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Author: Thomas Lucatorto

Displaying records 1 to 10 of 101 records.
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1. A synchrotron beamline for extreme-ultraviolet photoresist testing
Published: 9/30/2011
Authors: Charles S Tarrio, Steven E Grantham, Shannon Bradley Hill, Nadir Sabirovich Faradzhev, Lee J Richter, Chester Knurek, Thomas B Lucatorto
Abstract: Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be evaluated for sensitivity and tested to ensure that they will not contaminate the scanner optics. The new NIST facility described here provides data on the contami ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908231

2. SURF III: A flexible Synchrotron Radiation Source for Radiometry and Research
Published: 9/1/2011
Authors: Uwe Arp, Charles W Clark, Lu Deng, Nadir Sabirovich Faradzhev, Alex P. Farrell, Mitchell L. Furst, Steven E Grantham, Edward Walter Hagley, Shannon Bradley Hill, Thomas B Lucatorto, Ping-Shine Shaw, Charles S Tarrio, Robert Edward Vest
Abstract: The calculability of synchrotron radiation (SR) makes electron storage rings wonderful light sources for radiometry. The broadband nature of SR allows coverage of the whole spectral region from the x-ray to the far-infrared. Compact low-energy storag ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906750

3. The NIST EUV facility for advanced photoresist qualification using the witness-sample test
Published: 8/29/2011
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Lee J Richter, Thomas B Lucatorto, J. van Dijk, C. Kaya, N. Harned, R. Hoefnagels, M. Silova, J. Steinhoff
Abstract: Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be qualified to ensure that they will not excessively contaminate the scanner optics or other parts of the vacuum environment of the scanner. At the National Institute ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908029

4. Polymer Photochemistry at the EUV Wavelength
Published: 6/8/2010
Authors: Charles S Tarrio, Theodore Fedynyshyn, Russell Goodman, Alberto Cabral, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904827

5. Design considerations for a cascaded grating interferometer suitable for EUV interference lithography
Published: 4/10/2009
Authors: Zachary H Levine, Thomas B Lucatorto, Steven E Grantham
Abstract: The potential of a cascaded grating interferometer to perform Extreme Ultraviolet Interference Lithography (EUV-IL) depends on its beng coupled to a source that is bright enought to allow exposures ina reasonable time.   This work presents a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=842467

6. EUV testing of multilayer mirrors: critical issues
Published: 1/1/2006
Authors: Shannon Bradley Hill, I Ermanoski, Steven E Grantham, Charles S Tarrio, Thomas B Lucatorto, T. E Madey, S Bajt, M Chandhok, P Yan, Obert Wood, S Wurm, N V Edwards
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101847

7. Effect of xenon bombardment on ruthenium coated grazing incidence collector lifetime for EUV lithography,
Published: 1/1/2006
Authors: M Nieto, J P Allain, V Titov, M R Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles S Tarrio, Yaniv Barad, Steven E Grantham, Thomas B Lucatorto, Bryan Rice
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101650

8. Metrology for EUVL Sources and Tools,ed. by V. Bakshi
Published: 1/1/2006
Authors: S Grantham, Charles S Tarrio, Robert Edward Vest, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100158

9. EUV component and system characterization at NIST for the support of extreme-ultraviolet lithography, ed. by R.S. Mackay
Published: 5/13/2005
Authors: S Grantham, Shannon Bradley Hill, Charles S Tarrio, Robert Edward Vest, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100159

10. Optics go to extremes in EUV lithography
Published: 1/1/2005
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101546



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