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Author: Samuel Jones

Displaying records 1 to 10 of 13 records.
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1. Reference Material 8091: New Scanning Electron Microscope Sharpness Standard
Published: 8/1/2001
Authors: Andras Vladar, Michael T Postek, Nien F Zhang, Robert D. Larrabee, Samuel N Jones, Russell E Hajdaj
Abstract: All scanning electron microscope-based inspection instruments, whether they are in a laboratory or on the production line, slowly lose their performance and then the instrument is no longer capable of providing as good quality, sharp images as before ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821578

2. Reference Material 8091: New Scanning Electron Microscope Sharpness Standard
Published: 8/1/2001
Authors: Andras Vladar, Michael T Postek, Nien F Zhang, Robert D. Larrabee, Samuel N Jones, Russell E Hajdaj
Abstract: Reference Material (RM 8091) is intended primarily for use in checking the sharpness performance of scanning electron microscopes. It is supplied as a small, approximately 2 mm x 2 mm diced semiconductor chip. This sample is capable of being mounted ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823136

3. Applications of SEM Monte Carlo Modeling to Geometry Determination in Single-Crystal Silicon Test Patterns
Published: 5/1/2000
Authors: John S Villarrubia, Andras Vladar, J R. Lowney, Samuel N Jones, Michael T Postek
Abstract: Width measurements pose a particularly problematic calibration problem. The measurement entails determining the distance between inherently dissimilar edges. Even in the simplest imaginable case, an ideal line of rectangular cross section, the left a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820987

4. Experimental Test of Blind Tip Reconstruction for Scanning Probe Microscopy
Published: 1/1/2000
Authors: Samuel Dongmo, John S Villarrubia, Samuel N Jones, Thomas B Renegar, Michael T Postek, Jun-Feng Song
Abstract: Determination of the tip geometry is a prerequisite to converting the scanning probe microscope (SPM) from a simple imaging instrument to a tool that can perform width measurements accurately. Recently we developed blind reconstruction, a method to c ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820960

5. Final Report: 1998-1999 NIST/SEMATECH Project on Intercomparison of Linewidth Measurement Methods
Published: 1/1/2000
Authors: John S Villarrubia, Ronald G Dixson, Samuel N Jones, J R. Lowney, Michael T Postek
Abstract: Abstract unavailable.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820988

6. Image Sharpness Measurement in Scanning Electron Microscope - Part III
Published: 7/1/1999
Authors: Samuel N Jones, Robert D. Larrabee, Michael T Postek, Andras Vladar, Nien F Zhang
Abstract: Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821795

7. Intercomparison of SEM, AFM, and Electrical Linewidths
Published: 6/1/1999
Authors: John S Villarrubia, Ronald G Dixson, Samuel N Jones, J R. Lowney, Michael T Postek, Richard A Allen, Michael W Cresswell
Abstract: Uncertainty in the locations of line edges dominates the uncertainty budget for high quality sub-micrometer linewidth measurements. For microscopic techniques like scanning electron microscopy (SEM) and atomic force microscopy (AFM), the image of the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820954

8. National Institute of Standards and Technology - Texas Instruments Industrial Collaboratory Testbed
Published: 10/1/1998
Authors: Michael T Postek, Marylyn H. Bennett, N J Zaluzec, Thomas E Wheatley, Samuel N Jones
Abstract: A portion of the mission of the NIST Manufacturing Engineering Laboratory (MEL) is to improve and advance length metrology in aid of U.S. Industry. This responsibility is found within the Precision Engineering Division (PED). The successful developme ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821791

9. Simulation and Measurement of Subsurface Features in Scanning Electron Microscopy Metrology
Published: 4/1/1998
Authors: J R. Lowney, Michael T Postek, Samuel N Jones, S Mayo, Michael W Cresswell
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821787

10. Tip Characterization for Scanned Probe Microscope Width Metrology
Published: 3/1/1998
Authors: Samuel Dongmo, John S Villarrubia, Samuel N Jones, Thomas B Renegar, Michael T Postek, Jun-Feng Song
Abstract: Determination of the tip shape is an important prerequisite for converting the various scanning probe microscopies form imaging tools into dimensional metrology tools with sufficient accuracy to meet the critical dimension measurement requirements of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823092



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