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Author: Mark Vaudin

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1. Accuracy and Resolution of Nanoscale Strain Measurement Techniques
Published: 3/26/2013
Authors: William A Osborn, Lawrence H Friedman, Mark D Vaudin, Stephan J Stranick, Michael S. Gaither, Justin M Gorham, Victor Vartanian, Robert Francis Cook
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913178

2. Effect of Tin Doping on alpha-Fe2O3 Photoanodes for Water Splitting
Published: 6/28/2012
Authors: Christopher Bohn, Amit Kumar Agrawal, Erich C. Walter, Mark D Vaudin, Andrew A Herzing, Paul M Haney, Albert A. Talin, Veronika A Szalai
Abstract: Sputtered-deposited films of α-Fe2O3 of thickness 600 nm were investigated as photoanodes for solar water splitting and found to have photocurrents as high as 0.8 mA/cm2 at 1.23 V vs. the reversible hydrogen electrode (RHE). The incorporati ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911006

3. Micro-scale measurement and modeling of stress in silicon surrounding a tungsten-filled through-silicon via
Published: 10/11/2011
Authors: Ryan P. Koseski, William A Osborn, Stephan J Stranick, Frank W DelRio, Mark D Vaudin, Thuy Dao, Vance H. Adams, Robert Francis Cook
Abstract: The stress in silicon surrounding a tungsten-filled through-silicon via (TSV) is measured using confocal Raman microscopy line scans across the TSV both before and after etch removal of an oxide stack used as a mask to define the TSV during fabricati ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908908

4. Report on VAMAS Round Robin of ISO 13067: Microbeam Analysis,Electron Backscatter Diffraction,Measurement of Average Grain Size
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 7814
Published: 9/14/2011
Authors: Adam A Creuziger, Mark D Vaudin
Abstract: The authors recently participated in a round robin evaluation of a new ISO document draft, ISO 13067: Microbeam analysis ‹ Electron backscatter diffraction ‹ Measurement of average grain size. This report details the results of the study, some of th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909545

5. Enhanced Mass Transport in Ultra-Rapidly-Heated Ni/Si Thin-Film Multilayers
Published: 11/15/2009
Authors: Lawrence P. Cook, Richard E Cavicchi, Nabil Bassim, Susie Eustis, Winnie K Wong-Ng, Igor Levin, Ursula R Kattner, Carelyn E Campbell, Christopher B Montgomery, William F. Egelhoff Jr., Mark D Vaudin
Abstract: We have investigated multilayer and bilayer Ni/Si thin films by nano-differential scanning calorimetry (DSC) at ultra rapid scan rates, in a temperature-time regime not accessible with conventional apparatus. DSC experiments were completed at slower ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900235

6. Measurement of heat capacity and enthalpy of formation of Nickel Silicide using Nano-calorimetry
Published: 11/2/2009
Authors: Ravi Kummamuru, Lito De La Rama, Liang Hu, Mark D Vaudin, Mikhail Efremov, Martin L Green, David A LaVan, Leslie Allen
Abstract: We present characterization of energetics of the reaction between nickel and silicon thin films using differential scanning nano-calorimetry (nano-DSC). For the first time, nano-DSC measurements up to 850 °C and of enthalpy of thin film reactions hav ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902298

7. Stress-Intensity Factor and Toughness Measurement at the Nanoscale using Confocal Raman Microscopy
Published: 7/12/2009
Authors: Robert Francis Cook, Yvonne Beatrice Gerbig, Mark D Vaudin, Jeroen Schoenmaker, Stephan J Stranick
Abstract: A confocal Raman microscopy technique is presented that allows stress measurement at the nanoscale, which in turn enables measurement of stress-intensity factors (SIF) at crack tips and thus toughness to be estimated. Peak-fitting and super-resolutio ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900910

8. Effect of crystallographic orientation on phase transformations during indentation of silicon
Published: 3/9/2009
Authors: Yvonne Beatrice Gerbig, Dylan Morris, Stephan J Stranick, Mark D Vaudin, Robert Francis Cook
Abstract: In a statistical nanoindentation study using a spherical probe, the effect of crystallographic orientation on the phase transformation of silicon (Si) was investigated. The presence and pressure at which events associated with phase transformation oc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854143

9. Experimental and Simulation Studies of Resistivity of Nanoscale Copper Films
Published: 2/19/2009
Authors: Emre Yarimbiyik, Harry A. Schafft, Richard A Allen, Mark D Vaudin, Mona Elwakkad Zaghloul
Abstract: The effect of film thickness on the resistivity of thin, evaporated copper films (approximately 10 nm to 150 nm thick) was determined from sheet resistance, film thickness, and mean grain-size measurements by using four-point probe, profilometer, and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32595

10. Structural and thermoelectric properties of Bi2Sr2Co2Oy thin films on LaAlO3 (100) and fused silica substrates
Published: 1/12/2009
Authors: Winnie K Wong-Ng, Mark D Vaudin, Shufang Wang, L Venimadhav, Shengming Guo, Ke Chen, Qi Li, A Soukiassian, D.G. Schlom, X.Q. Pan, D.G. Cahill, X. X. Xi
Abstract: We have grown Bi2Sr2Co2Oy thin films on LaAlO3 (100) and fused silica substrates by pulsed laser deposition. The films on LaAlO3 are c-axis oriented and partially in-plane aligned with multiple domains while the films on fused silica are preferred c- ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900129



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