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Author: Ndubuisi Orji

Displaying records 1 to 10 of 56 records.
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1. TSV Reveal height and bump dimension metrology by the TSOM method
Published: 4/30/2013
Authors: Ravikiran (Ravikiran) Attota, Haesung Park, Victor Vartanian, Ndubuisi George Orji, Richard A Allen
Abstract: Through-focus scanning optical microscopy (TSOM) transforms conventional optical microscopes into truly 3D metrology tools for nanoscale- to- microscale dimensional analysis with nanometer-scale sensitivity. Although not a resolution enhancement meth ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913667

2. Distributed Force Probe Bending Model of CD-AFM Bias
Published: 4/1/2013
Authors: Vladimir A. Ukraintsev, Ndubuisi George Orji, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Richard M Silver
Abstract: Critical Dimension AFM (CD-AFM) is a widely used reference metrology technique. To characterize modern semiconductor devices, small and flexible probes, often 15 nm to 20 nm in diameter, are used. Recent studies have reported uncontrolled and signif ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912266

3. FABRICATION AND CHARACTERIZATION OF STANDARDS FOR ATOMIC FORCE MICROSCOPE TIP WIDTH CALIBRATION
Published: 3/25/2013
Authors: Ronald G Dixson, Craig Dyer McGray, Boon Ping Ng, Ndubuisi George Orji, Jon C Geist
Abstract: The National Institute of Standards and Technology (NIST) has been developing methods and standards to enable the traceable calibration of critical dimension atomic force microscopy (CD AFM). This technique involves flared tips and two-dimensional s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912865

4. Robust Auto-Alignment Technique for Orientation-Dependent Etching of Nanostructures
Published: 5/29/2012
Authors: Craig Dyer McGray, Richard J Kasica, Ndubuisi George Orji, Ronald G Dixson, Michael W Cresswell, Richard A Allen, Jon C Geist
Abstract: A robust technique is presented for auto-aligning nanostructures to slow-etching crystallographic planes in materials with diamond cubic structure. Lithographic mask patterns are modified from the intended dimensions of the nanostructures to compen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908076

5. Contour Metrology using Critical Dimension Atomic Force Microscopy
Published: 4/9/2012
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Bin Ming, Michael T Postek
Abstract: The critical dimension atomic force microscope (CD-AFM), which is used as a reference instrument in lithography metrology, has been proposed as a supplemental instrument for contour measurement and verification. However, although data from CD-AFM is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910915

6. On CD-AFM bias related to probe bending
Published: 4/9/2012
Authors: Vladimir A Ukraintsev, Ndubuisi George Orji, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Richard M Silver
Abstract: Critical Dimension AFM (CD-AFM) is a widely used reference metrology. To characterize modern semiconductor devices, very small and flexible probes, often 15 nm to 20 nm in diameter, are now frequently used. Several recent publications have reported ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910903

7. Traceable Calibration of a Critical Dimension Atomic Force Microscope
Published: 3/9/2012
Authors: Ronald G Dixson, Ndubuisi George Orji, Craig Dyer McGray, John E Bonevich, Jon C Geist
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. One component of this program, and the focus of this paper, is the use of critical dimension atomic force ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908943

8. Strategies for Nanoscale Contour Metrology using Critical Dimension Atomic Force Microscopy
Published: 9/30/2011
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Michael T Postek
Abstract: Contour metrology is one of the techniques used to verify optical proximity correction (OPC) in lithography models. The use of these methods, which are known as resolution enhancement techniques (RET), are necessitated by the continued decrease in f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909559

9. Traceable Calibration of a Critical Dimension Atomic Force Microscope
Published: 6/6/2011
Authors: Ronald G Dixson, Ndubuisi George Orji, Craig Dyer McGray, Jon C Geist
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. One component of this effort is a custom in-house metrology AFM, called the calibrated AFM (C-AFM). The NI ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908552

10. Progress on CD-AFM tip width calibration standards
Published: 5/10/2011
Authors: Ronald G Dixson, Boon Ping Ng, Craig Dyer McGray, Ndubuisi George Orji, Jon C Geist
Abstract: The National Institute of Standards and Technology (NIST) is developing a new generation of standards for calibration of CD-AFM tip width. These standards, known as single crystal critical dimension reference materials (SCCDRM) have features with ne ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911343



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