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You searched on: Topic Area: Nanofabrication, Nanomanufacturing, and Nanoprocessing Sorted by: title

Displaying records 21 to 30 of 38 records.
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21. Nanometrology Using Through-Focus Scanning Optical Microscopy Method
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 12/21/2011
Authors: Ravikiran Attota, Richard M Silver
Abstract: We present an initial review of a novel through-focus scanning optical microscopy (TSOM) imaging method that produces nanometer dimensional measurement sensitivity using a conventional bright-field optical microscope. In the TSOM method a target is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905395

22. Nanoparticle Separation and Metrology by Three-Dimensional Nanofluidic Size Exclusion
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 6/8/2010
Authors: Samuel M Stavis, Jon C Geist, Michael Gaitan
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905421

23. Nanoparticle Separation and Metrology by Three-Dimensional Nanofluidic Size Exclusion"
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 6/7/2010
Authors: Samuel M Stavis, Jon C Geist, Michael Gaitan
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907081

24. Nanostructured Solar Cells Have Improved Charge Collection and Self-Cleaning Properties
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 2/8/2010
Author: Fred Sharifi
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904960

25. O2 A-band line parameters to support atmospheric remote sensing. Part II: The rare isotopologues
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 7/21/2011
Authors: Joseph Terence Hodges, David A Long, Daniel K Havey, S. S. Yu, M Okumura, Charles E Miller
Abstract: Frequency-stabilized cavity ring-down spectroscopy (FS-CRDS) was employed to measure over 100 transitions in the R-branch of the b1Σg+←X3Σg-(0,0) band for the rare O2 isotopologues. The use of 17O- and 18O-enriched mixtures allowed fo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907932

26. On CD-AFM bias related to probe bending
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 4/9/2012
Authors: Vladimir A Ukraintsev, Ndubuisi George Orji, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Richard M Silver
Abstract: Critical Dimension AFM (CD-AFM) is a widely used reference metrology. To characterize modern semiconductor devices, very small and flexible probes, often 15 nm to 20 nm in diameter, are now frequently used. Several recent publications have reported ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910903

27. Optical volumetric inspection of sub-20 nm patterned defects with wafer noise
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 4/2/2014
Authors: Bryan M Barnes, Francois R. Goasmat, Martin Y Sohn, Hui Zhou, Richard M Silver, Andras Vladar, Abraham Arceo
Abstract: We have previously introduced a new data analysis method that more thoroughly utilizes scattered optical intensity data collected during defect inspection using bright-field microscopy. This volumetric approach allows conversion of focus resolved 2-D ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915807

28. Organic Electronics: Challenges and Opportunities
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 3/31/2010
Author: Calvin Chan
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905389

29. Pattern Transfer of Hydrogen Depassivation Lithography Patterns into Silicon with Atomically Traceable Placement and Size Control
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 7/17/2014
Authors: Josh Ballard, Stephen McDonnell, Don Dick, Maia Bischof, Joseph Fu, D Jaeger, James Owen , w Owen, Justin Alexander, Udi Fuchs, Pradeep Narayanan Namboodiri, Kai Li, John Randall, Robert Wallace, Yves Chabal, Richard Reidy, Richard M Silver
Abstract: Reducing the scale of etched nanostructures below the 10 nm range eventually will require an atomic scale understanding of the masks being used in order to maintain exquisite control over both feature size and feature density. Here, we demonstrate a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915583

30. Preparation of silver nanoparticle loaded cotton threads to facilitate measurement development for textile applications
Series: Special Publication (NIST SP)
Report Number: 1200-8
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 1/26/2015
Authors: Justin M Gorham, Karen E Murphy, Jingyu Liu, Dimitri Tselenchuk, Gheorghe Stan, Thao M. Nguyen, Richard D Holbrook, Michael R Winchester, Robert Francis Cook, Robert MacCuspie, Vincent A Hackley
Abstract: FOREWORD This NIST special publication (SP) is one in a series of NIST SPs that address research needs articulated in the National Nanotechnology Initiative (NNI) Environmental, Health, and Safety Research Strategy published in 2011 [1]. This ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=916567



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