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You searched on: Author: Ndubuisi Orji

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1. Lateral Tip Control Effects in CD-AFM Metrology: The Large Tip Limit
Published: 1/25/2016
Authors: Ronald G Dixson, Ndubuisi George Orji, Ryan Goldband
Abstract: Sidewall sensing in CD-AFMs usually involves continuous lateral dithering of the tip or the use of a control algorithm and fast response piezo actuator to position the tip in a manner that resembles touch-triggering of coordinate measuring machine (C ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=919720

2. Tip characterization method using multi-feature characterizer for CD-AFM
Published: 12/23/2015
Authors: Ndubuisi George Orji, Hiroshi Itoh, Chumei Wang, Ronald G Dixson, Sebastian Schmidt, Bernd Irmer, Peter S. Walecki
Abstract: In atomic force microscopy (AFM) metrology, the tip is a key source of uncertainty. Images taken with an AFM show a change in feature width and shape that depends on tip geometry. This geometric distortion is more pronounced when measuring features w ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=917118

3. Lateral Tip Control Effects in CD-AFM Metrology: The Large Tip Limit
Published: 10/21/2015
Authors: Ronald G Dixson, Ryan Goldband, Ndubuisi George Orji
Abstract: Critical dimension atomic force microscopes (CD-AFMs) use flared tips and two-dimensional sensing and control of the tip-sample interaction to enable scanning of features with near-vertical or even reentrant sidewalls. Features of this sort are commo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=919319

4. Interactions of Higher Order Tip Effects in CD-AFM Linewidth Metrology
Published: 4/30/2015
Authors: Ronald G Dixson, Boon Ping Ng, Xavier Bonnaud, Ndubuisi George Orji
Abstract: A major challenge in critical dimension atomic force microscope (CD-AFM) width metrology is accounting for the effects of the tip on the apparent features in an image. The overall effect of the tip is to broaden the apparent width of lines and narrow ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=916379

5. Technique for AFM Tip Characterization
Published: 9/15/2014
Authors: Ndubuisi George Orji, Ronald G Dixson, Hiroshi Itoh, Chumei Wang
Abstract: In atomic force microscopy (AFM) metrology, the scanning tip is a major source of uncertainty. Images taken with an AFM show an apparent broadening of feature dimensions due to the finite size of the tip. An AFM image is a combination of the feature ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=917092

6. Effects of Lateral Tip Control in CD-AFM Width Metrology
Published: 8/12/2014
Authors: Ronald G Dixson, Boon Ping Ng, Ndubuisi George Orji
Abstract: Critical dimension atomic force microscopes (CD-AFMs) use flared tips and two-dimensional sensing and position control of the tip-sample interaction to enable scanning of features with near-vertical or reentrant sidewalls. Sidewall sensing usually in ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915945

7. 2013 ITRS Metrology Roadmap
Published: 4/15/2014
Authors: Alain C. Diebold, Ndubuisi George Orji
Abstract: In 2013 the ITRS Metrology Technical Working Group worked on updating the text and tables of the metrology chapter. New additions include a section on 3D nanometrology, a revised lithography metrology table, and an updated Interconnect section. The d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915891

8. TSV Reveal height and bump dimension metrology by the TSOM method
Published: 4/30/2013
Authors: Ravikiran Attota, Haesung Park, Victor Vartanian, Ndubuisi George Orji, Richard A Allen
Abstract: Through-focus scanning optical microscopy (TSOM) transforms conventional optical microscopes into truly 3D metrology tools for nanoscale- to- microscale dimensional analysis with nanometer-scale sensitivity. Although not a resolution enhancement meth ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913667

9. Distributed Force Probe Bending Model of CD-AFM Bias
Published: 4/1/2013
Authors: Vladimir A. Ukraintsev, Ndubuisi George Orji, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Richard M Silver
Abstract: Critical Dimension AFM (CD-AFM) is a widely used reference metrology technique. To characterize modern semiconductor devices, small and flexible probes, often 15 nm to 20 nm in diameter, are used. Recent studies have reported uncontrolled and signif ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912266

10. FABRICATION AND CHARACTERIZATION OF STANDARDS FOR ATOMIC FORCE MICROSCOPE TIP WIDTH CALIBRATION
Published: 3/25/2013
Authors: Ronald G Dixson, Craig Dyer McGray, Boon Ping Ng, Ndubuisi George Orji, Jon C Geist
Abstract: The National Institute of Standards and Technology (NIST) has been developing methods and standards to enable the traceable calibration of critical dimension atomic force microscopy (CD AFM). This technique involves flared tips and two-dimensional s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912865



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