Kang, S.
, Prabhu, V.
, Vogt, B.
, Lin, E.
, Wu, W.
and Turnquest, K.
(2006),
Effect of Copolymer Composition on Acid Catalyzed Deprotection Reaction Kinetics in Model Photoresists, Polymer, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852623
(Accessed April 19, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Effect of Copolymer Composition on Acid Catalyzed Deprotection Reaction Kinetics in Model Photoresists
Published
Author(s)
, , , , , Karen Turnquest
Abstract
The kinetics of an acid-catalyzed deprotection reaction in model photoresist materials was studied as a function of copolymer composition with Fourier Transform Infrared spectroscopy. A mathematical model was developed to analyze the acid catalyzed deprotection kinetics with respect to coupled reaction rate and acid-diffusion processes. The first order reaction rate constant decreases as a non-reactive comonomer content is increased. Additionally, the extent of reaction appears self-limiting as verified by a slowing down necessitating an acid-trapping chemical equation to model the data. This composition-dependent reaction constant indicates a strong interaction of the acid with the increasing polar resist matrix that drastically reduces the acid transport rate. The severely reduced acid transport is consistent with hydrogen bonding between photoacid and methacrylic acid product. These results demonstrate a correlation between polymer microstructure and acid catalyzed kinetics.Citation
Polymer
Volume
47
Pub Type
Journals
Download Paper
Keywords
copolymer, diffusion, FTIR, outgassing, photoacid, photolithography, photoresists, reaction rate constant
Citation
Created June 25, 2006, Updated June 2, 2021