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You searched on: Author: Michael Postek

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1. Low-Loss Electron Imagine for Enhanced Surface Detail in the Scanning Electron Microscope: The Contributions of Oliver C. Wells
Published: 1/7/2015
Authors: Michael T Postek, Andras Vladar
Abstract: Low-loss electron (LLE) imaging in the scanning electron microscope (SEM) is based on the collection of energy-filtered backscattered electrons that have undergone minimal elastic interactions within a sample and therefore can carry high-resolution, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=917444

2. Nanomanufacturing Concerns about Measurements made in the SEM Part III: Vibration and Drift
Published: 12/1/2014
Authors: Michael T Postek, Andras Vladar, Petr Cizmar
Abstract: Many advanced manufacturing processes employ scanning electron microscopes (SEM) for on-line critical measurements for process and quality control. This is the third of a series of papers discussing various causes of measurement uncertainty in scanne ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=916170

3. Nanomanufacturing Metrology for Cellulosic Nanomaterials: an Update
Published: 12/1/2014
Author: Michael T Postek
Abstract: The development of the metrology and standards for advanced manufacturing of cellulosic nanomaterials (or basically, wood-based nanotechnology) is imperative to the success of this rising economic sector. Wood-based nanotechnology is a revolutionary ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=916298

4. 3D Monte Carlo modeling of the SEM: Are there applications to photomask metrology?
Published: 10/23/2014
Authors: John S Villarrubia, Andras Vladar, Michael T Postek
Abstract: The ability to model the effect of fields due to charges trapped in insulators with floating conductors has been added to JMONSEL (Java Monte Carlo simulator for Secondary Electrons) and applied to a simple photomask metal on glass geometry. These ca ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=917204

5. Does Your SEM Really Tell the Truth? - How would you know? Part 3: Vibration and Drift
Published: 8/1/2014
Authors: Michael T Postek, Andras Vladar, Petr Cizmar
Abstract: This is the third of a series of papers discussing various causes of measurement uncertainty in scanned particle beam instruments, and some of the solutions researched and developed at NIST. Scanned particle beam instruments especially the scanning e ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=916112

6. Does Your SEM Really Tell the Truth? How Would You Know? Part 2
Published: 5/30/2014
Authors: Michael T Postek, Andras Vladar, Premsagar Purushotham Kavuri
Abstract: The scanning electron microscope (SEM)has gone through a tremendous evolution to become indispensable for many and diverse scientific and industrial applications. The improvements have significantly enriched and augmented the overall SEM performance ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915610

7. 10 nm Three-Dimensional CD-SEM Metrology
Published: 4/10/2014
Authors: Andras Vladar, John S Villarrubia, Bin Ming, Regis J Kline, Jasmeet Chawla, Scott List, Michael T Postek
Abstract: The shape and dimensions of a challenging pattern have been measured using a model-based library scanning electron microscope (MBL SEM) technique. The sample consisted of a 4-line repeating pattern. Lines were narrow (10 nm), asymmetric (different ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915705

8. Documentation for Reference Material (RM) 8820: A Versatile, Multipurpose Dimensional Metrology Calibration Standard for Scanned Particle Beam, Scanned Probe and Optical Microscopy
Series: Special Publication (NIST SP)
Report Number: 1170
Published: 2/3/2014
Authors: Michael T Postek, Andras Vladar, Bin Ming, Bunday Benjamin
Abstract: Reference Material (RM) 8820 is a multipurpose instrument calibration standard available from NIST. This is a dimensional standard initially developed to replace the out of stock RM 8090 used for X and Y scale calibrations of scanned particle beam mi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914808

9. Does Your SEM Really Tell the Truth? - How would you know? Part 1
Published: 12/16/2013
Authors: Michael T Postek, Andras Vladar
Abstract: The scanning electron microscope (SEM) has gone through a tremendous evolution to become a critical tool for many and diverse scientific and industrial applications. The high resolution of the SEM is especially suited for both qualitative and quantit ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912761

10. Does Your SEM Really Tell the Truth? Part 2
Published: 11/1/2013
Authors: Michael T Postek, Andras Vladar, Premsagar Purushotham Kavuri
Abstract: The scanning electron microscope (SEM) has gone through a tremendous evolution to become indispensable for many and diverse scientific and industrial applications. The first paper in this series, discussed some of the issues related to signal generat ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913866



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