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Author: jay hendricks

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11. A Low Differential-Pressure Primary Standard for the Range 1 Pa to 13 kPa
Published: 12/1/2005
Authors: A P. Miiller, Charles R. Tilford, Jay H Hendricks
Abstract: The National Institute of Standards and Technology (NIST) has completed the development of a low differential-pressure primary standard covering a range from 1 Pa to 13 kPa for operation with line pressures up to 200 kPa. The standard is based on a U ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830938

12. In Situ Raman Spectroscopic Investigation of Stainless Steel Hydrothermal Corrosion
Published: 9/1/2002
Authors: James E Maslar, Wilbur S. Hurst, Walter J. Bowers Jr., Jay H Hendricks
Abstract: In situ Raman spectroscopy was employed to investigate corrosion of 304L stainless steel in air-saturated water at a pressure of 25.2 Mpa and temperatures up to 496 C in an optically accessible flow cell. The steel also was characterized ex situ wi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830717

13. In Situ Raman Spectroscopic Investigation of Nickel Hydrothermal Corrosion
Published: 3/1/2002
Authors: James E Maslar, Wilbur S. Hurst, Walter J. Bowers Jr., Jay H Hendricks, M I Aquino
Abstract: A nickel coupon was exposed to air-saturated water at a pressure of 25.4 MPa and temperatures ranging from 21 C to 460 C in an optically accessible flow cell. In situ Raman spectra were collected at a number of temperatures as the coupon was heate ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830703

14. In Situ Raman Spectroscopic Investigation of Zirconium-Niobium Alloy Corrosion Under Hydrothermal Conditions
Published: 10/1/2001
Authors: James E Maslar, Wilbur S. Hurst, Walter J. Bowers Jr., Jay H Hendricks
Abstract: In situ Raman spectroscopy was employed to investigate corrosion of a zirconium-niobium alloy in air-saturated water at a pressure of 15.5 MPa and temperatures ranging from 22 to 407 C in an optically accessible flow cell. Monoclinic ZrO^d2^ (m-ZrO ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830704

15. In Situ Raman Spectroscopic Investigation of Chromium Surfaces Under Hydrothermal Conditions
Published: 8/1/2001
Authors: James E Maslar, Wilbur S. Hurst, Walter J. Bowers Jr., Jay H Hendricks, M I Aquino, Igor Levin
Abstract: Three chromium coupons were exposed to air-saturated water at pressures of ca. 25 MPa and temperatures up to 545 C in an optically accessible flow cell. In situ Raman spectra were collected at different temperatures as the coupons were heated and t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830715

16. In Situ Raman Spectroscopic Investigation of Aqueous Iron Corrosion at Elevated Temperatures and Pressures
Published: 7/1/2000
Authors: James E Maslar, Wilbur S. Hurst, Walter J. Bowers Jr., Jay H Hendricks, M I. Aquino-Class
Abstract: In situ Raman spectroscopy was employed to investigate iron corrosion in air-saturated water at a pressure of 25.1 MPa and temperatures from 21 to 537 C. Upon heating, various combinations of Fe^d3^O^d4^, {alpha}-Fe^d2^O^d3^, {gamma}-FeOOH, and {gamm ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830657

17. A New Low Temperature Chemical Vapor Deposition Technique For Growing Thin Films of Ti, TiN on Copper and TiO2, TixSiy on Silicon
Published: 12/1/1999
Authors: Jay H Hendricks, M I. Aquino-Class, Michael Russel Zachariah
Abstract: In this paper, we present a process which has the benefits of operating at lower temperatures than conventional CVD, that uses low cost precursors, and produces only environmentally benign byproducts. This new method fordepositing Ti, TiN, TiO^d2^, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830615

18. Chemical Vapor Deposition of Metal and Ceramic Thin Films by Sodium Vapor Phase Reduction of Metal Halide Precursors
Published: 12/1/1998
Authors: Jay H Hendricks, Michael Russel Zachariah
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100626

19. Thin Film Growth of Titanium and Titanium Nitride Via Gas-Phase Reaction of Sodium Vapor With Titanium Tetrachloride
Published: 11/1/1998
Authors: Jay H Hendricks, M I. Aquino-Class, Michael Russel Zachariah
Abstract: In this paper, we present a process which has the benefits of operating at lower temperatures than conventional CVD, that uses low cost precursors, and produces only environmentally benign byproducts. This new method for depositing Ti and TiN thin f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830617

20. Metal and Ceramic Thin Film Growth by Reaction of Alkali Metals with Metal Halides: A New Route for Low Temperature CVD
Published: 7/1/1998
Authors: Jay H Hendricks, M I. Aquino-Class, James E Maslar, Michael Russel Zachariah
Abstract: A new low temperature CVD method for the growth of metal and ceramic thin films has been demonstrated. This method involves the use of a low pressure coflow diffusion flame reactor to react alkali metal vapor with metal halide vapor. The reaction c ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830592



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