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You searched on: Author: ronald dixson Sorted by: date

Displaying records 1 to 10 of 123 records.
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1. Process Optimization for Lattice-Selective Wet Etching of Crystalline Silicon Structures
Published: 3/9/2016
Authors: Ronald G Dixson, William F Guthrie, Richard A Allen, Ndubuisi George Orji, Michael W. Cresswell, Christine E. Murabito
Abstract: Lattice-selective etching of silicon is used in a number of applications, but it is particularly valuable in those for which the lattice-defined sidewall angle can be beneficial to the functional goals. A relatively small but important niche applica ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=919919

2. Lateral Tip Control Effects in CD-AFM Metrology: The Large Tip Limit
Published: 1/25/2016
Authors: Ronald G Dixson, Ndubuisi George Orji, Ryan Goldband
Abstract: Sidewall sensing in CD-AFMs usually involves continuous lateral dithering of the tip or the use of a control algorithm and fast response piezo actuator to position the tip in a manner that resembles touch-triggering of coordinate measuring machine (C ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=919720

3. Tip characterization method using multi-feature characterizer for CD-AFM
Published: 12/23/2015
Authors: Ndubuisi George Orji, Hiroshi Itoh, Chumei Wang, Ronald G Dixson, Sebastian Schmidt, Bernd Irmer, Peter S. Walecki
Abstract: In atomic force microscopy (AFM) metrology, the tip is a key source of uncertainty. Images taken with an AFM show a change in feature width and shape that depends on tip geometry. This geometric distortion is more pronounced when measuring features w ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=917118

4. Deep-subwavelength Nanometric Image Reconstruction using Fourier Domain Optical Normalization
Published: 11/5/2015
Authors: Jing Qin, Richard M Silver, Bryan M Barnes, Hui Zhou, Ronald G Dixson, Mark Alexander Henn
Abstract: Quantitative optical measurements of deep sub-wavelength, three-dimensional, nanometric structures with sensitivity to sub-nanometer details address an ubiquitous measurement challenge. A Fourier domain normalization approach is used in the Fourier ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914423

5. Photomask Linewidth Comparison by PTB and NIST
Published: 11/2/2015
Authors: D Bergmann, Bernd Bodermann, Harald Bosse, Egbert Buhr, G Dai, Ronald G Dixson, W H?er-Grohne
Abstract: We report the initial results of a recent bilateral comparison of linewidth or critical dimension (CD) calibrations on photo-mask line features between two national metrology institutes (NMIs): the National Institute of Standards and Technology (NIST ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=919666

6. Lateral Tip Control Effects in CD-AFM Metrology: The Large Tip Limit
Published: 10/21/2015
Authors: Ronald G Dixson, Ryan Goldband, Ndubuisi George Orji
Abstract: Critical dimension atomic force microscopes (CD-AFMs) use flared tips and two-dimensional sensing and control of the tip-sample interaction to enable scanning of features with near-vertical or even reentrant sidewalls. Features of this sort are commo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=919319

7. Interactions of Higher Order Tip Effects in CD-AFM Linewidth Metrology
Published: 4/30/2015
Authors: Ronald G Dixson, Boon Ping Ng, Xavier Bonnaud, Ndubuisi George Orji
Abstract: A major challenge in critical dimension atomic force microscope (CD-AFM) width metrology is accounting for the effects of the tip on the apparent features in an image. The overall effect of the tip is to broaden the apparent width of lines and narrow ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=916379

8. Technique for AFM Tip Characterization
Published: 9/15/2014
Authors: Ndubuisi George Orji, Ronald G Dixson, Hiroshi Itoh, Chumei Wang
Abstract: In atomic force microscopy (AFM) metrology, the scanning tip is a major source of uncertainty. Images taken with an AFM show an apparent broadening of feature dimensions due to the finite size of the tip. An AFM image is a combination of the feature ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=917092

9. Effects of Lateral Tip Control in CD-AFM Width Metrology
Published: 8/12/2014
Authors: Ronald G Dixson, Boon Ping Ng, Ndubuisi George Orji
Abstract: Critical dimension atomic force microscopes (CD-AFMs) use flared tips and two-dimensional sensing and position control of the tip-sample interaction to enable scanning of features with near-vertical or reentrant sidewalls. Sidewall sensing usually in ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915945

10. Resolving three-dimensional shape of sub-50 nm wide lines with nanometer-scale sensitivity using conventional optical microscopes
Published: 7/29/2014
Authors: Ravikiran Attota, Ronald G Dixson
Abstract: We experimentally demonstrate that the three-dimensional (3-D) shape variations of nanometer-scale objects can be resolved and measured with sub-nanometer scale sensitivity using conventional optical microscopes by analyzing 3-D optical data using th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908543



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