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Author: michael postek

Displaying records 21 to 30 of 226 records.
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21. New Research in Nanotechnology - Nanotechnology Science and Technology Series
Published: 2/19/2011
Authors: Michael T Postek, Joseph J Kopanski, David A Wollman
Abstract: NIST is developing a broad range of nanometrology (measurements) and nanomanufacturing techniques necessary for the successful commercialization of nanotechnology. This book is a compilation of a number of selected NIST accomplishments in nanotechn ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912261

22. Advances in Modeling of Scanning Charged-Particle-Microscopy Images
Published: 9/19/2010
Authors: Petr Cizmar, Andras Vladar, Michael T Postek
Abstract: Modeling scanning electron microscope (SEM) and scanning ion microscope images has recently become necessary, because of its ability to provide repeatable images with a priori determined parameters. Modeled artificial images have been used in eva ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905723

23. Proceedings of the ASME 2009 International Manufacturing Science and Engineering Conference
Published: 9/19/2010
Authors: Toshiyuki Obikawa, Michael T Postek, David Dornfeld, C. Richard Liu, Ranga Komanduri, Jing Shi, Yuebin Guo, Jian Cao, Jack Zhou, Xiaoping Yang, Xiaochun Li
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904293

24. NEW Scanning Electron Microscope Magnification Calibration Reference Material (RM) 8820
Published: 8/19/2010
Authors: Michael T Postek, Andras Vladar, William J. Keery, Michael Bishop, Benjamin Bunday, John Allgair
Abstract: Reference Material 8820 (RM 8820) is a new scanning electron microscope calibration reference material for nanotechnology and nanomanufacturingtion recently released by NIST. This standard was developed to be used primarily for X and Y scale (or magn ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905372

25. Reference Material (RM) 8820: A Versatile New NIST Standard for Nanometrology
Published: 7/19/2010
Authors: Michael T Postek, Andras Vladar, William J. Keery, Michael R Bishop, Benjamin Bunday, John Allgair
Abstract: A new multipurpose instrument calibration standard has been released by NIST. This standard was developed to be used primarily for X and Y scale (or magnifi cation) calibrations of scanning electron microscopes from less than 10 times magnification t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905034

26. Precision Engineering Division 2009 Program Technical Accomplishments
Series: OTHER
Published: 2/19/2010
Author: Michael T Postek
Abstract: The Precision Engineering Division (PED) is one of five divisions of the Manufacturing Engineering Laboratory (MEL)at the National Institute of Standards and Technology (NIST). PED provides the United States with the foundation for dimensional measur ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904811

27. Sample Preparation Protocols for Realization of Reproducible Characterization of Single-walled Carbon Nanotubes
Published: 12/1/2009
Authors: Angela R Hight Walker, Jeffrey A Fagan, Stephanie A Hooker, Michael T Postek, Stephen A Wise, Andras Vladar, Rolf Louis Zeisler
Abstract: Harmonized sample pre-treatment is an integral first step in ensuring metrological quality of measurements as regards repeatability, inter-laboratory reproducibility and commutability. The development of standard preparation methods for SWCNT sample ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901229

28. Nanometrology Solutions Using an Ultra-High Resolution In-lens SEM
Published: 9/1/2009
Authors: Michael T Postek, Andras Vladar, John S Villarrubia
Abstract: The imaging and measurement of nanostructures such as particles, carbon nanotubes, and quantum dots have placed new demands on the high resolution imaging capabilities of scanning electron microscopes. A barrier to accurate dimensional metrology is t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902308

29. Recent Progress in Understanding the Imaging and Metrology using the Helium Ion Microscope
Published: 9/1/2009
Authors: Michael T Postek, Andras Vladar, Bin Ming
Abstract: Nanotechnology is pushing imaging and measurement instrument technology to high levels of required performance. As this continues, new barriers confronting innovation in this field are encountered. Particle beam instrument resolution remains one of t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902762

30. A Decade of Commitment from the NIST Manufacturing Engineering Laboratory to Nanomanufacturing and Nanometrology
Published: 8/27/2009
Authors: Kevin W Lyons, Michael T Postek
Abstract: Advanced research in nanomanufacturing technologies and processes has continued at an accelerating rate over the past decade. Profitable niche applications such as the use of carbon nanotubes for improving battery performance and nanoparticle-enhance ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902648



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