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You searched on: Author: michael postek

Displaying records 21 to 30 of 232 records.
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21. Real-Time Image Composition with Correction of Drift Distortion
Published: 9/20/2011
Authors: Petr Cizmar, Andras Vladar, Michael T Postek
Abstract: In this article, a new scanning electron microscopy (SEM) image composition technique is de- scribed, which can significantly reduce drift-distortion related image corruptions. Drift-distortion commonly causes blur and distortions in the SEM ima ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903741

22. Development of the Metrology and Imaging of Cellulose Nanocrystals
Published: 9/19/2011
Authors: Michael T Postek, Andras Vladar, John A Dagata, Natalia Farkas, Bin Ming, Ryan Wagner, Arvind Raman, Robert J Moon, Ronald Sabo, Theodore H Wegner, James Beecher
Abstract: The development of metrology for nanoparticles is a significant challenge. Cellulose nanocrystals (CNC) are one group of nanoparticles that have high potential economic value but present substantial challenges to the development of the measurement ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905543

23. Review of Current Progress in Nanometrology with Helium Ions
Published: 9/19/2011
Authors: Michael T Postek, Andras Vladar, Bin Ming, Charles Archie
Abstract: Scanning electron microscopy has been employed as an imaging and measurement tool for more than 50 years and it continues as a primary tool in many research and manufacturing facilities across the world. A new challenger to this work is the helium ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905541

24. Accurate Nanometer-Scale Imaging and Measurements with SEM
Published: 8/18/2011
Authors: Bradley N Damazo, Bin Ming, Premsagar Purushotham Kavuri, Andras Vladar, Michael T Postek
Abstract: Scanning electron microscopes (SEMs) are incredibly versatile instruments for millimeter to nanometer scale imaging and measurements of size and shape. New methods to improve repeatability and accuracy have been implemented on the so-called Referenc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909147

25. Modeling for Accurate Dimensional Scanning Electron Microscope Metrology: Then and Now
Published: 7/20/2011
Authors: Michael T Postek, Andras Vladar
Abstract: A review of the evolution of modeling for accurate dimensional scanning electron microscopy is presented with an emphasis on developments in the Monte Carlo technique for SEM dimensional metrology. The progress of modeling for accurate metrology is d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908153

26. Advanced Image Composition with Intra-Frame Drift Correction
Published: 7/19/2011
Authors: Petr Cizmar, Andras Vladar, Michael T Postek
Abstract: Drift Corrected Image Composition (DCIC) is a real-time technique that allows for acquiring significantly more accurate images compare to traditional slow or fast imaging methods.[Ref.] It is especially useful in nanometer-scale imaging and metrolog ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908494

27. New Research in Nanotechnology - Nanotechnology Science and Technology Series
Published: 2/19/2011
Authors: Michael T Postek, Joseph J Kopanski, David A Wollman
Abstract: NIST is developing a broad range of nanometrology (measurements) and nanomanufacturing techniques necessary for the successful commercialization of nanotechnology. This book is a compilation of a number of selected NIST accomplishments in nanotechn ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912261

28. Advances in Modeling of Scanning Charged-Particle-Microscopy Images
Published: 9/19/2010
Authors: Petr Cizmar, Andras Vladar, Michael T Postek
Abstract: Modeling scanning electron microscope (SEM) and scanning ion microscope images has recently become necessary, because of its ability to provide repeatable images with a priori determined parameters. Modeled artificial images have been used in eva ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905723

29. Proceedings of the ASME 2009 International Manufacturing Science and Engineering Conference
Published: 9/19/2010
Authors: Toshiyuki Obikawa, Michael T Postek, David Dornfeld, C. Richard Liu, Ranga Komanduri, Jing Shi, Yuebin Guo, Jian Cao, Jack Zhou, Xiaoping Yang, Xiaochun Li
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904293

30. NEW Scanning Electron Microscope Magnification Calibration Reference Material (RM) 8820
Published: 8/19/2010
Authors: Michael T Postek, Andras Vladar, William J. Keery, Michael Bishop, Benjamin Bunday, John Allgair
Abstract: Reference Material 8820 (RM 8820) is a new scanning electron microscope calibration reference material for nanotechnology and nanomanufacturingtion recently released by NIST. This standard was developed to be used primarily for X and Y scale (or magn ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905372



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