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You searched on: Author: vivek prabhu

Displaying records 71 to 77.
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71. Chemically Amplified Resist Fundamentals Studies by Combinatorial approaches
Published: 3/1/2003
Authors: M Wang, Vivek M Prabhu, Eric K Lin, Michael J Fasolka, Alamgir Karim
Abstract: Sub-100 nm lithography requires more understanding of photoresist material properties and processing conditions to achieve necessary critical dimension control of patterned structures. As resist thickness and feature linewidth decrease, fundamental ...

72. Polymer Dynamics and Diffusive Properties in Ultra-Thin Photoresist Films
Published: 2/1/2003
Authors: Christopher L Soles, Ronald Leland Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Vivek M Prabhu, Wen-Li Wu, Eric K Lin, D L Goldfarb, M Angelopoulos
Abstract: A series of experiments are presented to demonstrate thin film confinement effects on the diffusive properties in poly(tert-butoxycarboxystyrene) (PBOCSt). Bilayer diffusion couple measurements reveal that as the thickness of a PBOCSt film is decrea ...

73. Polyelectrolyte Effects in Model Photoresist Developer Solutions: Roles of Base Concentration and Added Salts
Published: 1/1/2003
Authors: Vivek M Prabhu, Ronald Leland Jones, Eric K Lin, Christopher L Soles, Wen-Li Wu, D L Goldfarb, M Angelopoulos

74. Reaction Front Induced Roughness in Chemically Amplified Photoresists
Published: 8/1/2002
Authors: Vivek M Prabhu, Ronald Leland Jones, Eric K Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Christopher L Soles, Wen-Li Wu, D L Goldfarb, M Angelopoulos
Abstract: We have examined, with tapping mode atomic force microscopy(AFM), the effect of post-exposure bake times and developer on surface roughness using model bilayer interfaces of deuterium-labeled poly(tert-butyloxycarbonyloxy styrene) and poly(hydroxysty ...

75. Additive-Containing Rinses for LER and Defectivity Control During High-Resolution Resist Patterning
Published: Date unknown
Authors: D L Goldfarb, S D Burns, M Angelopolous, S Skordas, R L Burns, M C Lawson, C J Brodsky, V Vishnu, E Jablonski, Vivek M Prabhu, Ronald Leland Jones, B D. Vogt, Christopher L Soles, Eric K Lin, Wen-Li Wu
Abstract: The addition of a surface conditioning agent to the de-ionized water rinse used to quench the photoresist development process is an attractive methodology that can afford a controlled decrease in resist line edge roughness (LER) or a reduction in def ...

76. Fluorescence Correlation Spectroscopy Investigation of Growth Factor Dynamics in Three Dimensional Extracellular Matrices
Published: Date unknown
Authors: Michael Weir, Chengqing C. Wang, Vivek M Prabhu, Eric K Lin, K Yamada, N Washburn
Abstract: Fluorescence correlation spectroscopy was used to measure the binding and diffusion of growth factors in model extracellular matrices in order to investigate the importance of protein-matrix interactions in regulating signaling molecules within a thr ...

77. Photoacid Generator Dispersion in Partially Fluorinated Photoresist Polymers and their Blends
Published: Date unknown
Authors: David Lloyd VanderHart, Vivek M Prabhu
Abstract: Solid state proton NMR methods are used to probe the intimacy of mixing in materials relevant to photoresist applications. Bulk blends, made solvent casting, consisted of partially fluorinated polymers and the photoacid generator, di(t-butylphenyl) ...

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