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You searched on: Topic Area: Optical Metrology

Displaying records 21 to 30 of 67 records.
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21. Mode reconstruction of a light field by multi-photon statistics
Topic: Optical Metrology
Published: 7/15/2013
Authors: Elizabeth A. Goldschmidt, Fabrizio Piacentini, I. Ruo Berchera, Sergey V Polyakov, Silke Peters, Stefan Kuck, Giorgio Brida, Ivo Pietro Degiovanni, Alan L Migdall, Marco Genovese
Abstract: Knowing the underlying number and structure of occupied modes of a light field plays a crucial role in minimizing loss and decoherence of quantum information. Typically, full characterization of the mode structure involves a series of several separ ...

22. Spectral responsivity based calibration of photometer and colorimeter standards
Topic: Optical Metrology
Published: 6/19/2013
Author: George P Eppeldauer
Abstract: Several new generation transfer- and working-standard illuminance meters and tristimulus colorimeters have been developed at the National Institute of Standards and Technology (NIST) to measure all kinds of light sources with low uncertainty. The spe ...

23. Use of TSOM for sub-11 nm node pattern defect detection and HAR features
Topic: Optical Metrology
Published: 4/30/2013
Authors: Ravikiran Attota, Abraham Arceo, Bunday Benjamin
Abstract: In-line metrologies currently used in the semiconductor industry are being challenged by the aggressive pace of device scaling and the adoption of novel device architectures. In defect inspection, conventional bright field techniques will not likely ...

24. Enhancing 9 nm Node Dense Patterned Defect Optical Inspection using Polarization, Angle, and Focus
Topic: Optical Metrology
Published: 4/10/2013
Authors: Bryan M Barnes, Francois R. Goasmat, Martin Y Sohn, Hui Zhou, Abraham Arceo
Abstract: To measure the new SEMATECH 9 nm node Intentional Defect Array (IDA) and subsequent small, complex defects, a methodology has been used to exploit the rich information content generated when simulating or acquiring several images of sub-wavelength-si ...

25. Intercomparison between optical and x-ray scatterometry measurements of FinFET structures
Topic: Optical Metrology
Published: 4/8/2013
Authors: Paul Lemaillet, Thomas Avery Germer, Regis J Kline, Daniel Franklin Sunday, Chengqing C. Wang, Wen-Li Wu
Abstract: In this paper, we present a comparison of profile measurements of vertical field effect transistor (FinFET) fin arrays by optical critical dimension (OCD) metrology and critical dimension small angle X-ray scattering (CD-SAXS) metrology. Spectroscopi ...

26. 3-D Optical Metrology of Finite sub-20 nm Dense Arrays using Fourier Domain Normalization
Topic: Optical Metrology
Published: 3/25/2013
Authors: Jing Qin, Hui Zhou, Bryan M Barnes, Ronald G Dixson, Richard M Silver
Abstract: Reduced target dimensions requiring improved resolution and sensitivity have driven the need to use and analyze the phase and scattered frequency information available when using image-based scatterometry systems. One such system is scatterfield micr ...

Topic: Optical Metrology
Published: 3/25/2013
Authors: Richard M Silver, Bryan M Barnes, Francois R. Goasmat, Hui Zhou, Martin Y Sohn
Abstract: The semiconductor manufacturing industry is now facing serious challenges in achieving defect detection rates with acceptable throughput and accuracy. With conventional bright-field and dark- field inspection methods now at their limits, it has b ...

28. Accurate, inexpensive testing of handheld lasers for safe use and operation
Topic: Optical Metrology
Published: 3/7/2013
Authors: Marla L Dowell, Joshua Aram Hadler
Abstract: An accurate, inexpensive test bed for measurements of optical power emitted from handheld lasers is described. Our test bed consists of a thermopile detector, bandpass optical filters, an adjustable iris, and self-centering holders for mounting of th ...

29. Standardization of Broadband UV Measurements
Topic: Optical Metrology
Published: 1/1/2013
Author: George P Eppeldauer
Abstract: The CIE standardized rectangular-shape UV response functions can be realized only with large spectral mismatch errors. The spectral power-distribution of UV sources is not standardized. Accordingly, the readings of different types of UV meters, even ...

30. Adaptive measurements in nonorthogonal state discrimination
Topic: Optical Metrology
Published: 12/18/2012
Authors: Francisco E. Becerra Chavez, Alan L Migdall
Abstract: Adaptive measurements represent important resources in quantum information science and quan- tum technologies. They take advantage of the knowledge of partial measurements of the system to optimize subsequent measurements and perform tasks that are ...

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