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Author: Ndubuisi Orji

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1. Technique for AFM Tip Characterization
Published: 9/15/2014
Authors: Ndubuisi George Orji, Ronald G Dixson, Hiroshi Itoh, Chumei Wang
Abstract: In atomic force microscopy (AFM) metrology, the scanning tip is a major source of uncertainty. Images taken with an AFM show an apparent broadening of feature dimensions due to the finite size of the tip. An AFM image is a combination of the feature ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=917092

2. Effects of Lateral Tip Control in CD-AFM Width Metrology
Published: 8/12/2014
Authors: Ronald G Dixson, Boon Ping Ng, Ndubuisi George Orji
Abstract: Critical dimension atomic force microscopes (CD-AFMs) use flared tips and two-dimensional sensing and position control of the tip-sample interaction to enable scanning of features with near-vertical or reentrant sidewalls. Sidewall sensing usually in ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915945

3. 2013 ITRS Metrology Roadmap
Published: 4/15/2014
Authors: Alain C. Diebold, Ndubuisi George Orji
Abstract: In 2013 the ITRS Metrology Technical Working Group worked on updating the text and tables of the metrology chapter. New additions include a section on 3D nanometrology, a revised lithography metrology table, and an updated Interconnect section. The d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915891

4. TSV Reveal height and bump dimension metrology by the TSOM method
Published: 4/30/2013
Authors: Ravikiran Attota, Haesung Park, Victor Vartanian, Ndubuisi George Orji, Richard A Allen
Abstract: Through-focus scanning optical microscopy (TSOM) transforms conventional optical microscopes into truly 3D metrology tools for nanoscale- to- microscale dimensional analysis with nanometer-scale sensitivity. Although not a resolution enhancement meth ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913667

5. Distributed Force Probe Bending Model of CD-AFM Bias
Published: 4/1/2013
Authors: Vladimir A. Ukraintsev, Ndubuisi George Orji, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Richard M Silver
Abstract: Critical Dimension AFM (CD-AFM) is a widely used reference metrology technique. To characterize modern semiconductor devices, small and flexible probes, often 15 nm to 20 nm in diameter, are used. Recent studies have reported uncontrolled and signif ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912266

6. FABRICATION AND CHARACTERIZATION OF STANDARDS FOR ATOMIC FORCE MICROSCOPE TIP WIDTH CALIBRATION
Published: 3/25/2013
Authors: Ronald G Dixson, Craig Dyer McGray, Boon Ping Ng, Ndubuisi George Orji, Jon C Geist
Abstract: The National Institute of Standards and Technology (NIST) has been developing methods and standards to enable the traceable calibration of critical dimension atomic force microscopy (CD AFM). This technique involves flared tips and two-dimensional s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912865

7. Robust Auto-Alignment Technique for Orientation-Dependent Etching of Nanostructures
Published: 5/29/2012
Authors: Craig Dyer McGray, Richard J Kasica, Ndubuisi George Orji, Ronald G Dixson, Michael W Cresswell, Richard A Allen, Jon C Geist
Abstract: A robust technique is presented for auto-aligning nanostructures to slow-etching crystallographic planes in materials with diamond cubic structure. Lithographic mask patterns are modified from the intended dimensions of the nanostructures to compen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908076

8. Contour Metrology using Critical Dimension Atomic Force Microscopy
Published: 4/9/2012
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Bin Ming, Michael T Postek
Abstract: The critical dimension atomic force microscope (CD-AFM), which is used as a reference instrument in lithography metrology, has been proposed as a supplemental instrument for contour measurement and verification. However, although data from CD-AFM is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910915

9. On CD-AFM bias related to probe bending
Published: 4/9/2012
Authors: Vladimir A Ukraintsev, Ndubuisi George Orji, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Richard M Silver
Abstract: Critical Dimension AFM (CD-AFM) is a widely used reference metrology. To characterize modern semiconductor devices, very small and flexible probes, often 15 nm to 20 nm in diameter, are now frequently used. Several recent publications have reported ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910903

10. Traceable Calibration of a Critical Dimension Atomic Force Microscope
Published: 3/9/2012
Authors: Ronald G Dixson, Ndubuisi George Orji, Craig Dyer McGray, John E Bonevich, Jon C Geist
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. One component of this program, and the focus of this paper, is the use of critical dimension atomic force ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908943



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