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Author: Andras Vladar

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1. Optimizing Hybrid Metrology through a Consistent Multi-Tool Parameter Set and Uncertainty Model
Published: 4/14/2014
Authors: Richard M Silver, Bryan M Barnes, Nien F Zhang, Hui Zhou, Andras Vladar, John S Villarrubia, Regis J Kline, Daniel Franklin Sunday, Alok Vaid
Abstract: There has been significant interest in hybrid metrology as a novel method for reducing overall measurement uncertainty and optimizing measurement throughput (speed) through rigorous combinations of two or more different measurement techniques into a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915846

2. Optical volumetric inspection of sub-20 nm patterned defects with wafer noise
Published: 4/2/2014
Authors: Bryan M Barnes, Francois R. (Francois) Goasmat, Martin Y Sohn, Hui Zhou, Richard M Silver, Andras Vladar, Abraham Arceo
Abstract: We have previously introduced a new data analysis method that more thoroughly utilizes scattered optical intensity data collected during defect inspection using bright-field microscopy. This volumetric approach allows conversion of focus resolved 2-D ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915807

3. Documentation for Reference Material (RM) 8820: A Versatile, Multipurpose Dimensional Metrology Calibration Standard for Scanned Particle Beam, Scanned Probe and Optical Microscopy
Series: Special Publication (NIST SP)
Report Number: 1170
Published: 2/3/2014
Authors: Michael T Postek, Andras Vladar, Bin Ming, Bunday Benjamin
Abstract: Reference Material (RM) 8820 is a multipurpose instrument calibration standard available from NIST. This is a dimensional standard initially developed to replace the out of stock RM 8090 used for X and Y scale calibrations of scanned particle beam mi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914808

4. Does Your SEM Really Tell the Truth? - How would you know? Part 1
Published: 12/16/2013
Authors: Michael T Postek, Andras Vladar
Abstract: The scanning electron microscope (SEM) has gone through a tremendous evolution to become a critical tool for many and diverse scientific and industrial applications. The high resolution of the SEM is especially suited for both qualitative and quantit ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912761

5. Does Your SEM Really Tell the Truth? Part 2
Published: 11/1/2013
Authors: Michael T Postek, Andras Vladar, Premsagar Purushotham Kavuri
Abstract: The scanning electron microscope (SEM) has gone through a tremendous evolution to become indispensable for many and diverse scientific and industrial applications. The first paper in this series, discussed some of the issues related to signal generat ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913866

6. Nanomanufacturing Concerns about Measurements made in the SEM II: Specimen Contamination
Published: 11/1/2013
Authors: Michael T Postek, Andras Vladar, Premsagar Purushotham Kavuri
Abstract: The scanning electron microscope (SEM) has gone through a tremendous evolution to become a critical tool for many and diverse scientific and industrial applications. The improvements that have been made have significantly improved the overall SEM per ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914028

7. Nanomanufacturing concerns about Measurements made in the SEM I: Imaging and its Measurement
Published: 11/1/2013
Authors: Michael T Postek, Andras Vladar
Abstract: The high resolution of the SEM is especially useful for qualitative and quantitative applications for both nanotechnology and nanomanufacturing. But, should users be concerned about the imaging and measurements made with this instrument? Perhaps one ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914029

8. Three-dimensional deep sub-wavelength defect detection using (lambda) = 193 nm optical microscopy
Published: 10/25/2013
Authors: Bryan M Barnes, Martin Y Sohn, Francois R. (Francois) Goasmat, Hui Zhou, Andras Vladar, Richard M Silver, Abraham Arceo
Abstract: Identifying defects in photolithographic patterning is a persistent challenge in semiconductor manufacturing. Well-established optical methods in current use are jeopardized by upcoming sub-20 nm device dimensions. Volumetric processing of focus-reso ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914244

9. Dimensional Metrology and Imaging of Cellulose Nanocrystals
Published: 6/14/2013
Authors: Michael T Postek, Andras Vladar
Abstract: Cellulose nanocrystals are one group of nanoparticles that have high potential economic value but, also present many basic research and manufacturing challenges. These challenges are not only in development of the fundamental processes needed for the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914004

10. Does Your SEM Really Tell the Truth?
Published: 8/1/2012
Authors: Michael T Postek, Andras Vladar
Abstract: The scanning electron microscope (SEM) has gone through a tremendous evolution to become a critical tool for many, diverse scientific and industrial applications. The high resolution of the SEM is especially useful for qualitative and quantitative ap ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910663



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