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Displaying records 91 to 100 of 106 records.
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91. The New NIST/DARPA National Soft X-Ray Reflectometry Facility,
Published: 1/1/1994
Authors: Charles S Tarrio, R N. Watts, Thomas B Lucatorto, M Haass, T A Callcott, J J Jia
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101765

92. Thermally stable thin-film filters for high-power extreme-ultraviolet applications
Published: 11/12/2015
Authors: Charles S Tarrio, Robert F Berg, Thomas B Lucatorto, Bruce Lairson, Heidi Lopez, Travis Ayers
Abstract: We investigated several types of thin-film filters for high intensity work in the extreme-ultraviolet (EUV) spectral range. In our application, with a peak EUV intensity of 2.7 W cm-2, Ni-mesh-backed Zr filters have a typical lifetime of 20 hours, a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=919314

93. Tomography of Integrated Circuit Interconnect With an Electromigration Void
Published: 5/1/2000
Authors: Zachary H Levine, A R Kalukin, M Kuhn, S P Frigo, I McNulty, C C Retsch, Y Wang, Uwe Arp, Thomas B Lucatorto, Bruce D Ravel, Charles S Tarrio
Abstract: An integrated circuit interconnect was subject to accelerated-life conditions to induce an electromigration void. The silicon substrate was removed, leaving only the interconnect encased test structure encased in silica. We imaged the sample wit ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840087

94. Tomography of Integrated Circuit Interconnects
Published: 10/1/2001
Authors: Zachary H Levine, A R Kalukin, M Kuhn, S P Frigo, I McNulty, C C Retsch, Y Wang, Uwe Arp, Thomas B Lucatorto, Bruce D Ravel, Charles S Tarrio
Abstract: 00 Word summary based on the paper:Z. H. Levine, A. R. Kalukin, M. Kuhn, S. P. Frigo, I. McNulty,>C. C. Retsch, Y. Wang, U. Arp, T. B. Lucatorto, B. D. Ravel, and C. Tarrio,>``Microtomography of Integrated Circuit Interconnect with an> Electromigra ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840113

95. Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography
Series: Journal of Research (NIST JRES)
Published: 7/1/2003
Authors: Charles S Tarrio, S Grantham, M B. Squires, Robert Edward Vest, Thomas B Lucatorto
Abstract: Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer EUV stepper mirrors require the highest attainable reflectivity a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841623

96. Towards high accuracy reflectometry for extreme-ultraviolet lithography,
Published: 1/1/2003
Authors: Charles S Tarrio, Steven E Grantham, M B. Squires, Robert Edward Vest, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101861

97. Tracking down sources of carbon contamination in EUVL exposure tools
Published: 8/3/2009
Authors: Charles S Tarrio, Robert Edward Vest, Thomas B Lucatorto, R. Caudillo
Abstract: Optics in EUVL exposure tools are known to suffer reflectivity degradation, mostly from the buildup of carbon. The sources of this carbon have been difficult to identify. Vacuum cleanliness is normally monitored with a residual gas analyzer, but th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901665

98. Transmission grating based EUV imaging spectrometer for time and space resolved impurity measurements
Published: 10/31/2010
Authors: Charles S Tarrio, Steven E Grantham, D Kumar, D Stutman, K Tritz, M Finkenthal, NSTX Team N/A
Abstract: A free standing transmission grating based imaging spectrometer in the extreme ultraviolet (EUV)range has been developed for the National Spherical Torus Experiment (NSTX). The spectrometer operates in a survey mode covering the approximate spectral ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905975

99. Trends in the X-Ray Diffraction of Multilayers, in Physics of X-Ray Multilayer Structures
Published: 1/1/1994
Authors: Charles S Tarrio, R Deslattes, Ariel Caticha, J Pedulla
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=102920

100. Ultrahigh-Resolution Photographic Films for X-Ray/EUV/FUV Astronomy, ed. by R.B. Hoover and A.B.C. Walker Jr.
Published: 1/1/1992
Authors: Richard Brice Hoover, A B Walker, C E Deforest, R N. Watts, Charles S Tarrio
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100164



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