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Topic Area: Synchrotron

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1. Non-destructive Measurement of the Residual Stresses in Copper Through-Silicon Vias using Synchrotron Based Micro-beam X-ray Diffraction
Topic: Synchrotron
Published: 7/1/2014
Authors: Chukwudi Azubuike Okoro, Lyle E Levine, Yaw S Obeng, Klaus Hummler, Ruqing Xu
Abstract: In this study, we report a new method for achieving depth resolved determination of the full stress tensor in buried Cu through-silicon vias (TSVs), using synchrotron based X-ray micro-diffraction technique. Two adjacent Cu TSVs were analyzed; on ...

2. Synchrotron-Based Measurement of the Impact of Thermal Cycling on the Evolution of Stresses in Cu Through-Silicon Via
Topic: Synchrotron
Published: 6/30/2014
Authors: Chukwudi Azubuike Okoro, Lyle E Levine, Ruqing Xu, Klaus Hummler, Yaw S Obeng
Abstract: One of the main causes of failure during the lifetime of microelectronics devices is their exposure to fluctuating temperatures. In this work, synchrotron-based X-ray micro-diffraction is used to study the evolution of stresses in copper through-sili ...

3. National Synchrotron Light Source II: Long Islands state-of-the-art X-ray microscope
Topic: Synchrotron
Published: 5/20/2014
Authors: Bruce D Ravel, Scott Calvin, Linnea Russell
Abstract: This is an education and outreach effort that we have undertaken for the benefit of the Photon Sciences Users' Executive Committee. The UEC is the group that represents the user of the National Synchrotron Light Source, which is currently in its fina ...

4. Sample Thickness and Quantitative Concentration Measurements in XANES Spectroscopy
Topic: Synchrotron
Published: 5/16/2014
Authors: Alessandra C Leri, Bruce D Ravel
Abstract: While XANES spectroscopy is an established tool for quantitative information on chemical structure and speciation, elemental concentrations are generally quantified by other methods. The edge step in XANES spectra represents the absolute amount of t ...

5. X-Ray Micro-Beam Diffraction Determination of Full Stress Tensors in Cu TSVs
Topic: Synchrotron
Published: 5/28/2013
Authors: Chukwudi Azubuike Okoro, Lyle E Levine, Oleg A Kirillov, Yaw S Obeng, Ruqing Xu, Jonathan Z Tischler, Wenjun Liu, Klaus Hummler
Abstract: We report the first non-destructive, depth resolved determination of the full stress tensor in Cu through-silicon vias (TSVs), using synchrotron based micro-beam X-ray diffraction. Two adjacent Cu TSVs were studied; one deliberately capped with SiO2, ...

6. The NIST EUV facility for advanced photoresist qualification using the witness-sample test
Topic: Synchrotron
Published: 8/29/2011
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Lee J Richter, Thomas B Lucatorto, J. van Dijk, C. Kaya, N. Harned, R. Hoefnagels, M. Silova, J. Steinhoff
Abstract: Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be qualified to ensure that they will not excessively contaminate the scanner optics or other parts of the vacuum environment of the scanner. At the National Institute ...

7. Metrologia
Topic: Synchrotron
Published: 7/8/2011
Authors: Uwe Arp, Zhigang Li, Ping-Shine Shaw, Mathias Richter, Roman Klein, Wolfgang Paustian, Reiner Thornagel
Abstract: We report on a successful bilateral inter-comparison between the Physikalisch-Technische Bundesanstalt (PTB) and the National Institute of Standards and Technology (NIST). In both laboratories deuterium lamps were calibrated using the calculability o ...

8. Bilateral NIST-PTB Comparison of Spectral Responsivity in the VUV
Topic: Synchrotron
Published: 1/20/2011
Authors: Uwe Arp, Ping-Shine Shaw, Zhigang Li, Alexander Gottwald, Mathias Richter
Abstract: To compare the calibration capabilities for the spectral responsivity in the vacuum-ultraviolet spectral region between 135 nm and 250 nm, PTB and NIST agreed on a bilateral comparison. Calibrations of semiconductor photodiodes as transfer detectors ...

9. Synchrotron Radiation Based Irradiance Calibration From 200 nm to 400 nm at SURF III
Topic: Synchrotron
Published: 1/1/2007
Authors: Uwe Arp, Charles E Gibson, Keith R Lykke, Albert C Parr, Robert D. Saunders, D J Shin, Ping-Shine Shaw, Zhigang Li, Howard W Yoon
Abstract: A new facility for measuring source irradiance was commissioned recently at the National Institute of Standards and Technology (NIST). The facility uses the calculable radiation from the Synchrotron Ultraviolet Radiation Facility (SURF III) as the pr ...

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