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NIST Authors in Bold
|Author(s):||James E. Potzick;|
|Title:||Photomask Linewidth Measurement Uncertainty: An Alternative Approach via Stepper Emulation|
|Published:||January 01, 1994|
|Abstract:||The most significant contribution to uncertainty in the measurement of photomask linewidths is the rough shape of the edge of the etched chrome lines. This uncertainty can be greatly reduced if the emulated stepper aerial image of the feature is measured instead of its geometric linewidth. That is: measure what the photomask does, not what it is. Phase-shift and other kinds of mask can be measured in the same way.|
|Proceedings:||Bacus News, SPIE|
|Keywords:||aerial image emulation,linewidth,measurement uncertainty|
|Research Areas:||Metrology, Manufacturing|