NIST logo

Publications Portal

You searched on:
Author: Heather Patrick

Displaying records 1 to 10 of 22 records.
Resort by: Date / Title


1. The NIST Robotic Optical Scatter Instrument (ROSI) and its Application to BRDF Measurements of Diffuse Reflectance Standards for Remote Sensing
Published: 9/23/2013
Authors: Heather J Patrick, Clarence Joseph Zarobila, Thomas Avery Germer
Abstract: We describe the robotic optical scatter instrument (ROSI), a new robotic arm-based goniometer for in-plane and out-of-plane reflectance and bidirectional reflectance distribution function (BRDF) measurements of surfaces. The goniometer enables BRDF ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914430

2. Tunable Supercontinuum Fiber Laser Source for BRDF Measurements in the STARR II Gonioreflectometer
Published: 9/27/2012
Authors: Heather J Patrick, Clarence Joseph Zarobila, Thomas Avery Germer, Victor Alan Ying, Catherine C Cooksey, Benjamin K Tsai
Abstract: STARR II is a planned NIST facility for spectral measurements of specular reflectance and diffuse bidirectional reflectance distribution function (BRDF) that is the follow-on to the current NIST STARR (Spectral Tri-function Automated Reference Reflec ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912019

3. BRDF measurements of graphite used in high-temperature fixed point blackbody radiators: a multi-angle study at 405 nm and 658 nm
Published: 3/12/2012
Authors: Heather J Patrick, Leonard M Hanssen, Jinan Zeng, Thomas Avery Germer
Abstract: We have measured angle- and polarization-resolved, hemispherical bidirectional reflectance distribution function (BRDF) for two types of graphite used in the fabrication of high temperature fixed point (HTFP) blackbody cavities. Measurements were m ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909520

4. A Traceable Scatterometry Measurement of a Silicon Line Grating
Published: 5/26/2011
Authors: Thomas Avery Germer, Heather J Patrick, Ronald G Dixson
Abstract: In this paper, we present a spectroscopic Mueller matrix ellipsometry measurement of a silicon line grating with nominal pitch of 600 nm and line width 100 nm. An uncertainty analysis is performed on the measurement results. The results are compare ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908506

5. Mueller matrix bidirectional reflectance distribution function measurements and modeling of diffuse reflectance standards
Published: 4/20/2011
Authors: Thomas Avery Germer, Heather J Patrick
Abstract: We measure the Mueller matrix bidirectional reflectance distribution function (BRDF) of pressed and sintered powdered polytetrafluoroethylene (PTFE) reflectance standards for an incident angle of 75°. Rotationally averaged Mueller matrices from the m ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909321

6. Supercontinuum fiber laser source for reflectance calibrations in remote sensing
Published: 8/1/2010
Authors: Clarence Joseph Zarobila, Heather J Patrick
Abstract: The Optical Technology Division of the NIST provides reference measurements of specular and diffuse reflectance of materials, including measurements that provide traceability for diffuser plaques that are used as onboard calibration standards in remo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906175

7. Effect of Bandwidth and Numerical Aperture in Optical Scatterometry
Published: 3/1/2010
Authors: Thomas Avery Germer, Heather J Patrick
Abstract: We consider the effects of finite spectral bandwidth and numerical aperture in scatterometry measurements and discuss efficient integration methods based upon Gaussian quadrature in one dimension (for spectral bandwidth averaging) and two dimensions ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905013

8. Developing an Uncertainty Analysis for Optical Scatterometry
Published: 8/3/2009
Authors: Thomas Avery Germer, Heather J Patrick, Richard M Silver, Benjamin Bunday
Abstract: This article describes how an uncertainty analysis may be performed on a scatterometry measurement. A method is outlined for propagating uncertainties through a least-squares regression. The method includes the propagation of the measurement noise as ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901617

9. In situ measurement of annealing-induced line shape decay in nanoimprinted polymers using scatterometry
Published: 3/2/2009
Authors: Heather J Patrick, Thomas Avery Germer, Yifu Ding, Hyun W. Ro, Lee J Richter, Christopher L Soles
Abstract: Thermal embossing nanoimprint lithography (NIL) is an area of continuing interest because it allows direct patterning of nanoscale structures into a wide variety of functional polymer materials. Measuring the shape evolution of nanoimprinted lines d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901568

10. Scatterometry for in situ measurement of pattern reflow in nanoimprinted polymers
Published: 12/9/2008
Authors: Heather J Patrick, Thomas Avery Germer, Yifu Ding, Hyun W. Ro, Lee J Richter, Christopher L Soles
Abstract: We use optical scatterometry to extract the time evolution of the profile of nanoimprinted lines in low and high molecular mass polymer gratings during reflow at the glass transition temperature. The data are obtained continuously during the anneal ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900878



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series