| Author(s): |
Gheorghe Stan; Sean King; Robert F. Cook; |
| Title: |
Elastic modulus of low-k dielectric thin films measured by load-dependent contact-resonance atomic force microscopy |
| Published: |
September 14, 2009 |
| Abstract: |
Correlated force and contact-resonance versus displacement responses have been resolved using load-dependent contact-resonance atomic force microscopy (AFM) to determine the elastic modulus of low-k dielectric thin films. The measurements consisted of recording simultaneously both the deflection and resonance frequency shift of an AFM cantilever-probe as the probe was gradually brought in and out of contact. As the applied forces were restricted to the range of adhesive forces, low-k dielectric films of elastic modulus varying from GPa to hundreds of GPa were measurable in this investigation. Over this elastic modulus range, the reliability of load-dependent contactresonance AFM measurements was confirmed by comparing these results with that from picosecond laser acoustics measurements. |
| Citation: |
Journal of Materials Research |
| Volume: |
24 |
| Issue: |
9 |
| Pages: |
pp. 2960 - 2964 |
| Keywords: |
nanomechanical properties; atomic force microscopy; low-k dielectric films |
| Research Areas: |
Characterization, Nanometrology, and Nanoscale Measurements |
| PDF version: |
 Click here to retrieve PDF version of paper (150KB) |
