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Displaying records 21 to 30 of 111 records.
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21. Development and evaluation of interface-stabilized and reactive-sputtered oxide-capped multilayers for EUV lithography
Published: 3/16/2015
Authors: Michael Kriese, Jim Rodriguez, Gary Fournier, Steven E Grantham, Shannon Bradley Hill, John J Curry, Thomas B Lucatorto, Charles S Tarrio, Yuriy Platonov
Abstract: A critical component of high-performance EUV lithography source optics is the reflecting multilayer coating. The ideal multilayer will have both high reflectance and high stability to thermal load. Additionally the capping layers must provide resis ...

22. Development of an EUVL collector with infrared radiation suppression
Published: 8/1/2014
Authors: Steven E Grantham, Mike Kriese, Yuriy Platonov, Bodo Ehlers, Licai Jiang, Jim Rodriguez, Mueller Ulrich, Shayna khatri, Adam Magruder, Charles S Tarrio, Thomas B Lucatorto
Abstract: Laser-produced plasma (LPP) sources for extreme ultraviolet lithography (EUVL) systems utilize CO2 lasers operating with wavelength 10.6μm. Since multilayer-coated optics have high reflectivity for this infrared radiation (IR), a significant and ...

23. Dopler-free RIS of the He 1s^u2^ → 1s2s ^u1^S Transition at 120.3 nm, ed. by N. Winograd and J.E. Parks
Published: 1/1/1997
Authors: S D Bergeson, A Balakrishnan, K G Baldwin, Thomas B Lucatorto, J P Marangos, T J McIlrath, Thomas R. O'Brian, S L. Rolston, N Vansteenkiste

24. Doppler-Free Two-Photon Spectroscopy in the VUV: The Helium 1^u1^S - 2^u1^S Transition
Published: 9/1/2000
Authors: S D Bergeson, K G Baldwin, Thomas B Lucatorto, T J McIlrath, C H Cheng, E E Eyler
Abstract: We describe techniques for laser spectroscopy in the vacuum ultraviolet (VUV) spectral region that combine high spectral resolution with high absolute accuracy. A nearly transform-limited nanosecond laser source at 120 nm is constructed using differ ...

25. Doppler-free RIS of the He 1s2 1s - 1s2s 1S Transition at 120.4 nm,
Published: 1/1/1996
Authors: S D Bergeson, A Balakrishnan, K G Baldwin, Thomas B Lucatorto

26. Doppler-free two-photon spectroscopy in the vacuum ultraviolet: helium 1 1S 2 1S transition
Published: 1/1/2000
Authors: S D Bergeson, K G Baldwin, Thomas B Lucatorto, T J McIlrath, C H Cheng, E E Eyler

27. EUV component and system characterization at NIST for the support of extreme-ultraviolet lithography, ed. by R.S. Mackay
Published: 5/13/2005
Authors: S Grantham, Shannon Bradley Hill, Charles S Tarrio, Robert Edward Vest, Thomas B Lucatorto

28. EUV testing of multilayer mirrors: critical issues
Published: 1/1/2006
Authors: Shannon Bradley Hill, I Ermanoski, Steven E Grantham, Charles S Tarrio, Thomas B Lucatorto, T. E Madey, S Bajt, M Chandhok, P Yan, Obert Wood, S Wurm, N V Edwards

29. EUV-Driven Carbonaceous Film Deposition and Its Photo-oxidation on a TiO2 Film Surface
Published: 9/23/2013
Authors: Nadir S. Faradzhev, Monica McEntee, John Yate, Shannon Bradley Hill, Thomas B Lucatorto
Abstract: We report the photo-deposition of a carbonaceous layer grown on a TiO2 thin film by EUV radiation-induced chemistry of adsorbed n-tetradecane and the subsequent photo-oxidation of this film. It is found by chemical analysis of the C layer that irradi ...

30. EUVL dosimetry at NIST
Published: 3/13/2009
Authors: Charles S Tarrio, Steven E Grantham, Marc J Cangemi, Robert Edward Vest, Thomas B Lucatorto, Noreen Harned
Abstract: As part of its role in providing radiometric standards in support of industry, NIST has been active in advancing extreme ultraviolet dosimetry on various fronts. Recently, we undertook a major effort in accurately measuring the sensitivity of three ...

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