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Author: andras vladar
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1. 10 nm Three-Dimensional CD-SEM Metrology
Published: 4/10/2014
Authors: Andras Vladar, John S Villarrubia, Bin Ming, Regis J Kline, Jasmeet Chawla, Scott List
Abstract: The shape and dimensions of a challenging pattern have been measured using a model-based library scanning electron microscope (MBL SEM) technique. The sample consisted of a 4-line repeating pattern. Lines were narrow (10 nm), asymmetric (different ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915705

2. A Kurtosis-Based Statistical Measure for Two-Dimensional Processes and Its Applications to Image Sharpness
Published: 6/30/2003
Authors: Nien F Zhang, Andras Vladar, Michael T Postek, Robert D. Larrabee
Abstract: Fully automated or semiautomatic scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. It is required that these automated instruments be routinely capable of 3 nanometer (nm) or bett ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=50812

3. A Monte Carlo Model for SEM Linewidth Metrology
Published: 12/31/1994
Authors: J R. Lowney, Michael T Postek, Andras Vladar
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=1721

4. A Monte Carlo Model for SEM Linewidth Metrology
Published: 5/1/1994
Authors: J R. Lowney, Michael T Postek, Andras Vladar
Abstract: A scanning electron microscope (SEM) can be used to measure the dimensions of the microlithographic features of integrated circuits. However, without a good model of the electron-beam / specimen interaction, accurate edge location cannot be obtained. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820689

5. A New Way of Handling Dimensional Meaurement Results for Integrated Circuit Technology
Published: 6/1/2003
Authors: Andras Vladar, John S Villarrubia, Michael T Postek
Abstract: The international guidelines for correct expression of measurement results and errors call for a through assessment of the errors, their origin and behavior. The various dimensional measurement methods have different types of errors, different signa ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823159

6. A Simulation Study of Repeatability and Bias in the CD-SEM
Published: 5/1/2003
Authors: John S Villarrubia, Andras Vladar, Michael T Postek
Abstract: The ability of a critical dimension scanning electron microscope (CD-SEM) to resolve differences in the widths of two lines is determined by measurement repeatability and any sample-dependent biases. In order to ascertain the dependence of these quan ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822375

7. A Simulation Study of Repeatability and Bias in the CD-SEM
Published: 7/1/2005
Authors: John S Villarrubia, Andras Vladar, Michael T Postek
Abstract: Abstract: The ability of a critical dimension scanning electron microscope (CD-SEM) to resolve differences in the widths of two lines depends on the instrument?s measurement repeatability and any sample dependent biases. The dependence of repeatabil ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822536

8. APEX Method and Real-Time Blind Deconvolution of Scanning Electron Microscope Imagery
Published: 10/1/2002
Authors: Alfred S Carasso, David S. Bright, Andras Vladar
Abstract: Loss of resolution due to image blurring is a major concern in electron microscopy. The point spread function describing that blur is generally unknown. Wer discuss the use of a recently developed fast Fourier transform (FFT)-based direct (nonitera ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831241

9. Accurate Nanometer-Scale Imaging and Measurements with SEM
Published: 8/18/2011
Authors: Bradley N Damazo, Bin Ming, Premsagar Purushotham Kavuri, Andras Vladar, Michael T Postek
Abstract: Scanning electron microscopes (SEMs) are incredibly versatile instruments for millimeter to nanometer scale imaging and measurements of size and shape. New methods to improve repeatability and accuracy have been implemented on the so-called Referenc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909147

10. Active Monitoring and Control of Electron-Beam-Induced Contaminaition
Published: 8/1/2001
Authors: Andras Vladar, Michael T Postek, R Vane
Abstract: The vacuum system of all scanning electron microscopes (SEMs), even in the so-called clean instruments, have certain hydrocarbon residues that the vacuum pumps do not effectively remove. The cleanliness of the vacuum and the amount and nature of the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823135



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