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Topic Area: Nanofabrication, Nanomanufacturing, and Nanoprocessing
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Displaying records 81 to 90 of 102 records.
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81. Polyelectrolyte Multilayers in Microfluidic Systems for Biological Applications
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 7/31/2014
Authors: Saugandhika Sarma Minnikanti, Aveek Gangopadhyay, Darwin R Reyes-Hernandez
Abstract: The formation of polyelectrolyte multilayers (PEMs) for the first time two decades ago demonstrating the assembly on charged substrates in a very simple and efficient way have proven to be a reliable method to obtain structures tunable at the nanomet ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=916103

82. Quantum Dot-DNA Origami Binding : A Single Particle, 3D, Real-Time Tracking Study
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 1/2/2013
Authors: Kan K. Du, Seung-Hyeon Ko, Gregg M. Gallatin, Heayoung Yoon, James Alexander Liddle, Andrew J. Berglund
Abstract: The binding process of quantum dots and DNA origami was monitored using a 3D, real-time, single-particle tracking system. Single-molecule binding events were directly observed and precise measurements of the diffusion coefficient and second-order pho ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912604

83. Quantum Dots Precisely Placed by Controlled Flow
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 8/24/2010
Author: James Alexander Liddle
Abstract: Ropp et al. report on the use of controlled flow to achieve nanometer precision placement of single quantum dots.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906621

84. Raman-induced Avoided Crossings in Adiabatic Optical Potentials: Observation of {lambda}8 Spatial Frequency in the Distribution of Atoms
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 6/17/1996
Authors: R Gupta, Jabez J McClelland, Robert Celotta, P Marte
Abstract: Chromium atoms traverse an optical potential and the resulting spatial distribution is measured by a new method. Atoms are collected on a substrate and an atomic force microscope is used to determine the flux as a function of position. An unexpected ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=620465

85. Rectangular Scale-Similar Etch Pits in Monocrystalline Diamond
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 9/15/2011
Authors: Craig Dyer McGray, Richard A Allen, Marc J Cangemi, Jon C Geist
Abstract: Etching of monocrystalline diamond in oxygen and water vapor at 1100° C through small pores in a silicon nitride film produced smooth-walled rectangular cavities. The cavities were imaged by electron microscope and measured by interferometric microsc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908075

86. Replica Molding Using Polymeric Materials: A Practical Step Toward Nanomanufacturing
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 2/1/1997
Authors: Y Xia, Jabez J McClelland, R Gupta, D Qin, Xuezeng Zhao, L Sohn, Robert Celotta, G M Whitesides
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=620479

87. Residual Layer Thickness Control and Metrology in Jet and Flash Imprint Lithography
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 4/10/2012
Authors: Ravikiran Attota, Shrawan Singhal, Sreenivasan S.V.
Abstract: Jet-and-Flash Imprint Lithography (J-FIL) has demonstrated capability of high-resolution patterning at low costs. For accurate pattern transfer using J-FIL, it is imperative to have control of the residual layer thickness (RLT) of cured resist undern ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910872

88. Robust Auto-Alignment Technique for Orientation-Dependent Etching of Nanostructures
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 5/29/2012
Authors: Craig Dyer McGray, Richard J Kasica, Ndubuisi George Orji, Ronald G Dixson, Michael W Cresswell, Richard A Allen, Jon C Geist
Abstract: A robust technique is presented for auto-aligning nanostructures to slow-etching crystallographic planes in materials with diamond cubic structure. Lithographic mask patterns are modified from the intended dimensions of the nanostructures to compen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908076

89. SI Traceability: Current status and future trends for forces below 10 micronewtons
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 9/24/2009
Author: Jon Robert Pratt
Abstract: Measurements related to nano- and micro- scale science, technology, and manufacturing are pushing the limits of detectable mechanical, electrical, and chemical quantities to ever smaller values, raising important questions regarding how best to exten ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901419

90. Self-Assembled Monolayers Exposed by Metastable Argon and Metastable Helium for Neutral Atom Lithography and Atomic Beam Imaging
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 9/1/1997
Authors: A Bard, K K Berggren, J L Wilbur, John D Gillaspy, S L. Rolston, Jabez J McClelland, William D Phillips, M Prentiss, G M Whitesides
Abstract: We used a beam of noble gas atoms in a metastable excited state to expose a thin (1.5nm self-assembled monolayer resist applied over a gold-coated silicon wafer. We determined exposure damage as a function of dose of metastable atoms by processing t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101919



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