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You searched on: Author: Steven Grantham

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1. Development and evaluation of interface-stabilized and reactive-sputtered oxide-capped multilayers for EUV lithography
Published: 3/16/2015
Authors: Michael Kriese, Jim Rodriguez, Gary Fournier, Steven E Grantham, Shannon Bradley Hill, John J Curry, Thomas B Lucatorto, Charles S Tarrio, Yuriy Platonov
Abstract: A critical component of high-performance EUV lithography source optics is the reflecting multilayer coating. The ideal multilayer will have both high reflectance and high stability to thermal load. Additionally the capping layers must provide resis ...

2. Development of an EUVL collector with infrared radiation suppression
Published: 8/1/2014
Authors: Steven E Grantham, Mike Kriese, Yuriy Platonov, Bodo Ehlers, Licai Jiang, Jim Rodriguez, Mueller Ulrich, Shayna khatri, Adam Magruder, Charles S Tarrio, Thomas B Lucatorto
Abstract: Laser-produced plasma (LPP) sources for extreme ultraviolet lithography (EUVL) systems utilize CO2 lasers operating with wavelength 10.6μm. Since multilayer-coated optics have high reflectivity for this infrared radiation (IR), a significant and ...

3. Improved measurement capabilities at the NIST EUV Reflectometry Facility
Published: 8/1/2014
Authors: Charles S Tarrio, Steven E Grantham, Thomas Avery Germer, Jack Clark Rife, Thomas B Lucatorto, Mike Kriese, Yuriy Platonov, Licai Jiang, Jim Rodriguez
Abstract: The NIST Extreme Ultraviolet (EUV) Reflectometry Facility was designed in the 1990s to accommodate the largest multilayer optics envisioned at that time. However, with increasing power requirements for an EUV scanner, source collection optics have g ...

4. A synchrotron beamline for extreme-ultraviolet photoresist testing
Published: 9/30/2011
Authors: Charles S Tarrio, Steven E Grantham, Shannon Bradley Hill, Nadir S. Faradzhev, Lee J Richter, Chester Knurek, Thomas B Lucatorto
Abstract: Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be evaluated for sensitivity and tested to ensure that they will not contaminate the scanner optics. The new NIST facility described here provides data on the contami ...

5. SURF III: A flexible Synchrotron Radiation Source for Radiometry and Research
Published: 9/1/2011
Authors: Uwe Arp, Charles W Clark, Lu Deng, Nadir S. Faradzhev, Alex P. Farrell, Mitchell L. Furst, Steven E Grantham, Edward W Hagley, Shannon Bradley Hill, Thomas B Lucatorto, Ping-Shine Shaw, Charles S Tarrio, Robert Edward Vest
Abstract: The calculability of synchrotron radiation (SR) makes electron storage rings wonderful light sources for radiometry. The broadband nature of SR allows coverage of the whole spectral region from the x-ray to the far-infrared. Compact low-energy storag ...

6. The NIST EUV facility for advanced photoresist qualification using the witness-sample test
Published: 8/29/2011
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Lee J Richter, Thomas B Lucatorto, J. van Dijk, C. Kaya, N. Harned, R. Hoefnagels, M. Silova, J. Steinhoff
Abstract: Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be qualified to ensure that they will not excessively contaminate the scanner optics or other parts of the vacuum environment of the scanner. At the National Institute ...

7. Optics contamination studies in support of high-throughput EUV lithography tools
Published: 3/25/2011
Authors: Shannon Bradley Hill, Fardina Asikin, Lee J Richter, Steven E Grantham, Charles S Tarrio, Thomas B Lucatorto, Sergiy Yulin, Mark Schurmann, Viatcheslav Nesterenko, Torsten Feigl
Abstract: We report on optics contamination rates induced by exposure to broad-bandwidth, high-intensity EUV radiation peaked near 8 nm in a new beamline at the NIST synchrotron. The peak intensity of 50 mW/mm2 allows extension of previous investigations of c ...

8. Transmission grating based EUV imaging spectrometer for time and space resolved impurity measurements
Published: 10/31/2010
Authors: Charles S Tarrio, Steven E Grantham, D Kumar, D Stutman, K Tritz, M Finkenthal, NSTX Team N/A
Abstract: A free standing transmission grating based imaging spectrometer in the extreme ultraviolet (EUV)range has been developed for the National Spherical Torus Experiment (NSTX). The spectrometer operates in a survey mode covering the approximate spectral ...

9. A Novel Wafer-plane Dosimeter for EUV Lithography
Published: 11/1/2009
Authors: Steven E Grantham, Charles S Tarrio
Abstract: Extreme Ultraviolet Lithography (EUVL) incorporates 13.5 nm light for patterning wafers and requires in-situ wafer-plane dosimetry that can be tailored to the requirements of an EUVL stepper‰s environment. There are several types of detectors that a ...

10. At-Wavelength Metrology for EUV Lithography at NIST
Published: 7/14/2009
Authors: Charles S Tarrio, Steven E Grantham, Robert Edward Vest, Thomas B Lucatorto
Abstract: The National Institute of Standards and Technology (NIST) is active in many areas of metrology impacting extreme ultraviolet lithography. We will describe our activities in the areas of reflectometry, pulsed radiometry, and long-term multiplayer mir ...

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