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41. The evaluation of photo/e-beam complementary grayscale lithography for high topography 3D structure
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 3/29/2013
Authors: Liya Yu, Richard J Kasica, Robert Dennis Newby, Lei Chen, Vincent K Luciani
Abstract: This article demonstrates and evaluates photo/e-beam grayscale complementary lithography processes for the fabrication of large area, high topography grayscale structure. The combination of these two techniques capitalizes on the capability of photol ...

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