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Topic Area: Optical Metrology

Displaying records 11 to 20 of 112 records.
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11. 3-D Optical Metrology of Finite sub-20 nm Dense Arrays using Fourier Domain Normalization
Topic: Optical Metrology
Published: 3/25/2013
Authors: Jing Qin, Hui Zhou, Bryan M Barnes, Ronald G Dixson, Richard M Silver
Abstract: Reduced target dimensions requiring improved resolution and sensitivity have driven the need to use and analyze the phase and scattered frequency information available when using image-based scatterometry systems. One such system is scatterfield micr ...

Topic: Optical Metrology
Published: 3/25/2013
Authors: Richard M Silver, Bryan M Barnes, Francois R. (Francois) Goasmat, Hui Zhou, Martin Y Sohn
Abstract: The semiconductor manufacturing industry is now facing serious challenges in achieving defect detection rates with acceptable throughput and accuracy. With conventional bright-field and dark- field inspection methods now at their limits, it has b ...

13. Accurate, inexpensive testing of handheld lasers for safe use and operation
Topic: Optical Metrology
Published: 3/7/2013
Authors: Marla L Dowell, Joshua Aram Hadler
Abstract: An accurate, inexpensive test bed for measurements of optical power emitted from handheld lasers is described. Our test bed consists of a thermopile detector, bandpass optical filters, an adjustable iris, and self-centering holders for mounting of th ...

14. Nanoscale Specific Heat Capacity Measurements Using Optoelectronic Bilayer Microcantilevers
Topic: Optical Metrology
Published: 12/12/2012
Authors: Brian Gregory Burke, William A Osborn, Richard Swift Gates, David A LaVan
Abstract: We describe a new technique for optically and electrically detecting and heating bilayer microcantilevers (Pt−SiNx) to high temperatures at fast heating rates for nanoscale specific heat capacity measurements. The bilayer microcantilever acts s ...

15. Weak value thermostat with 0.2 mK precision
Topic: Optical Metrology
Published: 12/1/2012
Authors: Patrick F Egan, Jack A Stone Jr
Abstract: A new laser-based thermostat sensitive to 0.2 mK at room temperature is reported. The method utilizes a fluid-filled prism and interferometric weak value amplification to sense nanoradian deviations of a laser beam: due to the high thermooptic coef ...

16. Multiple-order Imaging for Optical Critical Dimension Metrology using Microscope Characterization
Topic: Optical Metrology
Published: 10/11/2012
Authors: Jing Qin, Hui Zhou, Bryan M Barnes, Francois R. (Francois) Goasmat, Ronald G Dixson, Richard M Silver
Abstract: There has been much recent work in developing advanced optical metrology applications that use imaging optics for optical critical dimension (OCD) measurements, defect detection, and for potential use with in-die metrology applications. We have previ ...

17. Tunable Supercontinuum Fiber Laser Source for BRDF Measurements in the STARR II Gonioreflectometer
Topic: Optical Metrology
Published: 9/27/2012
Authors: Heather J Patrick, Clarence Joseph Zarobila, Thomas Avery Germer, Victor Alan Ying, Catherine C Cooksey, Benjamin K Tsai
Abstract: STARR II is a planned NIST facility for spectral measurements of specular reflectance and diffuse bidirectional reflectance distribution function (BRDF) that is the follow-on to the current NIST STARR (Spectral Tri-function Automated Reference Reflec ...

18. Measuring Single-Walled Carbon Nanotube Length Distributions from Diffusional Trajectories
Topic: Optical Metrology
Published: 8/27/2012
Authors: Jason Streit, Sergei M Bachilo, Anton V Naumov, Constantine Y. Khripin, Ming Zheng, R Bruce Weisman
Abstract: A new method is demonstrated for measuring the length distributions of dispersed single-walled carbon nanotube (SWCNT) samples by analyzing diffusional motions of many individual nanotubes in parallel. In this method, termed Length Analysis by Na ...

19. A modified Roberts-Langenbeck test for measuring thickness and refractive index variation of silicon wafers
Topic: Optical Metrology
Published: 8/17/2012
Authors: Jungjae Park, Lingfeng Chen, Quandou Wang, Ulf Griesmann
Abstract: We describe a method to simultaneously measure thickness variation and refractive index homogeneity of 300 mm diameter silicon wafers using a wavelength shifting Fizeau interferometer operating at 1550 nm. Only three measurements are required, corres ...

20. A compact and robust method for full Stokes spectropolarimetry
Topic: Optical Metrology
Published: 8/1/2012
Authors: William Sparks, Thomas Avery Germer, John MacKenty, Frans Snik
Abstract: We present an approach to spectropolarimetry which requires neither moving parts nor time dependent modulation, and which o ers the prospect of achieving high sensitivity. The concept, which is one of those generically known as channeled polarimetry, ...

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