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You searched on: Topic Area: Metrology

Displaying records 821 to 830 of 856 records.
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821. A New Workshop Summary Report: Industrial Applications of Scanned Probe Microscopy
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 5550
Topic: Metrology
Published: 1/1/1994
Authors: John A Dagata, A Diebold, C Shih, R Colton
Abstract: An Industrial Applications of Scanned Probe Microscopy (SPM) workshop was held at NIST Gaithersburg on March 24-25 1994. The meeting, co-sponsored by NIST, SEMATECH, ASTM E42.14, and the American Vacuum Society, was attended by over one hundred SPM u ...

822. A Novel CMM Interim Testing Artifact
Topic: Metrology
Published: 1/1/1994
Authors: Steven David Phillips, Bruce R. Borchardt, Gregory W Caskey, David E Ward, Bryon S. Faust, Daniel S Sawyer
Abstract: NIST is currently developing equipment and techniques to rapidly access the performance of Coordinate Measuring machines (CMMs). This will allow the frequent testing of CMMs to insure that they measure parts accurately. A novel interim testing artifa ...

823. A Study of the Surface Texture of Polycrystalline Phosphor Films Using AFM
Topic: Metrology
Published: 1/1/1994
Authors: Zsolt Revay, J Schneir, D Brower, John S Villarrubia, Joseph Fu, et al
Abstract: Stimulable phosphor thin films are being investigated for use as optical data storage media. We have successfully applied atomic force microscopy (AFM) to the measurement of the surface texture of these films. Determination of the surface texture of ...

824. Critical Issues in Scanning Electron Microscope Metrology
Topic: Metrology
Published: 1/1/1994
Author: Michael T Postek
Abstract: During the manufacturing of present-day integrated circuits, certain measurements must be made of the submicrometer structures composing the device with a high degree of repeatability. Optical microscopy, scanning electron microscopy, and the various ...

825. Electron Beam Interaction Modeling as Applied to X-Ray Lithography Mask SEM Linewidth Metrology
Topic: Metrology
Published: 1/1/1994
Authors: Michael T Postek, J R. Lowney, Andras Vladar, William J. Keery, Egon Marx, Robert D. Larrabee
Abstract: This work provides an approach to improved x?ray mask linewidth metrology and a more precise edge location algorithm for measurement of feature sizes on x?ray masks in commercial instrumentation. The transmitted electron detection mode is also useful ...

826. Force Calibrations in the Nanonewton Regime
Topic: Metrology
Published: 1/1/1994
Authors: Lowell P. Howard, E Clayton Teague
Abstract: An instrument is described which is shown capable of making preliminary measurements of nanonewton forces. A technique is described which allows absolute calibrations of small forces to be made in terms of electrical measurements.

827. Hertzian Contact Resonances
Topic: Metrology
Published: 1/1/1994
Authors: John A Kramar, T Mcwaid, J Schneir, E Clayton Teague
Abstract: The resonant frequency of a sphere in contact with a flat surface was measured as a function of loading force for contacting materials with different elastic moduli. Comparisons were made with predictions based on the Hertzian theory of elastic defor ...

828. In Situ Tip Characterization for AFM and Application to Linewidth Metrology
Topic: Metrology
Published: 1/1/1994
Authors: Ronald G Dixson, J Schneir, T Mcwaid, Theodore Vincent Vorburger
Abstract: Abstract not available.

829. Methods Divergence Between Measurements of Micrometer and Sub-Micrometer Surface Features
Topic: Metrology
Published: 1/1/1994
Authors: T Mcwaid, Theodore Vincent Vorburger, Joseph Fu, Jun-Feng Song, Eric Paul Whitenton
Abstract: Measurements of micrometer and sub-micrometer surface features have been made using a stylus profiler, an STM, an AFM, and a phase-measuring interferometric microscope. The differences between measurements of the same surface feature as obtained with ...

830. Microform Calibrations in Surface Metrology
Topic: Metrology
Published: 1/1/1994
Authors: Jun-Feng Song, F Rudder, Theodore Vincent Vorburger, A Hartman, Brian R Scace, J Smith
Abstract: Microform calibrations include the measurement of complex profile forms and position errors of micrometer scale in combination with the measurement of deviations from a specified profile and surface texture of profile segments. Tolerances on the prof ...

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