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Topic Area: Nanofabrication, Nanomanufacturing, and Nanoprocessing
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Displaying records 71 to 80 of 98 records.
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71. Novel nano-structured Metal-Semiconductor-Metal photodetector with high peak voltage
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 6/22/2009
Authors: Paul D Hale, Dylan F Williams, Tomoko Borsa, B. J. VanZeghbroeck
Abstract: A novel nano-structured metal-semiconductor-metal photodetector consisting of interdigitated metal fingers and nanodots is successfully fabricated on a semi-insulating GaAs substrate by electron beam lithography, and integrated with an on-chip ground ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901074

72. O2 A-band line parameters to support atmospheric remote sensing. Part II: The rare isotopologues
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 7/21/2011
Authors: Joseph Terence Hodges, David A Long, Daniel K Havey, S. S. Yu, M Okumura, Charles E Miller
Abstract: Frequency-stabilized cavity ring-down spectroscopy (FS-CRDS) was employed to measure over 100 transitions in the R-branch of the b1Σg+←X3Σg-(0,0) band for the rare O2 isotopologues. The use of 17O- and 18O-enriched mixtures allowed fo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907932

73. On CD-AFM bias related to probe bending
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 4/9/2012
Authors: Vladimir A Ukraintsev, Ndubuisi George Orji, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Richard M Silver
Abstract: Critical Dimension AFM (CD-AFM) is a widely used reference metrology. To characterize modern semiconductor devices, very small and flexible probes, often 15 nm to 20 nm in diameter, are now frequently used. Several recent publications have reported ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910903

74. Optical State-Preparation of Atoms
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 4/16/1996
Author: Jabez J McClelland
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=620439

75. Optical volumetric inspection of sub-20 nm patterned defects with wafer noise
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 4/2/2014
Authors: Bryan M Barnes, Francois R. Goasmat, Martin Y Sohn, Hui Zhou, Richard M Silver, Andras Vladar, Abraham Arceo
Abstract: We have previously introduced a new data analysis method that more thoroughly utilizes scattered optical intensity data collected during defect inspection using bright-field microscopy. This volumetric approach allows conversion of focus resolved 2-D ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915807

76. Organic Electronics: Challenges and Opportunities
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 3/31/2010
Author: Calvin Chan
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905389

77. Patterned Defect & CD Metrology by TSOM Beyond the 22 nm Node
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 4/10/2012
Authors: Ravikiran (Ravikiran) Attota, Abraham Arceo, Benjamin Bunday, Victor Vertanian
Abstract: Through-focus scanning optical microscopy (TSOM) is a novel method [1-8] that allows conventional optical microscopes to collect dimensional information down to the nanometer level by combining two-dimensional optical images captured at several throu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910910

78. Patterning of Octadecylsiloxane Self-assembled Monolayers on Si(100) using Ar(^u3^P^d0^,2) Atoms
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 5/1/1999
Authors: Shannon Bradley Hill, C Haich, F Dunning, G Walters, Jabez J McClelland, Robert Celotta, H Craighead, J Han, D Tannenbaum
Abstract: ^u^^d^ We report the use of metastable (Ar^u3^P^d0,2^) atoms and a physical mask to pattern octadecylsiloxane self-assembled monolayers grown directly onsilicon surfaces. The damage to the monolayer is confirmed using lateral force microscopy, change ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=620509

79. Quantum Dot-DNA Origami Binding : A Single Particle, 3D, Real-Time Tracking Study
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 1/2/2013
Authors: Kan K. Du, Seung-Hyeon Ko, Gregg M. Gallatin, Heayoung Yoon, James Alexander Liddle, Andrew J. Berglund
Abstract: The binding process of quantum dots and DNA origami was monitored using a 3D, real-time, single-particle tracking system. Single-molecule binding events were directly observed and precise measurements of the diffusion coefficient and second-order pho ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912604

80. Quantum Dots Precisely Placed by Controlled Flow
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 8/24/2010
Author: James Alexander Liddle
Abstract: Ropp et al. report on the use of controlled flow to achieve nanometer precision placement of single quantum dots.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906621



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