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You searched on: Author: Andras Vladar

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1. Strategies for scanning electron microscopy sample preparation and characterization of multiwall carbon nanotube polymer composites
Series: Special Publication (NIST SP)
Report Number: 1200-17
Published: 1/20/2016
Author: Andras Vladar
Abstract: This guideline presents methods for the preparation and investigation of samples of multiwall carbon nanotube-polymer composites by scanning electron microscopy. It is focused on multiwall carbon nanotube epoxy composite, but the strategy shoul ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=919173

2. Nanomanufacturing Concerns about Measurements Made in the SEM Part IV: Charging and its Mitigation
Published: 11/17/2015
Authors: Michael T Postek, Andras Vladar
Abstract: This is the fourth part of a series of tutorial papers discussing various causes of measurement uncertainty in scanned particle beam instruments, and some of the solutions researched and developed at NIST and other research institutions. Scanned part ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=918469

3. Optimizing Hybrid Metrology: Rigorous Implementation of Bayesian and Combined Regression.
Published: 11/12/2015
Authors: Mark Alexander Henn, Richard M Silver, John S Villarrubia, Nien F Zhang, Hui Zhou, Bryan M Barnes, Andras Vladar, Bin Ming
Abstract: Hybrid metrology, e.g. the combination of several measurement techniques to determine critical dimensions, is an important approach to meet the needs of semiconductor industry. A proper use of hybrid metrology may not only yield more reliable estimat ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=918701

4. A method to determine the number of nanoparticles in a cluster using conventional optical microscopes
Published: 9/10/2015
Authors: Hyeong Gon (Hyeonggon) Kang, Ravikiran Attota, Premsagar Purushotham Kavuri, Vipin Nagnath Tondare, Andras Vladar
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=918715

5. Scanning electron microscope measurement of width and shape of 10 nm patterned lines using a JMONSEL-modeled library
Published: 7/1/2015
Authors: John S Villarrubia, Andras Vladar, Bin Ming, Regis J Kline, Daniel Franklin Sunday, Jasmeet Chawla, Scott List
Abstract: The width and shape of 10 nm to 12 nm wide lithographically patterned SiO2 lines were measured in the scanning electron microscope by fitting the measured intensity vs. position to a physics-based model in which the lines‰ widths and shapes are param ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=916512

6. NIST-TAPPI Workshop on Measurement Needs for Cellulose Nanomaterial
Series: Special Publication (NIST SP)
Report Number: 1192
Published: 6/23/2015
Authors: Chelsea Simone Davis, Robert J Moon, Sean Ireland, Linda Johnston, Jo Anne Shatkin, Kim Nelson, E. Johan Foster, Aaron M Forster, Michael T Postek, Andras Vladar, Jeffrey W Gilman
Abstract: A one-day workshop focused on the Measurement Needs for Cellulosic Nanomaterials was organized by the National Institute of Standards and Technology and held in conjunction with the 2014 TAPPI International Conference on Nanotechnology for Renewa ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=918748

7. Nanometer level sampling and control of a scanning electron microscope
Published: 6/2/2015
Authors: Bradley N Damazo, Andras Vladar, Olivier Marc Marie-Rose, John A Kramar
Abstract: The National Institute of Standards and Technology (NIST) is developing a specialized, metrology scanning electron microscope (SEM), having a metrology sample stage measured by a 38 picometer resolution, high-bandwidth laser interferometer system. Th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=918506

8. Optimizing Hybrid Metrology: Rigorous Implementation of Bayesian and Combined Regression
Published: 3/19/2015
Authors: Mark Alexander Henn, Richard M Silver, Nien F Zhang, Hui Zhou, Bryan M Barnes, Bin Ming, Andras Vladar, John S Villarrubia
Abstract: Hybrid metrology, e.g. the combination of several measurement techniques to determine critical dimensions, is an important approach to meet the needs of semiconductor industry. A proper use of hybrid metrology may not only yield more reliable estimat ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=918217

9. Effects of wafer noise on the detection of 20 nm defects using optical volumetric inspection
Published: 2/11/2015
Authors: Bryan M Barnes, Francois R. Goasmat, Martin Y Sohn, Hui Zhou, Andras Vladar, Richard M Silver
Abstract: Patterning imperfections in semiconductor device fabrication may either be noncritical [e.g., line edge roughness (LER)] or critical, such as defects that impact manufacturing yield. As the sizes of the pitches and linewidths decrease in lithography, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=916347

10. New Insights into Subsurface Imaging of Carbon Nanotubes in Polymer Composites via Scanning Electron Microscopy
Published: 2/4/2015
Authors: Minhua Zhao, Bin Ming, Jae-Woo Kim, Luke J Gibbons, Xiaohong Gu, Tinh Nguyen, Cheol Park, Peter T Lillehei, John S Villarrubia, Andras Vladar, James Alexander Liddle
Abstract: Despite many studies of subsurface imaging of carbon nanotube (CNT)-polymer composites via scanning electron microscopy (SEM), significant controversy exists concerning the imaging depth and contrast mechanisms. We studied CNT-polyimide composites an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=917530



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