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You searched on: Author: nien zhang

Displaying records 51 to 60 of 68 records.
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51. Potentials of Online Scanning Electron Microscope Performance Analysis Using NIST Reference Material 8091
Published: 3/1/2000
Authors: Michael T Postek, Andras Vladar, Nien F Zhang, Robert D. Larrabee
Abstract: Fully automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an important aspect ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823128

52. Far-Infrared Transmittance and Reflectance of YBa^d2^Cu^d3^O^d7-x^ Films on Si Substrates
Published: 12/31/1999
Authors: A. R. Kumar, Nien F Zhang, V. A. Boychev, D. B. Tanner, Leila R Vale, David A Rudman
Abstract: The transmittance and reflectance of superconductive YBa^d2^Cu^d3^O^d7-{gamma} (YBCO) thin films deposited on Si substrates have been measured in the far-infrared frequency region from 10 to 100 cm^u-1^ (wavelength from 1000 to 100 micro {mu}) at tem ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=6104

53. Image Sharpness Measurement in Scanning Electron Microscope - Part III
Published: 7/1/1999
Authors: Samuel N Jones, Robert D. Larrabee, Michael T Postek, Andras Vladar, Nien F Zhang
Abstract: Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821795

54. Comparisons of Control Charts for Autocorrelated Data
Published: 1/1/1999
Author: Nien F Zhang
Abstract: Recently, statistical process control (SPC) methodolgies have been developed to accommodate autocorrelated data. A primary method to deal with autocorrelated data is the use of residual charts. Although this methodology has the advantage that it ca ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=151733

55. Heat Transfer Analysis and Modeling of a Cryogenic Laser Radiometer
Published: 12/1/1998
Authors: T J. Johnson, A. R. Kumar, Nien F Zhang, David J Livigni, Christopher L Cromer, Thomas Scott
Abstract: This study investigates the laser optimized cryogenic radiometer (LOCR) recently acquired by the National Institute of Standards and Technology in Boulder, Colorado, to calibrate laser power meters and detectors.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=6237

56. Blind Men and Elephants: Six Approaches to TREC Data
Published: 10/28/1998
Authors: D L. Banks, Paul Douglas Over, Nien F Zhang
Abstract: The paper reviews six recent efforts to better understand performance measurements on information retrieval (IR) within the framework of the Text REtrieval Conferences (TREC): analysis of variance, cluster analyses, rank correlations, beadplots, mil ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=151743

57. Thermal Characterization of a Cryogenic Radiometer and Comparison with a Laser Calorimeter
Published: 10/1/1998
Authors: David J Livigni, Christopher L Cromer, Thomas Scott, T J. Johnson, Nien F Zhang
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=21928

58. Statistical Measure for the Sharpness of the SEM Image
Published: 7/1/1997
Authors: Nien F Zhang, Michael T Postek, Robert D. Larrabee
Abstract: Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820884

59. Thermal Modeling and Analysis of Laser Calorimeters
Published: 6/1/1996
Authors: Nien F Zhang, David J Livigni, Richard D. Jones, Thomas Scott
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=10767

60. New Algorithm for the Measurement of Pitch in Metrology Instruments
Published: 5/1/1996
Authors: Nien F Zhang, Michael T Postek, Robert D. Larrabee, L Carroll, William J. Keery
Abstract: Traditionally, the measurement of pitch in metrology instruments is thought to be a benign self-compensating function. However, as the measurement uncertainty of metrology instruments is pushed to the nanometer level, evaluation of the performance of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820831



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