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Author: Lowell Howard

Displaying records 1 to 10 of 19 records.
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1. Photomask metrology using a 193 nm scatterfield microscope
Published: 9/30/2009
Authors: Richard Quintanilha, Bryan M Barnes, Martin Y Sohn, Lowell P. Howard, Richard M Silver, James Edward Potzick, Michael T. Stocker
Abstract: The current photomask linewidth Standard Reference Material (SRM) supplied by the National Institute of Standards and Technology (NIST), SRM 2059, is the fifth generation of such standards for mask metrology. The calibration of this mask has been ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903929

2. Accurate Picometers for DC and Low-Frequency Displacement Measurement
Published: 4/6/2009
Authors: Jon Robert Pratt, Douglas T Smith, Lowell Howard
Abstract: We have developed a fiber-optic interferometer optimized for best performance in the frequency range from DC to 1 kHz, with displacement linearity of 1 % over a range of 25 nm, and noise-limited resolution of 2 pm [1]. The interferometer uses a tun ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902317

3. Zero-Order Imaging of Device-Sized Overlay Targets Using Scatterfield Microscopy
Published: 3/1/2007
Authors: Bryan M Barnes, Lowell P. Howard, P Lipscomb, Richard M Silver
Abstract: Patterns of lines and trenches with nominal linewidths of 50 nm have been proposed for use as an overlay target appropriate for placement inside the patterned wafer die.  The NIST Scatterfield Targets feature groupings of eight lines and/or tren ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823225

4. Koehler Illumination for High-Resolution Optical Metrology
Published: 3/1/2006
Authors: Martin Y Sohn, Bryan M Barnes, Lowell P. Howard, Richard M Silver, Ravikiran Attota, Michael T. Stocker
Abstract: Accurate preparation of illumination is critical for high-resolution optical metrology applications such as line width and overlay measurements. To improve the detailed evaluation and alignment of the illumination optics, we have separated Koehler il ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823207

5. High-resolution Optical Metrology
Published: 5/1/2005
Authors: Richard M Silver, Ravikiran Attota, Michael T. Stocker, M R Bishop, Lowell P. Howard, Thomas Avery Germer, Egon Marx, M P Davidson, Robert D. Larrabee
Abstract: Recent advances in optical imaging techniques have unveiled new possibilities for optical metrology and optical-based process control measurements of features in the 65 nm node and beyond. In this paper we discuss methods and applications that combin ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822387

6. Atomic-Resolution Measurements With a New Tunable Diode Laser-Based Interferometer
Published: 1/1/2004
Authors: Richard M Silver, H Zou, S Gonda, Bradley N Damazo, Jay Shi Jun, Carsten P. Jensen, Lowell P. Howard
Abstract: We have developed a new implementation of a Michelson interferometer which has demonstrated better than 20 picometer resolution measurement capability. This new method uses a tunable diode laser as the light source with the laser wavelength continuou ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822419

7. Real-Time Displacement Measurements With a Fabry-Perot Cavity and a Diode Laser
Published: 1/1/2000
Authors: Lowell P. Howard, Jack A Stone Jr
Abstract: We present the basic operating principles of a traceable measurement system for use with scanned probe microscopes and nanometer-resolution displacement sensors. Our method is based upon a tunable external-cavity diode laser system which is Pound-Dre ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820963

8. Absolute Distance Interferometry with a 670-nm External Cavity Diode Laser
Published: 10/1/1999
Authors: Jack A Stone Jr, Alois Stejskal, Lowell P. Howard
Abstract: Diode lasers are becoming increasingly important in length metrology. In particular, the tunability of diode lasers makes them attractive for applications such as absolute distance interferometry (ADI). In this paper we describe the current status of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820952

9. Absolute Interferometry With a 670 nm External Cavity Diode Laser
Published: 10/1/1999
Authors: Jack A Stone Jr, Alois Stejskal, Lowell P. Howard
Abstract: In the last few years there has been much interest in the use of tunable diode lasers for absolute interferometry. Here we report on the use of an external cavity diode laser operating in the visible ({lambda}{approximately} 670 nm) for absolute dis ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823111

10. Diode Lasers in Length Metrology: Application to Absolute Distance Interferometry
Published: 1/1/1999
Authors: Jack A Stone Jr, Lowell P. Howard, Alois Stejskal
Abstract: Diode lasers are becoming increasingly important in length metrology. In particular, the tunability of diode lasers makes them attractive for applications such as absolute distance interferometry (ADI). In this paper we describe the current status of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820953



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