NIST logo

Publications Portal

You searched on: Topic Area: Characterization, Nanometrology, and Nanoscale Measurements Sorted by: date

Displaying records 121 to 130 of 132 records.
Resort by: Date / Title


121. Transmission Electron Diffraction from nanoparticles, nanowires and thin films in an SEM using conventional EBSD equipment
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 1/1/2010
Authors: Roy Howard Geiss, Robert R Keller, David Thomas Read
Abstract: We describe a new scanning electron microscope (SEM) method for obtaining and analyzing the crystallographic structure and orientation in nanoparticles and ultrathin films using conventional electron backscatter diffraction (EBSD) equipment.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905080

122. Spray Deposited Poly-3-hexylthiophene Thin Film Transistors
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/11/2009
Authors: Calvin Chan, Lee J Richter, David Germack, Brad Conrad, Daniel A Fischer, Dean M DeLongchamp, David J Gundlach
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905385

123. Fabrication with Flip-Chip Lamination
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 11/15/2009
Authors: Mariona Coll Bau, Curt A Richter, Christina Ann Hacker
Abstract: Fabrication with Flip-Chip Lamination , Mariona Coll, DR Hines, CA Richter, CA Hacker, Nanotechnology colloquium, Wake Forest University, 11-09.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907071

124. Fabrication with Flip-Chip Lamination
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 10/15/2009
Authors: Mariona Coll Bau, Curt A Richter, Christina Ann Hacker
Abstract: Fabrication with Flip-Chip Lamination , Mariona Coll, DR Hines, CA Richter, CA Hacker, MRSEC surface physics colloquium, University of Maryland, College Park, 10-09.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907072

125. Size Measurement of Nanoparticles using Atomic Force Microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 10/1/2009
Authors: Jaroslaw Grobelny, Frank W DelRio, Pradeep Narayanan Namboodiri, Doo-In Kim, Vincent A Hackley, Robert Francis Cook
Abstract: In this assay protocol, procedures for dispersing gold nanoparticles on various surfaces such that they are suitable for imaging and height measurement via intermittent contact mode AFM are first described. The procedures for AFM calibration and ope ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854085

126. First approaches to standard protocols and reference materials for the assessment of potential hazards associated with nanomaterials
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 9/19/2009
Authors: Iseult Lynch, Hans Bouwmeester, Hans Marvin, Alan Casey, Gordon Chambers, Markus Berges, Martin Clift, Teresa Fernandes, Lise Fjellsbo, Lucienne Juillerat, Gert Roebben, Christoph Klein, Qinglan Wu, Vincent A Hackley, Jean-Pierre Kaiser, Wolfgang Kreyling, C. Michael Garner, Peter Hatto, Kenneth Dawson, Michael Riediker
Abstract: This report presents the outcome of the discussions of 60 experts in the field of safety assessment of manufactured NMs from academia, industry, government and non-profit organizations on some of the critical issues pertaining to the development of s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902692

127. Scatterometry for in situ measurement of pattern reflow in nanoimprinted polymers
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/9/2008
Authors: Heather J Patrick, Thomas Avery Germer, Yifu Ding, Hyun Wook Ro, Lee J Richter, Christopher L Soles
Abstract: We use optical scatterometry to extract the time evolution of the profile of nanoimprinted lines in low and high molecular mass polymer gratings during reflow at the glass transition temperature. The data are obtained continuously during the anneal ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900878

128. Characterization of Probe Dynamic Behaviors in Critical Dimension Atomic Force Microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 10/15/2008
Authors: Shaw C Feng, Che B. Joung, Theodore Vincent Vorburger
Abstract: Critical Dimension Atomic Force Microscopy (CD-AFM) is a primary means to measure the geometric shapes of walls and trenches on the nanometer scale in laboratories supporting the electronic industry. As the widths of commercially available CD-AFM pro ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824690

129. Through-focus Scanning and Scatterfield Optical Methods for Advanced Overlay Target Analysis
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 9/1/2008
Authors: Ravikiran Attota, Michael T. Stocker, Richard M Silver, Nathanael A Heckert, Hui Zhou, Richard J Kasica, Lei NMN Chen, Ronald G Dixson, Ndubuisi George Orji, Bryan M Barnes, Peter Lipscomb
Abstract: In this paper we present overlay measurement techniques that use small overlay targets for advanced semiconductor applications. We employ two different optical methods to measure overlay using modified conventional optical microscope platforms. They ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902294

130. Structure Characterization of Nanoporous Interlevel Dielectric Thin Films With X-Ray and Neutron Radiation
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/6/2007
Authors: Christopher L Soles, Hae-Jeong Lee, B D. Vogt, Eric K Lin, Wen-Li Wu
Abstract: The structure characterization of nanoporous interlevel dielectric (ILD) thin films is challenging because of the small sample volumes and nanometer dimensions of the pores. In this chapter, we review characterization methods for porous ILD material ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852526



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series