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You searched on: Topic Area: Optical Metrology

Displaying records 21 to 30 of 73 records.
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21. An analysis of the nonlinear spectral mixing of didymium and soda-lime glass beads using hyperspectral imagery (HSI) microscopy
Topic: Optical Metrology
Published: 6/13/2014
Authors: Ronald Resmini, Robert S Rand, Christopher Deloye, David W Allen
Abstract: Nonlinear spectral mixing occurs when materials are intimately mixed. Intimate mixing is a common characteristic of granular materials such as soils. A linear spectral unmixing inversion applied to a nonlinear mixture will yield subpixel abundance es ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915979

22. Single molecule confocal fluorescence lifetime correlation spectroscopy for accurate nanoparticle size determination
Topic: Optical Metrology
Published: 5/15/2014
Authors: Bonghwan B. Chon, Kimberly A Briggman, Jeeseong Hwang
Abstract: We report on an experimental procedure in confocal single molecule fluorescence lifetime correlation spectroscopy (FLCS) to determine the range of excitation power and molecule concentration in solution under which the application of an unmodified ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914381

23. Semiconductor-based detectors
Topic: Optical Metrology
Published: 12/13/2013
Authors: Sergio Cova, Massimo Ghioni, Mark A. Itzler, Joshua C Bienfang, Alessandro Restelli
Abstract: There is nowadays a widespread and growing interest in low-level light detection and imaging. This interest is driven by the need for high sensitivity in various scientific and industrial applications such as fluorescence spectroscopy in life and ma ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914460

24. Practical Use and Calculation of CCT and Duv
Topic: Optical Metrology
Published: 10/18/2013
Author: Yoshihiro Ohno
Abstract: The Correlated Color Temperature (CCT) is often used to represent chromaticity of white light sources, but chromaticity is two-dimensional, and another dimension, the distance from the Planckian locus, is often missing. Duv is defined in ANSI C78.377 ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912622

25. Fourier Domain Optical Tool Normalization for Quantitative Parametric Image Reconstruction
Topic: Optical Metrology
Published: 9/5/2013
Authors: Jing Qin, Richard M Silver, Bryan M Barnes, Hui Zhou, Francois R. Goasmat
Abstract: There has been much recent work in developing advanced optical metrology methods that use imaging optics for critical dimension measurements and defect detection. Sensitivity to nanometer scale changes has been observed when measuring critical dimens ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913587

26. Mode reconstruction of a light field by multi-photon statistics
Topic: Optical Metrology
Published: 7/15/2013
Authors: Elizabeth A. Goldschmidt, Fabrizio Piacentini, I. Ruo Berchera, Sergey V Polyakov, Silke Peters, Stefan Kuck, Giorgio Brida, Ivo Pietro Degiovanni, Alan L Migdall, Marco Genovese
Abstract: Knowing the underlying number and structure of occupied modes of a light field plays a crucial role in minimizing loss and decoherence of quantum information. Typically, full characterization of the mode structure involves a series of several separ ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913292

27. Spectral responsivity based calibration of photometer and colorimeter standards
Topic: Optical Metrology
Published: 6/19/2013
Author: George P Eppeldauer
Abstract: Several new generation transfer- and working-standard illuminance meters and tristimulus colorimeters have been developed at the National Institute of Standards and Technology (NIST) to measure all kinds of light sources with low uncertainty. The spe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913528

28. Use of TSOM for sub-11 nm node pattern defect detection and HAR features
Topic: Optical Metrology
Published: 4/30/2013
Authors: Ravikiran Attota, Abraham Arceo, Bunday Benjamin
Abstract: In-line metrologies currently used in the semiconductor industry are being challenged by the aggressive pace of device scaling and the adoption of novel device architectures. In defect inspection, conventional bright field techniques will not likely ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913698

29. Enhancing 9 nm Node Dense Patterned Defect Optical Inspection using Polarization, Angle, and Focus
Topic: Optical Metrology
Published: 4/10/2013
Authors: Bryan M Barnes, Francois R. Goasmat, Martin Y Sohn, Hui Zhou, Abraham Arceo
Abstract: To measure the new SEMATECH 9 nm node Intentional Defect Array (IDA) and subsequent small, complex defects, a methodology has been used to exploit the rich information content generated when simulating or acquiring several images of sub-wavelength-si ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913542

30. Intercomparison between optical and x-ray scatterometry measurements of FinFET structures
Topic: Optical Metrology
Published: 4/8/2013
Authors: Paul Lemaillet, Thomas Avery Germer, Regis J Kline, Daniel Franklin Sunday, Chengqing C. Wang, Wen-Li Wu
Abstract: In this paper, we present a comparison of profile measurements of vertical field effect transistor (FinFET) fin arrays by optical critical dimension (OCD) metrology and critical dimension small angle X-ray scattering (CD-SAXS) metrology. Spectroscopi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913230



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