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Author: michael postek

Displaying records 21 to 30 of 217 records.
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21. A Decade of Commitment from the NIST Manufacturing Engineering Laboratory to Nanomanufacturing and Nanometrology
Published: 8/27/2009
Authors: Kevin W Lyons, Michael T Postek
Abstract: Advanced research in nanomanufacturing technologies and processes has continued at an accelerating rate over the past decade. Profitable niche applications such as the use of carbon nanotubes for improving battery performance and nanoparticle-enhance ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902648

22. Optimization of Accurate SEM Imaging by Use of Artificial Images
Published: 5/22/2009
Authors: Petr Cizmar, Andras Vladar, Michael T Postek
Abstract: Today the vast majority of the scanning electron microscopes (SEMs) are incapable of taking repeatable and accurate images at high magnifications. Geometric distortions are common, so are drift, vibration, and problems related to disturbing electro-m ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902635

23. Instrumentation, Metrology, and Standards, Three Keys to the Nanotech Kingdom
Published: 5/1/2009
Authors: Michael T Postek, Kevin W Lyons
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824732

24. On the Sub-Nanometer Resolution of Scanning Electron and Helium Ion Microscopes
Published: 3/1/2009
Authors: Andras Vladar, Michael T Postek, Bin Ming
Abstract: All forms of microscopy are being pushed to the limit by nanotechnology. Hence, there is a relentless quest to achieve better and better resolution with various electron and ion microscopes and to monitor and maintain these instruments to achieve the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901833

25. On the Sub-Nanometer Resolution of Scanning Electron and Scanning Helium Ion Microscopes
Published: 3/1/2009
Authors: Michael T Postek, Andras Vladar, Bin Ming
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901569

26. Understanding Imaging and Metrology with the Helium Ion Microscope
Published: 3/1/2009
Authors: Michael T Postek, Andras Vladar, Bin Ming
Abstract: The development of accurate metrology for the characterization of nanomaterials is one barrier to innovation confronting all phases of nanotechnology. Ultra-high resolution microscopy is a key technology needed to achieve this goal. But, current micr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902394

27. 2nd Annual Tri-National Workshop on Standards for Nanotechnology - (NIST presentations)
Published: 12/10/2008
Authors: Ronald G Dixson, Jon Robert Pratt, Vincent A Hackley, James Edward Potzick, Richard A Allen, Ndubuisi George Orji, Michael T Postek, Herbert S Bennett, Theodore Vincent Vorburger, Jeffrey A Fagan, Robert L. Watters
Abstract: A new era of cooperation between North American National Measurement Institutes (NMIs) was ushered by the National Research Council of Canada Institute for National Measurement Standards (NRC-INMS) on February 7, 2007 when the first Tri-National wo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824641

28. Helium Ion Microscopy and its Application to Nanotechnology and Nanometrology
Published: 11/4/2008
Authors: Michael T Postek, Andras Vladar
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824682

29. Cellulose Nanocrystals the Next Big Nano-thing?
Published: 8/6/2008
Authors: Michael T Postek, Andras Vladar, John A. Dagata, Natalia Farkas, Bin Ming, Ronald Sabo, Theodore H Wegner
Abstract: Biomass surrounds us from the smallest alga to the largest redwood tree. Even the largest trees owe their strength to a newly-appreciated class of nanomaterials known as cellulose nanocrystals (CNC). Cellulose, the world s most abundant natural, rene ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824683

30. Metrology at the Nanoscale: What are the Grand Challenges?
Published: 8/6/2008
Authors: Kevin W Lyons, Michael T Postek
Abstract: Nanometrology provides the means to measure and characterize nanometer scale process and product performance and covers an expanse of topics including instrumentation, measurement methods (off-line and in-process applications), and standards. To meet ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824701