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You searched on: Author: john villarrubia

Displaying records 61 to 70 of 90 records.
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61. Final Report: 1998-1999 NIST/SEMATECH Project on Intercomparison of Linewidth Measurement Methods
Published: 1/1/2000
Authors: John S Villarrubia, Ronald G Dixson, Samuel N Jones, J R. Lowney, Michael T Postek
Abstract: Abstract unavailable.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820988

62. Nanoindentation of Polymers: Tip Shape Calibration and Uncertainty Issues
Published: 1/1/2000
Authors: Mark R VanLandingham, John S Villarrubia, G Meyers
Abstract: Indentation measurements made with atomic force microscopy (AFM) probes are relative measurements, largely due to the lack of information regarding the tip shape of the AFM probes. Also, current tip shape calibration procedures used in depth-sensing ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820984

63. Recent Progress in Nanoscale Indentation of Polymers Using the AFM
Published: 1/1/2000
Authors: Mark R VanLandingham, John S Villarrubia, G Meyers
Abstract: Regardless of the type of test, reliable indentation measurements require knowledge of the shape of the indenter tip. For indentation measurements involving sub-micrometer scale contacts, accurate knowledge of the tip shape can be difficult to achiev ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820985

64. Grating Pitch Measurements With the Molecular Measuring Machine
Published: 11/1/1999
Authors: John A Kramar, Jay Shi Jun, William B. Penzes, Fredric Scire, E Clayton Teague, John S Villarrubia
Abstract: At the National Institute of Standards and Technology, we are building a metrology instrument called the Molecular Measuring Machine (M^3) with the goal of performing nanometer- accuracy two-dimensional feature placement measurements over a 50 mm by ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820932

65. Intercomparison of SEM, AFM, and Electrical Linewidths
Published: 9/1/1999
Authors: John S Villarrubia, R. Dixon, S. Jones, J R. Lowney, Michael T Postek, Richard A Allen, Michael W Cresswell
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=22631

66. Intercomparison of SEM, AFM, and Electrical Linewidths
Published: 6/1/1999
Authors: John S Villarrubia, Ronald G Dixson, Samuel N Jones, J R. Lowney, Michael T Postek, Richard A Allen, Michael W Cresswell
Abstract: Uncertainty in the locations of line edges dominates the uncertainty budget for high quality sub-micrometer linewidth measurements. For microscopic techniques like scanning electron microscopy (SEM) and atomic force microscopy (AFM), the image of the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820954

67. Toward Nanometer Accuracy Measurements
Published: 6/1/1999
Authors: John A Kramar, E Amatucci, David E. Gilsinn, Jay Shi Jun, William B. Penzes, Fredric Scire, E Clayton Teague, John S Villarrubia
Abstract: We at NIST are building a metrology instrument called the Molecular Measuring Machine (MMM) with the goal of performing 2D point-to-point measurements with one nanometer accuracy cover a 50 mm by 50 mm area. The instrument combines a scanning tunneli ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820933

68. A Strategy for Faster Blind Reconstruction of Tip Geometry for Scanned Probe Microscopy
Published: 3/1/1999
Author: John S Villarrubia
Abstract: In scanned probe microscopy, it is necessary to know the tip's geometry in order to correct image distortions due to its finite size. Heretofore, methods have focused upon determining the tip geometry by erosion of a tip characterizer of known geomet ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822529

69. Tip Characterization for Dimensional Nanometrology
Published: 1/1/1999
Author: John S Villarrubia
Abstract: Technological trends are increasingly requiring dimensional metrology at size scales below a micrometer. Scanning probe microscopy has unique advantages in this size regime, but width and roughness measurements must be corrected for imaging artifacts ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822459

70. Developing a Method to Determine Linewidth Based on Counting the Atom-Spacings Across a Line
Published: 6/1/1998
Authors: Richard M Silver, Carsten P. Jensen, V W. Tsai, Joseph Fu, John S Villarrubia, E Clayton Teague
Abstract: We are developing the instrumentation and prototype samples at NIST to enable the counting of atom-spacings across linewidth features etched in silicon. This is an effort to allow the accurate counting of atom-spacings across a feature in a controlle ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820909



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