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Author: ndubuisi orji

Displaying records 11 to 20 of 54 records.
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11. Scanning Probe Microscope Dimensional Metrology at NIST
Published: 12/21/2010
Authors: John A Kramar, Ronald G Dixson, Ndubuisi George Orji
Abstract: Scanning probe microscopy (SPM) dimensional metrology efforts at the U.S. National Institute of Standards and Technology are reviewed. The main SPM instruments for realizing the International System of Units (SI) are the Molecular Measuring Machine, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905420

12. Nano- and Atom-scale Length Metrology
Published: 10/1/2010
Authors: Theodore Vincent Vorburger, Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, Richard A Allen, Michael W Cresswell, Vincent A Hackley
Abstract: Measurements of length at the nano-scale have increasing importance in manufacturing, especially in the electronics and biomedical industries. The properties of linewidth and step height are critical to the function and specification of semiconducto ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906609

13. Interlaboratory Comparison of Traceable Atomic Force Microscope Pitch Measurements
Published: 6/14/2010
Authors: Ronald G Dixson, Donald Chernoff, Shihua Wang, Theodore Vincent Vorburger, Ndubuisi George Orji, Siew-Leng Tan, Joseph Fu
Abstract: The National Institute of Standards and Technology (NIST), Advanced Surface Microscopy (ASM), and the National Metrology Centre (NMC) of the Agency for Science, Technology, and Research (A*STAR) in Singapore have undertaken a three-way interlaborator ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905745

14. Calibration of 1 nm SiC Step Height Standards
Published: 3/31/2010
Authors: Theodore Vincent Vorburger, Albert M. Hilton, Ronald G Dixson, Ndubuisi George Orji, J. A. Powell, A. J. Trunek, P. G. Neudeck, P. B. Abel
Abstract: We aim to develop and calibrate a set of step height standards to meet the range of steps useful for nanotechnology. Of particular interest to this community is the calibration of atomic force microscopes operating at their highest levels of magnifi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905193

15. Results of an international photomask linewidth comparison of NIST and PTB
Published: 10/9/2009
Authors: Bernd Bodermann, D Bergmann, Egbert Buhr, W Haebler-Grohne, Harald Bosse, James Edward Potzick, Ronald G Dixson, Richard Quintanilha, Michael T. Stocker, Andras Vladar, Ndubuisi George Orji
Abstract: In preparation of the international Nano1 linewidth comparison on photomasks between 9 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to tes ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903776

16. Measurement Traceability and Quality Assurance in a Nanomanufacturing Environment
Published: 9/25/2009
Authors: Ndubuisi George Orji, Ronald G Dixson, Aaron Cordes, Benjamin Bunday, John Allgair
Abstract: A key requirement for nano-manufacturing is maintaining acceptable traceability of measurements performed to determine size. Given that properties and functionality at the nanoscale are governed by absolute size, maintaining the traceability of dimen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903286

17. A moving window correlation method to reduce the distortion of SPM images
Published: 8/20/2009
Authors: Wei Chu, Joseph Fu, Ronald G Dixson, Ndubuisi George Orji, Theodore Vincent Vorburger
Abstract: Many scanning probe microscopes (SPMs), such as the scanning tunneling microscope (STM) and atomic force microscope (AFM), use piezoelectric actuators operating in open loop for generating the scans of the surfaces. However, nonlinearities mainly cau ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901732

18. Reference Metrology in a Research Fab: The NIST Clean Calibrations Thrust
Published: 4/12/2009
Authors: Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, Thomas B Renegar, Xiaoyu A Zheng, Theodore Vincent Vorburger, Albert M. Hilton, Marc J Cangemi, Lei Chen, Michael A. Hernandez, Russell E Hajdaj, Michael R Bishop, Aaron Cordes
Abstract: In 2004, the National Institute of Standards and Technology (NIST) commissioned the Advanced Measurement Laboratory (AML) – a state-of-the-art, five-wing laboratory complex for leading edge NIST research. The NIST NanoFab – a 1765 m2 (19,000 ft2) cl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902187

19. Comparison of Measurement Techniques for Linewidth Metrology on Advanced Photomasks
Published: 2/19/2009
Authors: Stewart Smith, Andreas Tsiamis, Martin McCallum, Andrew Hourd, J Stevenson, Anthony Walton, Ronald G Dixson, Richard A Allen, James Edward Potzick, Michael W Cresswell, Ndubuisi George Orji
Abstract: This paper compares electrical, optical, and atomic force microscope (AFM) measurements of critical dimension (CD)made on a chrome on quartz photomask. Test structures suitable for direct, on-mask electrical probing have been measured using the above ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901862

20. 2nd Annual Tri-National Workshop on Standards for Nanotechnology - (NIST presentations)
Published: 12/10/2008
Authors: Ronald G Dixson, Jon Robert Pratt, Vincent A Hackley, James Edward Potzick, Richard A Allen, Ndubuisi George Orji, Michael T Postek, Herbert S Bennett, Theodore Vincent Vorburger, Jeffrey A Fagan, Robert L. Watters
Abstract: A new era of cooperation between North American National Measurement Institutes (NMIs) was ushered by the National Research Council of Canada Institute for National Measurement Standards (NRC-INMS) on February 7, 2007 when the first Tri-National wo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824641