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Author: ronald dixson

Displaying records 91 to 100 of 114 records.
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91. The Role of Periodic Interferometer Errors in the Calibration of Capacitance Displacement Sensors for Nanometrology Applications
Published: 1/1/2000
Authors: R Koning, Ronald G Dixson, Joseph Fu, Theodore Vincent Vorburger
Abstract: Although the role of the periodic errors of optical heterodyne interferometers in displacement measurements is fairly well understood, their influence on the calibration of other types of displacement sensors do not seem to be studied as extensively. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820965

92. Step Height Metrology for Data Storage Applications
Published: 11/1/1999
Authors: R Koning, Ronald G Dixson, Joseph Fu, Thomas B Renegar, Theodore Vincent Vorburger, V W. Tsai, Michael T Postek
Abstract: The measurements of bump heights and pit depth on compact discs (CD) with atomic force microscopes (AFMs) are quite different from the measurement of step heights on step height calibration standards.  Both the bumps and the pits show much large ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823118

93. Step-height Metrology for Data Storage Applications
Published: 11/1/1999
Authors: R Koning, Ronald G Dixson, Joseph Fu, Thomas B Renegar, Theodore Vincent Vorburger, V W. Tsai, Michael T Postek
Abstract: The measurement of bump heights and pit depth on compact discs (CD) with atomic force microscopes (AFMs) is quite different from the measurement of step heights on step height calibration standards. Both the bumps and the pits show much larger transi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820931

94. Dimensional Metrology with the NIST Calibrated Atomic Force Microscope
Published: 6/1/1999
Authors: Ronald G Dixson, R Koning, V W. Tsai, Joseph Fu, Theodore Vincent Vorburger
Abstract: Atomic force microscopes (AFMs) are increasingly used in the semiconductor industry as tools for submicrometer dimensional metrology. The scales of an AFM must be calibrated in order to perform accurate measurements. We have designed and developed th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820926

95. Intercomparison of SEM, AFM, and Electrical Linewidths
Published: 6/1/1999
Authors: John S Villarrubia, Ronald G Dixson, Samuel N Jones, J R. Lowney, Michael T Postek, Richard A Allen, Michael W Cresswell
Abstract: Uncertainty in the locations of line edges dominates the uncertainty budget for high quality sub-micrometer linewidth measurements. For microscopic techniques like scanning electron microscopy (SEM) and atomic force microscopy (AFM), the image of the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820954

96. Algorithms for Calculating Single-Atom Step Heights
Published: 1/1/1999
Authors: Joseph Fu, V W. Tsai, R Koning, Ronald G Dixson, Theodore Vincent Vorburger
Abstract: Recently, measuring Si(111) single atomic steps prompted us to investigate the measuring technique. The section technique is the most popular method for measuring the height. By measuring a simulated Si(111) atomic step, we have found it could have a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820930

97. Improving Pitch and Step Height Measurements Using the Calibrated Atomic Force Microscope
Published: 11/1/1998
Authors: R Koning, Ronald G Dixson, Joseph Fu, V W. Tsai
Abstract: No abstract.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823080

98. Measurement of Pitch and Width Samples with the NIST Calibrated Atomic Force Microscope
Published: 6/1/1998
Authors: Ronald G Dixson, R Koning, Theodore Vincent Vorburger, Joseph Fu, V W. Tsai
Abstract: Because atomic force microscopes (AFMs) are capable of generating three dimensional images with nanometer level resolution, these instruments are being increasingly used in many industries as tools for dimensional metrology at sub- micrometer length ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820889

99. Improving Step Height and Pitch Measurements Using the Calibrated Atomic Force Microscope
Published: 1/1/1998
Authors: R Koning, Ronald G Dixson, Joseph Fu, V W. Tsai, Theodore Vincent Vorburger
Abstract: The most important industrial application of Atomic Force Microscopy (AFM) is probably the accurate measurement of geometrical dimensions of small surface structures. In order to maintain the instrument''s performance and to achieve the high accuracy ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820898

100. Measurements of Pitch, Height, and Width Artifacts with the NIST Calibrated Atomic Force Microscope
Published: 1/1/1998
Authors: Ronald G Dixson, V W. Tsai, Theodore Vincent Vorburger, Edwin Ross Williams, X Wang, Joseph Fu, R Koning
Abstract: The presence of the atomic force microscope (AFM) in the industrial metrology setting is rapidly increasing. Properties commonly measured in such applications are: feature spacing (pitch), feature height (or depth), feature width (critical dimension) ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820838



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