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|Author(s):||Ryna B. Marinenko; J T. Armstrong; Shirley Turner; Eric B. Steel; F A. Stevie;|
|Title:||Characterization of SiGe Bulk Compositional Standards with Electron Probe Microanalysis|
|Published:||September 01, 2003|
|Abstract:||Bulk SiGe wafers cut from single-crystal boules were evaluated with the electron probe microanalyzer (EPMA) for micro- and macroheterogeneity for use as primary standards for future characterization of SiGe thin films on Si that are needed by the microelectronics industry as reference standards. Specimens with nominal compositions of 14 and 6.5 atomic % Ge were rigorously tested with wavelength dispersive spectrometers (WDS) using multiple point, multiple sample, and duplicate data acquisitions. The SiGe14 wafer will make a very good bulk reference material for microanalysis to evaluate SiGe thin films on Si.|
|Conference:||AIP Conference Proceedings|
|Proceedings:||Characterization and Metrology for ULSI Technology, International Conference | | Characterization and Metrology for ULSI Technology: 2003 International Conference on Characterization and Metrology for ULSI Technology | AIP|
|Dates:||March 24-28, 2003|
|Keywords:||Electron Probe Microanalysis,EPMA,heterogeneity,homogeneity,micro-heterogeneity,reference standards,SiGe,Silicon-Germanium Technology|
|Research Areas:||Standard Reference Data|