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Author: Jay Jun

Displaying records 1 to 10 of 24 records.
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1. Extending the Limits of Image-Based Optical Metrology
Published: 6/20/2007
Authors: Richard M Silver, Bryan M Barnes, Ravikiran (Ravikiran) Attota, Jay Shi Jun, Michael T. Stocker, Egon Marx, Heather J Patrick
Abstract: We have developed a set of techniques, referred to as scatterfield microscopy, in which the illumination is engineered in combination with appropriately designed metrology targets. Previously we reported results from samples with sub-50 nm sized fea ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823218

2. Calibrated Overlay Wafer Standard
Series: Special Publication (NIST SP)
Report Number: 260-165
Published: 1/1/2007
Authors: Michael T. Stocker, Richard M Silver, Ravikiran (Ravikiran) Attota, Jay Shi Jun
Abstract: This document describes the physical characteristics of Standard Reference Material SRM 5000, provides guidance for its use in calibrating overlay (OL) tools, and gives information and precautions concerning its care and handling.Standard Reference M ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823210

3. Fundamental Limits of Optical Critical Dimension Metrology: A Simulation Study
Published: 1/1/2007
Authors: Richard M Silver, Thomas Avery Germer, Ravikiran (Ravikiran) Attota, Bryan M Barnes, B Bunday, J Allgair, Egon Marx, Jay Shi Jun
Abstract: This paper is a comprehensive summary and analysis of a SEMATECH funded project to study the limits of optical critical dimension scatterometry.  The project was focused on two primary elements: 1) the comparison, stability, and validity of indu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823227

4. The Limits of Image-Based Optical Metrology
Published: 3/1/2006
Authors: Richard M Silver, Bryan M Barnes, Ravikiran (Ravikiran) Attota, Jay Shi Jun, James J Filliben, Juan Soto, Michael T. Stocker, P Lipscomb, Egon Marx, Heather J Patrick, Ronald G Dixson, Robert D. Larrabee
Abstract: An overview of the challenges encountered in imaging device-sized features using optical techniques recently developed in our laboratories is presented in this paper.  We have developed a set of techniques we refer to as scatterfield microscopy ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823206

5. Characterization of Prototype Silicon Pitch Artifacts Fabricated by Scanning Probe Lithography and Anisotropic Wet Etching
Published: 1/1/2005
Authors: F S Chien, W F Hsieh, S Gwo, Jay Shi Jun, Richard M Silver, Andras Vladar, John A. Dagata
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822246

6. Evaluation of New In-Chip and Arrayed Line Overlay Target Designs
Published: 5/24/2004
Authors: M P Davidson, M R Bishop, Robert D. Larrabee, Michael T. Stocker, Jay Shi Jun, Egon Marx, Richard M Silver, Ravikiran (Ravikiran) Attota
Abstract: Two types of overlay targets have been designed and evaluated for the study of optical overlay metrology. They are in-chip and arrayed overlay targets. In-chip targets are three-bar two-level targets designed to be placed in or near the active device ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822156

7. Evaluation of New In-Chip and Arrayed Line Overlay
Published: 5/1/2004
Authors: Ravikiran (Ravikiran) Attota, Richard M Silver, M R Bishop, Egon Marx, Jay Shi Jun, Michael T. Stocker, M P Davidson, Robert D. Larrabee
Abstract: Two types of overlay targets have been designed and evaluated for the study of optical overlay metrology. They are in-chip and arrayed overlay targets. In-chip targets are three-bar two-level targets designed to be placed in or near the active device ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822386

8. High-Resolution Optical Overlay Metrology
Published: 5/1/2004
Authors: Richard M Silver, Ravikiran (Ravikiran) Attota, M R Bishop, Jay Shi Jun, Egon Marx, M P Davidson, Robert D. Larrabee
Abstract: Optical methods are often thought to lose their effectiveness as a metrology tool beyond the Rayleigh criterion. However, using advanced modeling methods, the conventional resolution limitations encountered in well-defined edge-to-edge measurements u ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822155

9. Atomic-Resolution Measurements With a New Tunable Diode Laser-Based Interferometer
Published: 1/1/2004
Authors: Richard M Silver, H Zou, S Gonda, Bradley N Damazo, Jay Shi Jun, Carsten P. Jensen, Lowell P. Howard
Abstract: We have developed a new implementation of a Michelson interferometer which has demonstrated better than 20 picometer resolution measurement capability. This new method uses a tunable diode laser as the light source with the laser wavelength continuou ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822419

10. Calibration Strategies for Overlay and Registration Metrology
Published: 5/1/2003
Authors: Richard M Silver, Michael T. Stocker, Ravikiran (Ravikiran) Attota, M R Bishop, Jay Shi Jun, Egon Marx, M P Davidson, Robert D. Larrabee
Abstract: Critical dimensions in current and next generation devices are driving the need for tighter overlay registration tolerances and improved overlay metrology tool accuracy and repeatability. Tool matching, performance evaluation, model-based metrology, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821977



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