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You searched on: Author: Robert Keller

Displaying records 1 to 10 of 30 records.
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1. Detection of Atomic Force Microscopy Cantilever Displacement with a Transmitted Electron Beam
Published: 7/29/2016
Authors: Ryan B Wagner, Taylor J Woehl, Robert R Keller, Jason Philip Killgore
Abstract: Cantilever motion in atomic force microscopy (AFM) systems is typically measured with an optical lever system. The response time of AFM cantilevers can be decreased by reducing the size of the cantilever; however, the fastest AFM cantilevers are ...

2. Firearm Serial Number Restoration with Electron Backscatter Diffraction
Published: 9/23/2015
Authors: Ryan Michael White, Robert R Keller
Abstract: N/A (manuscript is abstract)

3. An Analytical Scattering Model for Low Energy Annular Dark Field Transmission Scanning Electron Microscopy
Published: 9/22/2015
Authors: Taylor J Woehl, Jason D Holm, Robert R Keller
Abstract: Here we employ an analytical electron scattering model to show that the decrease in ADF t-SEM contrast of gold nanoparticles on carbon films is consistent with a competition between mass-thickness and atomic number contrast. Images of gold nanoparti ...

4. Beam broadening in transmission EBSD
Published: 3/16/2015
Authors: Robert R Keller, Katherine P. Rice, Mark Stoykovich
Abstract: Transmission electron backscatter diffraction (t-EBSD), also known as transmission electron forward scatter diffraction (t-EFSD) or transmission Kikuchi diffraction in the SEM (TKD-SEM), can provide significant improvements in spatial resolution ...

5. Restoration of firearm serial numbers with electron backscatter diffraction (EBSD)
Published: 2/9/2015
Authors: Ryan Michael White, Robert R Keller
Abstract: Firearm serial numbers are a critical identifying mark, and restoration of destroyed serial numbers is often crucial for prosecution of a criminal case. Currently available methods, including acid etching and relief polishing, present serious limita ...

6. Specimen-thickness effects on transmission Kikuchi patterns in the scanning electron microscope
Published: 3/24/2014
Authors: Katherine P. Rice, Robert R Keller, Mark Stoykovich
Abstract: We report the effects of varying specimen thickness onthe generation of transmission Kikuchi patterns in the scanning electron microscope. Diffraction patterns sufficient for automated indexing were observed from films spanning nearly three orders of ...

7. New Measurements on the Minimum and Maximum Sample Sizes in t-EBSD
Published: 10/9/2013
Authors: Roy H. Geiss, Robert R Keller, Katherine P. Rice
Abstract: The technique of acquiring transmission electron diffraction patterns in the scanning electron microscope, SEM, using components of commercially available electron backscattered diffraction equipment, EBSD, normally used in a reflection geometry, was ...

8. Giant Secondary Grain Growth in Cu Films on Sapphire
Published: 8/1/2013
Authors: David L. Miller, Mark W Keller, Justin M Shaw, Katherine P. Rice, Robert R Keller, Kyle M. Diederichsen
Abstract: Single crystal metal films on insulating substrates are attractive for microelectronics and other applications, but they are difficult to achieve on macroscopic length scales. The conventional approach to obtaining such films is epitaxial growth at h ...

9. What's in a 'NYM?
Published: 7/1/2013
Author: Robert R Keller
Abstract: The field of electron microscopy, by its very diverse nature, abounds with acronyms: AEM, EF-TEM, ESEM, FE-SEM, HREM, HRTEM, HVEM, SEM, STEM, TEM, and VP-SEM, to name some instruments alone. Add in the different forms of data that these instrume ...

10. Transmission EBSD in the Scanning Electron Microscope
Published: 5/1/2013
Authors: Roy H. Geiss, Katherine P. Rice, Robert R Keller
Abstract: A new method for obtaining Kikuchi diffraction patterns from thin specimens in transmission has been developed for use in the SEM, scanning electron microscope, using a conventional electron backscatter diffraction (EBSD) detector and with a slight m ...

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  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series