NIST logo

Publications Portal

You searched on:
Author: heather patrick

Displaying records 11 to 20 of 22 records.
Resort by: Date / Title


11. Modeling the Effect of Finite Size Gratings on Scatterometry Measurements
Published: 9/1/2008
Authors: Elizabeth Kenyon, Michael W Cresswell, Heather J Patrick, Thomas Avery Germer
Abstract: The interpretation of scatterometry measurements generally assumes that the grating extends over an area large enough to intercept all the illumination provided by an incident beam. However, in practice, the gratings used in scatterometry are relati ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=842444

12. Extraction of trench geometry and linewidth of nanoscale grating targets in (110)-oriented silicon using angle-resolved scatterometry
Published: 6/9/2008
Authors: Heather J Patrick, Thomas Avery Germer, Michael W Cresswell, Bin Li, Huai Huang, Paul S. Ho
Abstract: The extraction of nanoscale dimensions and feature geometry of grating targets using signature-based optical techniques is an area of continued interest in semiconductor manufacturing. In the current work, we have performed angle-resolved scatterome ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=842548

13. Modeling the Effect of Finite Size Gratings on Scatterometry Measurements
Published: 2/25/2008
Authors: Elizabeth Kenyon, Michael W Cresswell, Heather J Patrick, Thomas Avery Germer
Abstract: The interpretation of scatterometry measurements generally assumes that the grating extends over an area large enough to intercept all the illumination provided by an incident beam.  However, in practice, the grat-ings used in scatterometry are ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32956

14. Optical Critical Dimension Measurement of Silicon Grating Targets Using Back Focal Plane Scatterfield Microscopy
Published: 1/2/2008
Authors: Heather J Patrick, Ravikiran Attota, Bryan M Barnes, Thomas Avery Germer, Michael T. Stocker, Richard M Silver, Michael R Bishop
Abstract: We demonstrate optical critical dimension measurement of lines in silicon grating targets using back focal plane scatterfield microscopy. In this technique, angle-resolved diffraction signatures are obtained from grating targets by imaging the back ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841060

15. Progress Towards Traceable Nanoscale Optical Critical Dimension Metrology for Semiconductors
Published: 10/1/2007
Authors: Heather J Patrick, Thomas Avery Germer
Abstract: Non-imaging optical critical dimension (OCD) techniques have rapidly become a preferred method for measuring nanoscale features in semiconductors. OCD relies upon the measurement of an optical reflectance signature from a grating target as a function ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841133

16. Modeling and Analysis of Scatterometry Signatures for Optical Critical Dimension Reference Material Applications
Published: 9/30/2007
Authors: Heather Patrick, Thomas Avery Germer, Michael W Cresswell, Richard A Allen, Ronald G Dixson, Michael Bishop
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32756

17. Extending the Limits of Image-Based Optical Metrology
Published: 6/20/2007
Authors: Richard M Silver, Bryan M Barnes, Ravikiran Attota, Jay Shi Jun, Michael T. Stocker, Egon Marx, Heather J Patrick
Abstract: We have developed a set of techniques, referred to as scatterfield microscopy, in which the illumination is engineered in combination with appropriately designed metrology targets. Previously we reported results from samples with sub-50 nm sized fea ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823218

18. Modeling and Analysis of Scatterometry Signatures for Optical Critical Dimension Reference Material Applications
Published: 5/7/2007
Authors: Heather J Patrick, Thomas Avery Germer, Michael W Cresswell, Richard A Allen, Ronald G Dixson, Michael R Bishop
Abstract: We use an optical critical dimension technique, matching modeled to measured scatterometry signatures, to obtain critical dimension linewidth on grating targets fabricated using the single-crystal critical dimension reference materials process. The ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841085

19. Study of Test Structures for Use as Reference Material in Optical Critical Dimension Applications
Published: 3/22/2007
Authors: Richard A Allen, Heather Patrick, Michael Bishop, Thomas Avery Germer, Ronald G Dixson, William Gutherie, Michael W Cresswell
Abstract: Optical critical dimension (OCD) metrology has rapidly become an important technology in supporting the worldwide semiconductor industry. OCD relies on a combination of measurement and modeling to extract the average dimensions of an array of identic ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32593

20. Study of Test Structures for Use as Reference Material in Optical Critical Dimension Applications
Published: 1/1/2007
Authors: R A Allen, Heather J Patrick, M Bishop, Thomas Avery Germer
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101558



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series