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Publication Citation: Elastic modulus of low-k dielectric thin films measured by load-dependent contact-resonance atomic force microscopy

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Author(s): Gheorghe Stan; Sean King; Robert F. Cook;
Title: Elastic modulus of low-k dielectric thin films measured by load-dependent contact-resonance atomic force microscopy
Published: September 14, 2009
Abstract: Correlated force and contact-resonance versus displacement responses have been resolved using load-dependent contact-resonance atomic force microscopy (AFM) to determine the elastic modulus of low-k dielectric thin films. The measurements consisted of recording simultaneously both the deflection and resonance frequency shift of an AFM cantilever-probe as the probe was gradually brought in and out of contact. As the applied forces were restricted to the range of adhesive forces, low-k dielectric films of elastic modulus varying from GPa to hundreds of GPa were measurable in this investigation. Over this elastic modulus range, the reliability of load-dependent contactresonance AFM measurements was confirmed by comparing these results with that from picosecond laser acoustics measurements.
Citation: Journal of Materials Research
Volume: 24
Issue: 9
Pages: pp. 2960 - 2964
Keywords: nanomechanical properties; atomic force microscopy; low-k dielectric films
Research Areas: Characterization, Nanometrology, and Nanoscale Measurements
PDF version: PDF Document Click here to retrieve PDF version of paper (154KB)