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Author: ndubuisi orji

Displaying records 11 to 20 of 56 records.
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11. Measurement Traceability and Quality Assurance in a Nanomanufacturing Environment
Published: 3/8/2011
Authors: Ndubuisi George Orji, Ronald G Dixson, Aaron Cordes, Benjamin Bunday, John Allgair
Abstract: A key requirement for nano-manufacturing is maintaining acceptable traceability of measurements performed to determine size. Given that properties and functionality at the nanoscale are governed by absolute size, maintaining the traceability of dimen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906853

12. Multi-laboratory Comparison of Traceable Atomic Force Microscope Measurements of 70 nm Grating Pitch
Published: 3/8/2011
Authors: Ronald G Dixson, Donald Chernoff, Shihua Wang, Theodore Vincent Vorburger, Siew-Leng Tan, Ndubuisi George Orji, Joseph Fu
Abstract: The National Institute of Standards and Technology (NIST), Advanced Surface Microscopy (ASM), and the National Metrology Centre (NMC) of the Agency for Science, Technology, and Research (A*STAR) in Singapore have completed a three-way interlaboratory ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906777

13. Scanning Probe Microscope Dimensional Metrology at NIST
Published: 12/21/2010
Authors: John A Kramar, Ronald G Dixson, Ndubuisi George Orji
Abstract: Scanning probe microscopy (SPM) dimensional metrology efforts at the U.S. National Institute of Standards and Technology are reviewed. The main SPM instruments for realizing the International System of Units (SI) are the Molecular Measuring Machine, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905420

14. Nano- and Atom-scale Length Metrology
Published: 10/1/2010
Authors: Theodore Vincent Vorburger, Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, Richard A Allen, Michael W Cresswell, Vincent A Hackley
Abstract: Measurements of length at the nano-scale have increasing importance in manufacturing, especially in the electronics and biomedical industries. The properties of linewidth and step height are critical to the function and specification of semiconducto ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906609

15. Interlaboratory Comparison of Traceable Atomic Force Microscope Pitch Measurements
Published: 6/14/2010
Authors: Ronald G Dixson, Donald Chernoff, Shihua Wang, Theodore Vincent Vorburger, Ndubuisi George Orji, Siew-Leng Tan, Joseph Fu
Abstract: The National Institute of Standards and Technology (NIST), Advanced Surface Microscopy (ASM), and the National Metrology Centre (NMC) of the Agency for Science, Technology, and Research (A*STAR) in Singapore have undertaken a three-way interlaborator ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905745

16. Calibration of 1 nm SiC Step Height Standards
Published: 3/31/2010
Authors: Theodore Vincent Vorburger, Albert M. Hilton, Ronald G Dixson, Ndubuisi George Orji, J. A. Powell, A. J. Trunek, P. G. Neudeck, P. B. Abel
Abstract: We aim to develop and calibrate a set of step height standards to meet the range of steps useful for nanotechnology. Of particular interest to this community is the calibration of atomic force microscopes operating at their highest levels of magnifi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905193

17. Results of an international photomask linewidth comparison of NIST and PTB
Published: 10/9/2009
Authors: Bernd Bodermann, D Bergmann, Egbert Buhr, W Haebler-Grohne, Harald Bosse, James Edward Potzick, Ronald G Dixson, Richard Quintanilha, Michael T. Stocker, Andras Vladar, Ndubuisi George Orji
Abstract: In preparation of the international Nano1 linewidth comparison on photomasks between 9 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to tes ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903776

18. Measurement Traceability and Quality Assurance in a Nanomanufacturing Environment
Published: 9/25/2009
Authors: Ndubuisi George Orji, Ronald G Dixson, Aaron Cordes, Benjamin Bunday, John Allgair
Abstract: A key requirement for nano-manufacturing is maintaining acceptable traceability of measurements performed to determine size. Given that properties and functionality at the nanoscale are governed by absolute size, maintaining the traceability of dimen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903286

19. A moving window correlation method to reduce the distortion of SPM images
Published: 8/20/2009
Authors: Wei Chu, Joseph Fu, Ronald G Dixson, Ndubuisi George Orji, Theodore Vincent Vorburger
Abstract: Many scanning probe microscopes (SPMs), such as the scanning tunneling microscope (STM) and atomic force microscope (AFM), use piezoelectric actuators operating in open loop for generating the scans of the surfaces. However, nonlinearities mainly cau ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901732

20. Reference Metrology in a Research Fab: The NIST Clean Calibrations Thrust
Published: 4/12/2009
Authors: Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, Thomas B Renegar, Xiaoyu A Zheng, Theodore Vincent Vorburger, Albert M. Hilton, Marc J Cangemi, Lei Chen, Michael A. Hernandez, Russell E Hajdaj, Michael R Bishop, Aaron Cordes
Abstract: In 2004, the National Institute of Standards and Technology (NIST) commissioned the Advanced Measurement Laboratory (AML) ‹ a state-of-the-art, five-wing laboratory complex for leading edge NIST research. The NIST NanoFab ‹ a 1765 m2 (19,000 ft2) cl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902187



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