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Author: Richard Silver

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1. 3-D Optical Metrology of Finite sub-20 nm Dense Arrays using Fourier Domain Normalization
Published: 3/25/2013
Authors: Jing Qin, Hui Zhou, Bryan M Barnes, Ronald G Dixson, Richard M Silver
Abstract: Reduced target dimensions requiring improved resolution and sensitivity have driven the need to use and analyze the phase and scattered frequency information available when using image-based scatterometry systems. One such system is scatterfield micr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912961

2. Quantitative Characterization and Applications of A 193 nm Scatterfield Microscope
Published: 3/25/2013
Authors: Martin Yeungjoon Sohn, Bryan M Barnes, Richard M Silver
Abstract: With decreasing feature sizes in semiconductor manufacturing, there is an acute demand for measurements of both critical dimensions (CD) and defects on the nanometer scale that must also be non-destructive measurement and provide high throughput1. Sc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912991

3. SCATTERFIELD MICROSCOPY, REVIEW OF TECHNIQUES THAT PUSH THE FUNDAMENTAL LIMITS OF OPTICAL DEFECT METROLOGY
Published: 3/25/2013
Authors: Richard M Silver, Bryan M Barnes, Francois Romain Francis Goasmat, Hui Zhou, Martin Yeungjoon Sohn
Abstract: The semiconductor manufacturing industry is now facing serious challenges in achieving defect detection rates with acceptable throughput and accuracy. With conventional bright-field and dark- field inspection methods now at their limits, it has b ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913246

4. Multiple-order Imaging for Optical Critical Dimension Metrology using Microscope Characterization
Published: 10/11/2012
Authors: Jing Qin, Hui Zhou, Bryan M Barnes, Francois Romain Francis Goasmat, Ronald G Dixson, Richard M Silver
Abstract: There has been much recent work in developing advanced optical metrology applications that use imaging optics for optical critical dimension (OCD) measurements, defect detection, and for potential use with in-die metrology applications. We have previ ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912169

5. Improving optical measurement uncertainty with combined multitool metrology using a Bayesian approach
Published: 8/30/2012
Authors: Nien F Zhang, Richard M Silver, Hui Zhou, Bryan M Barnes
Abstract: Recently, there has been significant research investigating new optical technologies for dimensional metrology of features 22 nm in critical dimension and smaller. When modeling optical measurements, a library of curves is assembled through the simul ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907847

6. Topography Measurements and Performance Comparisons between NIST SRM 2460 Standard Bullet Masters and BKA Bullet Replicas
Published: 7/31/2012
Authors: Jun-Feng Song, Theodore Vincent Vorburger, Robert Meryln Thompson, Susan M Ballou, Xiaoyu A Zheng, Thomas B Renegar, Richard M Silver
Abstract: Two Standard Reference Material (SRM) 2460 Bullets produced by the National Institute of Standards and Technology (NIST) were used as masters for the fabrication of replica bullets at the Bundeskriminalamt (BKA). The surface topography of the SRM ma ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908222

7. On CD-AFM bias related to probe bending
Published: 4/9/2012
Authors: Vladimir A Ukraintsev, Ndubuisi George Orji, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Richard M Silver
Abstract: Critical Dimension AFM (CD-AFM) is a widely used reference metrology. To characterize modern semiconductor devices, very small and flexible probes, often 15 nm to 20 nm in diameter, are now frequently used. Several recent publications have reported ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910903

8. Phase sensitive parametric optical metrology: Exploring the limits of 3-dimensional optical metrology
Published: 4/4/2012
Authors: Richard M Silver, Jing Qin, Bryan M Barnes, Hui Zhou, Ronald G Dixson, Francois Romain Francis Goasmat
Abstract: There has been much recent work in developing advanced optical metrology applications that use imaging optics for critical dimension measurements, defect detection and for potential use with in-die metrology applications. Sensitivity to nanometer sca ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911039

9. Scatterfield Microscopy of 22 nm Node Patterned Defects using Visible and DUV Light
Published: 4/4/2012
Authors: Bryan M Barnes, Martin Yeungjoon Sohn, Francois Romain Francis Goasmat, Hui Zhou, Richard M Silver, Abraham Arceo
Abstract: Smaller patterning dimensions and novel architectures are fostering research into improved methods of defect detection in semiconductor device manufacturing. This initial experimental study, augmented with simulation, evaluates scatterfield microscop ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910963

10. Development of Ballistics Identification – From Image Comparison to Topography Measurement in Surface Metrology-
Published: 3/22/2012
Authors: Jun-Feng Song, Theodore Vincent Vorburger, Robert Meryln Thompson, Thomas B Renegar, Xiaoyu A Zheng, James H Yen, Richard M Silver, Wei Chu
Abstract: Fired bullets and ejected cartridge cases have unique ballistics signatures left by the firearm. By analyzing the ballistics signatures, forensic examiners can trace these bullets and cartridge cases to the firearm used in a crime scene. Current au ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908043