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Author: thomas lucatorto
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Displaying records 81 to 90 of 108 records.
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81. Structure and Performance of Si/Mo Multilayer Mirrors for the Extreme Ultra-violet,
Published: 1/1/1994
Authors: J M Slaughter, D W Schulze, C R Hillis, A Mirone, R Stalio, R N. Watts, Charles S Tarrio, Thomas B Lucatorto, Michael Krumrey, P Mueller, C M Falco
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101721

82. Studies of Intensity Noise at Synchrotron Ultraviolet Radiation Facility III
Published: 3/1/2002
Authors: Uwe Arp, Thomas B Lucatorto, K Harkay, K Kim
Abstract: Suppression of beam instabilities has become an important goal at synchrotron radiation light sources, where highly sensitive applications like metrology, Fourier--transform spectroscopy and microscopy are now in use. We describe measurements connect ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841549

83. Studies of intensity noise at SURF III
Published: 1/1/2002
Authors: Uwe Arp, Thomas B Lucatorto, K Harkay, Kyoungsik Kim
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101047

84. Study of Ca Autoionisation Levels Using Multiphoton Techniques,
Published: 1/1/1994
Authors: N M Laham, J -B Kim, X Xiong, T J McIlrath, Thomas B Lucatorto, N Y Ayoub
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101593

85. Study of Laser Resonance Ionization Mass Spectrometry Using a Glow Discharge Source
Published: 1/1/1995
Authors: X Xiong, J M Hutchinson, J D Fassett, Thomas B Lucatorto, Francis J. Schima, William J Bowman, K R Hess
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=103668

86. Study of Laser Resonance Ionization Mass Spectrometry Using a Glow Discharge Source,
Published: 1/1/1995
Authors: X Xiong, J M Hutchinson, J D Fassett, Thomas B Lucatorto, Francis J. Schima, William J Bowman, K R Hess
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100215

87. Study of Laser Resonance Ionization Mass Spectrometry Using a Glow Discharge Source,
Published: 1/1/1995
Authors: X Xiong, J M Hutchinson, J D Fassett, Thomas B Lucatorto, Francis J. Schima, William J Bowman, K R Hess
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101846

88. The AC Stark Shifts of High-Lying Rydberg Levels in Intense Electromagnetic Fields,
Published: 1/1/1992
Authors: J B Kim, G Lan, Q Li, Thomas B Lucatorto, T J McIlrath, Thomas R. O'Brian
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101586

89. The Identification of the Ca 3d4f Autoionizing Levels by the Application of Multiphoton Polarization Selection Rules,
Published: 1/1/1994
Authors: J B Kim, X Xiong, N M Laham, Thomas B Lucatorto, T J McIlrath
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101585

90. The NIST EUV facility for advanced photoresist qualification using the witness-sample test
Published: 8/29/2011
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Lee J Richter, Thomas B Lucatorto, J. van Dijk, C. Kaya, N. Harned, R. Hoefnagels, M. Silova, J. Steinhoff
Abstract: Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be qualified to ensure that they will not excessively contaminate the scanner optics or other parts of the vacuum environment of the scanner. At the National Institute ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908029



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