NIST logo

Publications Portal

You searched on:
Topic Area: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Sorted by: title

Displaying records 71 to 80 of 100 records.
Resort by: Date / Title


71. Novel nano-structured Metal-Semiconductor-Metal photodetector with high peak voltage
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 6/22/2009
Authors: Paul D Hale, Dylan F Williams, Tomoko Borsa, B. J. VanZeghbroeck
Abstract: A novel nano-structured metal-semiconductor-metal photodetector consisting of interdigitated metal fingers and nanodots is successfully fabricated on a semi-insulating GaAs substrate by electron beam lithography, and integrated with an on-chip ground ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901074

72. O2 A-band line parameters to support atmospheric remote sensing. Part II: The rare isotopologues
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 7/21/2011
Authors: Joseph Terence Hodges, David A Long, Daniel K Havey, S. S. Yu, M Okumura, Charles E Miller
Abstract: Frequency-stabilized cavity ring-down spectroscopy (FS-CRDS) was employed to measure over 100 transitions in the R-branch of the b1Σg+←X3Σg-(0,0) band for the rare O2 isotopologues. The use of 17O- and 18O-enriched mixtures allowed fo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907932

73. On CD-AFM bias related to probe bending
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 4/9/2012
Authors: Vladimir A Ukraintsev, Ndubuisi George Orji, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Richard M Silver
Abstract: Critical Dimension AFM (CD-AFM) is a widely used reference metrology. To characterize modern semiconductor devices, very small and flexible probes, often 15 nm to 20 nm in diameter, are now frequently used. Several recent publications have reported ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910903

74. Optical State-Preparation of Atoms
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 4/16/1996
Author: Jabez J McClelland
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=620439

75. Optical volumetric inspection of sub-20 nm patterned defects with wafer noise
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 4/2/2014
Authors: Bryan M Barnes, Francois R. Goasmat, Martin Y Sohn, Hui Zhou, Richard M Silver, Andras Vladar, Abraham Arceo
Abstract: We have previously introduced a new data analysis method that more thoroughly utilizes scattered optical intensity data collected during defect inspection using bright-field microscopy. This volumetric approach allows conversion of focus resolved 2-D ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915807

76. Organic Electronics: Challenges and Opportunities
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 3/31/2010
Author: Calvin Chan
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905389

77. Pattern Transfer of 3D structures into silicon with atomically traceable placement and size control
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 7/17/2014
Authors: Josh Ballard, Stephen McDonnell, Don Dick, Maia Bischof, Joseph Fu, D Jaeger, James Owen , w Owen, Justin Alexander, Udi Fuchs, Pradeep Narayanan Namboodiri, Kai Li, John Randall, Robert Wallace, Yves Chabal, Richard Reidy, Richard M Silver
Abstract: Reducing the scale of etched nanostructures below the 10 nm range eventually will require an atomic scale understanding of the masks being used in order to maintain exquisite control over both feature size and feature density. Here, we demonstrate a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915583

78. Patterned Defect & CD Metrology by TSOM Beyond the 22 nm Node
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 4/10/2012
Authors: Ravikiran (Ravikiran) Attota, Abraham Arceo, Benjamin Bunday, Victor Vertanian
Abstract: Through-focus scanning optical microscopy (TSOM) is a novel method [1-8] that allows conventional optical microscopes to collect dimensional information down to the nanometer level by combining two-dimensional optical images captured at several throu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910910

79. Patterning of Octadecylsiloxane Self-assembled Monolayers on Si(100) using Ar(^u3^P^d0^,2) Atoms
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 5/1/1999
Authors: Shannon Bradley Hill, C Haich, F Dunning, G Walters, Jabez J McClelland, Robert Celotta, H Craighead, J Han, D Tannenbaum
Abstract: ^u^^d^ We report the use of metastable (Ar^u3^P^d0,2^) atoms and a physical mask to pattern octadecylsiloxane self-assembled monolayers grown directly onsilicon surfaces. The damage to the monolayer is confirmed using lateral force microscopy, change ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=620509

80. Polyelectrolyte Multilayers in Microfluidic Systems for Biological Applications
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 7/31/2014
Authors: Saugandhika Sarma Minnikanti, Aveek Gangopadhyay, Darwin R Reyes-Hernandez
Abstract: The formation of polyelectrolyte multilayers (PEMs) for the first time two decades ago demonstrating the assembly on charged substrates in a very simple and efficient way have proven to be a reliable method to obtain structures tunable at the nanomet ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=916103



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series