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You searched on: Author: ndubuisi orji

Displaying records 11 to 20 of 65 records.
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11. Distributed Force Probe Bending Model of CD-AFM Bias
Published: 4/1/2013
Authors: Vladimir A. Ukraintsev, Ndubuisi George Orji, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Richard M Silver
Abstract: Critical Dimension AFM (CD-AFM) is a widely used reference metrology technique. To characterize modern semiconductor devices, small and flexible probes, often 15 nm to 20 nm in diameter, are used. Recent studies have reported uncontrolled and signif ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912266

12. FABRICATION AND CHARACTERIZATION OF STANDARDS FOR ATOMIC FORCE MICROSCOPE TIP WIDTH CALIBRATION
Published: 3/25/2013
Authors: Ronald G Dixson, Craig Dyer McGray, Boon Ping Ng, Ndubuisi George Orji, Jon C Geist
Abstract: The National Institute of Standards and Technology (NIST) has been developing methods and standards to enable the traceable calibration of critical dimension atomic force microscopy (CD AFM). This technique involves flared tips and two-dimensional s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912865

13. Robust Auto-Alignment Technique for Orientation-Dependent Etching of Nanostructures
Published: 5/29/2012
Authors: Craig Dyer McGray, Richard J Kasica, Ndubuisi George Orji, Ronald G Dixson, Michael W. Cresswell, Richard A Allen, Jon C Geist
Abstract: A robust technique is presented for auto-aligning nanostructures to slow-etching crystallographic planes in materials with diamond cubic structure. Lithographic mask patterns are modified from the intended dimensions of the nanostructures to compen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908076

14. Contour Metrology using Critical Dimension Atomic Force Microscopy
Published: 4/9/2012
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Bin Ming, Michael T Postek
Abstract: The critical dimension atomic force microscope (CD-AFM), which is used as a reference instrument in lithography metrology, has been proposed as a supplemental instrument for contour measurement and verification. However, although data from CD-AFM is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910915

15. On CD-AFM bias related to probe bending
Published: 4/9/2012
Authors: Vladimir A Ukraintsev, Ndubuisi George Orji, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Richard M Silver
Abstract: Critical Dimension AFM (CD-AFM) is a widely used reference metrology. To characterize modern semiconductor devices, very small and flexible probes, often 15 nm to 20 nm in diameter, are now frequently used. Several recent publications have reported ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910903

16. Traceable Calibration of a Critical Dimension Atomic Force Microscope
Published: 3/9/2012
Authors: Ronald G Dixson, Ndubuisi George Orji, Craig Dyer McGray, John E Bonevich, Jon C Geist
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. One component of this program, and the focus of this paper, is the use of critical dimension atomic force ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908943

17. Strategies for Nanoscale Contour Metrology using Critical Dimension Atomic Force Microscopy
Published: 9/30/2011
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Michael T Postek
Abstract: Contour metrology is one of the techniques used to verify optical proximity correction (OPC) in lithography models. The use of these methods, which are known as resolution enhancement techniques (RET), are necessitated by the continued decrease in f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909559

18. Traceable Calibration of a Critical Dimension Atomic Force Microscope
Published: 6/6/2011
Authors: Ronald G Dixson, Ndubuisi George Orji, Craig Dyer McGray, Jon C Geist
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. One component of this effort is a custom in-house metrology AFM, called the calibrated AFM (C-AFM). The NI ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908552

19. Progress on CD-AFM tip width calibration standards
Published: 5/10/2011
Authors: Ronald G Dixson, Boon Ping Ng, Craig Dyer McGray, Ndubuisi George Orji, Jon C Geist
Abstract: The National Institute of Standards and Technology (NIST) is developing a new generation of standards for calibration of CD-AFM tip width. These standards, known as single crystal critical dimension reference materials (SCCDRM) have features with ne ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911343

20. Measurement Traceability and Quality Assurance in a Nanomanufacturing Environment
Published: 3/8/2011
Authors: Ndubuisi George Orji, Ronald G Dixson, Aaron Cordes, Benjamin Bunday, John Allgair
Abstract: A key requirement for nano-manufacturing is maintaining acceptable traceability of measurements performed to determine size. Given that properties and functionality at the nanoscale are governed by absolute size, maintaining the traceability of dimen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906853



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