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Author: william penzes
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1. A New Method to Measure the Distance Between Graduation Lines on Graduate Scales
Published: 12/1/2000
Authors: William B. Penzes, Richard A Allen, Michael W Cresswell, Loren W. Linholm, E Clayton Teague
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=8085

2. A New Method to Measure the Distance Between Graduation Lines on Graduate Scales
Published: 12/1/1999
Authors: William B. Penzes, Richard A Allen, Michael W Cresswell, Loren W. Linholm, E Clayton Teague
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=30330

3. A New Method to Measure the Distance Between Graduation Lines on Graduated Scales
Published: 12/31/1994
Authors: William B. Penzes, Richard A Allen, Michael W Cresswell, E Clayton Teague
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=28768

4. A New Method to Measure the Distance Between Graduation Lines on Graduated Scales
Published: 1/1/1994
Authors: William B. Penzes, Robert Allen, Michael W Cresswell, L Linholm, E Clayton Teague
Abstract: Line scales are used throughout industry for a variety of applications. The most common is the stage micrometer, a small graduated glass scale for the calibration of optical instruments such as microscopes. However, stage micrometers are generally no ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820698

5. A New Method to Measure the Distance Between Graduation Lines on Graduated Scales
Published: 12/1/1999
Authors: William B. Penzes, Robert Allen, Michael W Cresswell, L Linholm, E Clayton Teague
Abstract: Line scales are used throughout industry for a variety of applications. The most common is the stage micrometer, a small graduated glass scale for the calibration of optical instruments such as microscopes. However, stage micrometers are generally no ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820939

6. Electrical Test Structure for Overlay Metrology Referenced to Absolute Length Standards
Published: 12/31/1994
Authors: Michael W Cresswell, William B. Penzes, Richard A Allen, Loren W. Linholm, Colleen E. Hood, E Clayton Teague
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=27496

7. Electrical Test Structure for Overlay Metrology Referenced to Absolute Length Standards
Published: 5/1/1994
Authors: Michael W Cresswell, William B. Penzes, Robert Allen, L Linholm, C Ellenwood, E Clayton Teague
Abstract: This test structure is based on the voltage-dividing potentiometer principle and was originally replicated in a single lithography cycle to evaluate feature placement by a primary pattern generator. A new test structure has now been developed from th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820676

8. Electronic Limitations in Phase Meters for Heterodyne Interferometry
Published: 10/1/1991
Authors: Nile M. Oldham, P. S. Hetrick, John A Kramar, William B. Penzes, T. Wheatley, E Clayton Teague
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=22839

9. Grating Pitch Measurements With the Molecular Measuring Machine
Published: 11/1/1999
Authors: John A Kramar, Jay Shi Jun, William B. Penzes, Fredric Scire, E Clayton Teague, John S Villarrubia
Abstract: At the National Institute of Standards and Technology, we are building a metrology instrument called the Molecular Measuring Machine (M^3) with the goal of performing nanometer- accuracy two-dimensional feature placement measurements over a 50 mm by ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820932

10. Grating Pitch Measurements with the Molecular Measuring Machine
Published: 11/1/1999
Authors: John A Kramar, C Villarrubia, E Clayton Teague, W Scire, William B. Penzes
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820128



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