spectroscopy is the practice of testing the mechanical properties of single molecules.  The precision determination of these properties requires an instrument capable of piconewton-level force measurement.  The atomic force ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824638



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