NIST logo

Publications Portal

You searched on:
Topic Area: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Sorted by: title

Displaying records 81 to 90 of 98 records.
Resort by: Date / Title


81. Raman-induced Avoided Crossings in Adiabatic Optical Potentials: Observation of {lambda}8 Spatial Frequency in the Distribution of Atoms
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 6/17/1996
Authors: R Gupta, Jabez J McClelland, Robert Celotta, P Marte
Abstract: Chromium atoms traverse an optical potential and the resulting spatial distribution is measured by a new method. Atoms are collected on a substrate and an atomic force microscope is used to determine the flux as a function of position. An unexpected ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=620465

82. Rectangular Scale-Similar Etch Pits in Monocrystalline Diamond
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 9/15/2011
Authors: Craig Dyer McGray, Richard A Allen, Marc J Cangemi, Jon C Geist
Abstract: Etching of monocrystalline diamond in oxygen and water vapor at 1100° C through small pores in a silicon nitride film produced smooth-walled rectangular cavities. The cavities were imaged by electron microscope and measured by interferometric microsc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908075

83. Replica Molding Using Polymeric Materials: A Practical Step Toward Nanomanufacturing
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 2/1/1997
Authors: Y Xia, Jabez J McClelland, R Gupta, D Qin, Xuezeng Zhao, L Sohn, Robert Celotta, G M Whitesides
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=620479

84. Residual Layer Thickness Control and Metrology in Jet and Flash Imprint Lithography
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 4/10/2012
Authors: Ravikiran Attota, Shrawan Singhal, Sreenivasan S.V.
Abstract: Jet-and-Flash Imprint Lithography (J-FIL) has demonstrated capability of high-resolution patterning at low costs. For accurate pattern transfer using J-FIL, it is imperative to have control of the residual layer thickness (RLT) of cured resist undern ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910872

85. Robust Auto-Alignment Technique for Orientation-Dependent Etching of Nanostructures
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 5/29/2012
Authors: Craig Dyer McGray, Richard J Kasica, Ndubuisi George Orji, Ronald G Dixson, Michael W Cresswell, Richard A Allen, Jon C Geist
Abstract: A robust technique is presented for auto-aligning nanostructures to slow-etching crystallographic planes in materials with diamond cubic structure. Lithographic mask patterns are modified from the intended dimensions of the nanostructures to compen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908076

86. SI Traceability: Current status and future trends for forces below 10 micronewtons
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 9/24/2009
Author: Jon Robert Pratt
Abstract: Measurements related to nano- and micro- scale science, technology, and manufacturing are pushing the limits of detectable mechanical, electrical, and chemical quantities to ever smaller values, raising important questions regarding how best to exten ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901419

87. Self-Assembled Monolayers Exposed by Metastable Argon and Metastable Helium for Neutral Atom Lithography and Atomic Beam Imaging
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 9/1/1997
Authors: A Bard, K K Berggren, J L Wilbur, John D Gillaspy, S L. Rolston, Jabez J McClelland, William D Phillips, M Prentiss, G M Whitesides
Abstract: We used a beam of noble gas atoms in a metastable excited state to expose a thin (1.5nm self-assembled monolayer resist applied over a gold-coated silicon wafer. We determined exposure damage as a function of dose of metastable atoms by processing t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101919

88. Separation and Metrology of Nanoparticles by Nanofluidic Size Exclusion
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 8/11/2010
Authors: Samuel M Stavis, Jon C Geist, Michael Gaitan
Abstract: A nanofluidic approach to the separation and metrology of nanoparticles is demonstrated. Advantages of this approach include nanometer-scale resolution, nanometer-scale to submicrometer-scale range, mitigation of hydrodynamic and diffusional limitat ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904215

89. Small fluctuations in epitaxial growth via conservative noise
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 7/7/2011
Authors: Paul Nathan Patrone, Rongrong Wang, Dionisios Margetis
Abstract: We study the combined effect of growth (material deposition from above) and nearest-neighbor entropic and force-dipole interactions in a stochastically perturbed system of N line defects (steps) on a vicinal crystal surface in 1+1 dimensions. Firs ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908523

90. Strong Casimir force reduction by metallic surface nanostructuring
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 9/27/2013
Authors: Francesco Intravaia, Stefan T. Koev, Il Woong Jung, Albert A. Talin, Paul S Davids, Ricardo Decca, Vladimir A Aksyuk, Diego A. R. Dalvit, Daniel Lopez
Abstract: The Casimir force is a quantum-mechanical interaction arising from vacuum fluctuations of the electromagnetic (EM) field and is technologically significant in micro- and nanomechanical systems. Despite rapid progress in nanophotonics, the goal of e ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910133



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series