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Author: thomas lucatorto
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Displaying records 21 to 30 of 109 records.
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21. Development of an EUVL collector with infrared radiation suppression
Published: 8/1/2014
Authors: Steven E Grantham, Mike Kriese, Yuriy Platonov, Bodo Ehlers, Licai Jiang, Jim Rodriguez, Mueller Ulrich, Shayna khatri, Adam Magruder, Charles S Tarrio, Thomas B Lucatorto
Abstract: Laser-produced plasma (LPP) sources for extreme ultraviolet lithography (EUVL) systems utilize CO2 lasers operating with wavelength 10.6μm. Since multilayer-coated optics have high reflectivity for this infrared radiation (IR), a significant and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915696

22. Dopler-free RIS of the He 1s^u2^ → 1s2s ^u1^S Transition at 120.3 nm, ed. by N. Winograd and J.E. Parks
Published: 1/1/1997
Authors: S D Bergeson, A Balakrishnan, K G Baldwin, Thomas B Lucatorto, J P Marangos, T J McIlrath, Thomas R. O'Brian, S L. Rolston, N Vansteenkiste
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104322

23. Doppler-Free Two-Photon Spectroscopy in the VUV: The Helium 1^u1^S - 2^u1^S Transition
Published: 9/1/2000
Authors: S D Bergeson, K G Baldwin, Thomas B Lucatorto, T J McIlrath, C H Cheng, E E Eyler
Abstract: We describe techniques for laser spectroscopy in the vacuum ultraviolet (VUV) spectral region that combine high spectral resolution with high absolute accuracy. A nearly transform-limited nanosecond laser source at 120 nm is constructed using differ ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841409

24. Doppler-free RIS of the He 1s2 1s - 1s2s 1S Transition at 120.4 nm,
Published: 1/1/1996
Authors: S D Bergeson, A Balakrishnan, K G Baldwin, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101815

25. Doppler-free two-photon spectroscopy in the vacuum ultraviolet: helium 1 1S 2 1S transition
Published: 1/1/2000
Authors: S D Bergeson, K G Baldwin, Thomas B Lucatorto, T J McIlrath, C H Cheng, E E Eyler
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101442

26. EUV component and system characterization at NIST for the support of extreme-ultraviolet lithography, ed. by R.S. Mackay
Published: 5/13/2005
Authors: S Grantham, Shannon Bradley Hill, Charles S Tarrio, Robert Edward Vest, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100159

27. EUV testing of multilayer mirrors: critical issues
Published: 1/1/2006
Authors: Shannon Bradley Hill, I Ermanoski, Steven E Grantham, Charles S Tarrio, Thomas B Lucatorto, T. E Madey, S Bajt, M Chandhok, P Yan, Obert Wood, S Wurm, N V Edwards
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101847

28. EUV-Driven Carbonaceous Film Deposition and Its Photo-oxidation on a TiO2 Film Surface
Published: 9/23/2013
Authors: Nadir S. Faradzhev, Monica McEntee, John Yate, Shannon Bradley Hill, Thomas B Lucatorto
Abstract: We report the photo-deposition of a carbonaceous layer grown on a TiO2 thin film by EUV radiation-induced chemistry of adsorbed n-tetradecane and the subsequent photo-oxidation of this film. It is found by chemical analysis of the C layer that irradi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913704

29. EUVL dosimetry at NIST
Published: 3/13/2009
Authors: Charles S Tarrio, Steven E Grantham, Marc J Cangemi, Robert Edward Vest, Thomas B Lucatorto, Noreen Harned
Abstract: As part of its role in providing radiometric standards in support of industry, NIST has been active in advancing extreme ultraviolet dosimetry on various fronts. Recently, we undertook a major effort in accurately measuring the sensitivity of three ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901663

30. Effect of Xenon Bombardment on Ruthenium-Coated Grazing Incidence Collector Mirror Lifetime for EUV Lithography
Published: Date unknown
Authors: M Nieto, J P Allain, V Titov, M R Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles S Tarrio, Yaniv Barad, Steven E Grantham, Thomas B Lucatorto, Bryan Rice
Abstract: The effect of energetic Xenon ion bombardment on the extreme ultraviolet (EUV) reflectivity performance of mirrors is of vital importance for the performance of discharge- and laser-produced plasma extreme ultraviolet lithography (EUVL) sources. To s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840246



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