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Displaying records 81 to 90 of 112 records.
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81. Regression Procedure for Determining the Dopant Profile in Semiconductors from Scanning Capacitance Microscopy Data
Published: 11/15/2002
Authors: Jay F. Marchiando, Joseph J Kopanski
Abstract: To develop a regression procedure to correlate scanning capacitance microscope data with dopant concentration in three dimensions, the inverse problem is treated in two dimensions as an optimization problem that is formulated as a regularized nonline ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=16365

82. Review of Semiconductor Microelectronic Test Structures with Applications to Infrared Detector Materials and Processes
Published: 7/1/1993
Authors: Joseph J Kopanski, C. E. Schuster
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=11257

83. Scanned Probe Techniques for the Electrical Characterization of Semiconductor Devices
Published: 7/1/1995
Authors: John A Dagata, Joseph J Kopanski
Abstract: The spatial resolution, sensitivity, and accuracy required for electrical characterization of device structures in the semiconductor industry suggest that scanned probe microscopy (SPM) tools may offer an alternative to existing measurement technique ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820733

84. Scanning Capacitance Microscopy Applied to 2D Dopant Profiling of Semiconductors
Published: 12/31/1997
Authors: Joseph J Kopanski, Jay F. Marchiando, J R. Lowney
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=8618

85. Scanning Capacitance Microscopy Measurement of 2-D Dopant Profiles Across Junctions
Published: 1/1/1998
Authors: Joseph J Kopanski, Jay F. Marchiando, David Warren Berning, R. Alvis, H. E. Smith
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=26626

86. Scanning Capacitance Microscopy Measurement of 2-D Dopant Profiles across Junctions
Published: 12/31/1997
Authors: Joseph J Kopanski, Jay F. Marchiando, David Warren Berning
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=3316

87. Scanning Capacitance Microscopy Measurements and Modeling for Dopant Profiling of Silicon
Published: 12/31/1996
Authors: Joseph J Kopanski, Jay F. Marchiando, J R. Lowney
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=13654

88. Scanning Capacitance Microscopy Measurements and Modeling: Progress Towards Dopant Profiling of Silicon
Published: 12/31/1995
Authors: Joseph J Kopanski, Jay F. Marchiando, J R. Lowney
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=9950

89. Scanning Capacitance Microscopy Measurements and Modeling: Progress Towards Dopant Profiling of Silicon
Published: 2/1/1996
Authors: Joseph J Kopanski, Jay F. Marchiando, J R. Lowney
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=28806

90. Scanning Capacitance Microscopy for Electrical Characterization of Semiconductors and Dielectrics
Published: 2/1/2007
Author: Joseph J Kopanski
Abstract: A Scanning Capacitance Microscope (SCM) combines an Atomic Force Microscope (AFM) with a 1-GHz tuned-LCR circuit to measure the capacitance between a conducting tip and sample. When applied to a semiconductor sample, an ac voltage at around 10 kHz is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31968



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