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Author: charles tarrio
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Displaying records 11 to 20 of 102 records.
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11. Advanced optics characterization
Published: 1/1/2001
Authors: A Davies, Charles S Tarrio, C J Evans
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101865

12. An Evaluation of Multilayer Mirrors for the Soft X-Ray and Extreme Ultraviolet Wavelength Range That Were Irradiated With Neutrons,
Published: 1/1/1997
Authors: S P Regan, M J May, V Soukhanovskii, M Finkenthal, H W Moos, E H Farnum, F W Clinard, Charles S Tarrio, R N. Watts
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101682

13. At-Wavelength Metrology for EUV Lithography at NIST
Published: 7/14/2009
Authors: Charles S Tarrio, Steven E Grantham, Robert Edward Vest, Thomas B Lucatorto
Abstract: The National Institute of Standards and Technology (NIST) is active in many areas of metrology impacting extreme ultraviolet lithography. We will describe our activities in the areas of reflectometry, pulsed radiometry, and long-term multiplayer mir ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841693

14. Characterisation of the Response of Chromium-Doped Alumina Screens in the Vacuum Ultraviolet Using Synchrotron Radiation
Published: 12/1/2002
Authors: James K McCarthy, A Baciero, B Zurro, Uwe Arp, Charles S Tarrio, Thomas B Lucatorto, A Morono, P Martin, E R Hodgson
Abstract: We have measured the response of chromium-doped alumina screens to vacuum ultraviolet radiation and derived quantum efficiency curves for the energy range from 30 to 300 eV. A model is presented to explain the structure in this curve. In addition, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840027

15. Characterization of the response of chromium-doped alumina screens in the vacuum ultraviolet using synchrotron radiation,
Published: 1/1/2002
Authors: James K McCarthy, A Baciero, B Zurro, Uwe Arp, Charles S Tarrio, Thomas B Lucatorto, A Morono, P Martin, E R Hodgson
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101617

16. Design and Performance of Capping Layers for EUV Multilayer Mirrors
Published: 6/1/2003
Authors: S Bajt, H N Chapman, Nhan Nguyen, J Alameda, J C Robinson, M Malinowski, E Gullikson, Andrew Aquila, Charles S Tarrio, Steven E Grantham
Abstract: The reflectance stability of multilayer coatings for extreme ultraviolet lithography (EUVL) in a commercial tool environment is of utmost importance to ensure continuous exposures with minimum maintenance cost. We have made substantial progress in d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840159

17. Design and Performance of Capping Layers for Extreme-Ulatraviolet Multilayer Mirrors
Published: 10/1/2003
Authors: S Bajt, H N Chapman, Nhan Nguyen, J Alameda, J C Robinson, M Malinowski, E Gullikson, Andrew Aquila, Charles S Tarrio, Steven E Grantham
Abstract: Multilayer lifetime has emerged as one of the major issues for the commercialization of extreme-ultraviolet lithography (EUVL). We describe the performance of an oxidation-resistant capping layer of Ru atop multilayers that results in a reflectivity ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840180

18. Design and performance of capping layers for extreme-ultraviolet multilayer mirrors
Published: 1/1/2003
Authors: S Bajt, H N Chapman, Nhan Nguyen, J Alameda, J C Robinson, M E Malinowski, Eric M Gullikson, Andrew Aquila, Charles S Tarrio, Steven E Grantham
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101435

19. Design, Structure, and Performance of Narrow Band Multilayer Mirrors for Solar Imaging
Published: 1/1/1994
Authors: J Pedulla, R Deslattes, Charles S Tarrio, R N. Watts, A Bartos
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=102392

20. Development of an EUVL collector with infrared radiation suppression
Published: 8/1/2014
Authors: Steven E Grantham, Mike Kriese, Yuriy Platonov, Bodo Ehlers, Licai Jiang, Jim Rodriguez, Mueller Ulrich, Shayna khatri, Adam Magruder, Charles S Tarrio, Thomas B Lucatorto
Abstract: Laser-produced plasma (LPP) sources for extreme ultraviolet lithography (EUVL) systems utilize CO2 lasers operating with wavelength 10.6μm. Since multilayer-coated optics have high reflectivity for this infrared radiation (IR), a significant and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915696



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