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Publication Citation: Characterization of Pore Structure in Nanoporous Low-Dielectric Constant Thin Film by Neutron Porosimetry X-Ray Porosimetry

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Author(s): R C. Hedden; Hae-Jeong Lee; Christopher L. Soles; Barry J. Bauer;
Title: Characterization of Pore Structure in Nanoporous Low-Dielectric Constant Thin Film by Neutron Porosimetry X-Ray Porosimetry
Published: July 02, 2004
Abstract: A small-angle neutron scattering (SANS) porosimetry technique is presented for characterization of pore structure in nanoporous thin films. The technique is applied to characterize a spin-on organosilicate low dielectric constant (low-k) material with a random pore structure. Porosimetry experiments are conducted using a contrast match solvent (a mixture of toluene-d8 and toluene-h8) having the same neutron scattering length density as that of the nanoporous film matrix. The film is exposed to contrast match toluene vapor in a carrier gas (air), and pores fill with liquid by capillary condensation. The partial pressure of the solvent vapor is increased stepwise from 0 (pure air) to P0 (saturated solvent vapor), and then decreased stepwise to 0 (pure air). As the solvent partial pressure increases, pores fill with liquid solvent progressively from smallest to largest.
Citation: Langmuir
Volume: 20
Pages: pp. 6658 - 6667
Keywords: film density;neutron scattering porosimetry;porosity;porous low-k dielectric material;small-angle neutron scattering;x-ray porosimetry
Research Areas: Semiconductors
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