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Author: andras vladar

Displaying records 121 to 130 of 150 records.
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121. Linewidth Measurement Intercomparison on a BESOI Sample
Published: 6/1/2000
Authors: John S Villarrubia, Andras Vladar, J R. Lowney, Michael T Postek, Richard A Allen, Michael W Cresswell, Rathindra Ghoshtagore
Abstract: The effect of the instrument on the measurement must be known in order to generate an accurate linewidth measurement. Although instrument models exist for a variety of techniques, how does one assess the accuracy of these models? Intercomparisons bet ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820989

122. Potentials of On-Line Scanning Electron Microscope Performance Analysis Using NIST Reference Material 8091
Published: 6/1/2000
Authors: Michael T Postek, Andras Vladar, Nien F Zhang, Robert D. Larrabee
Abstract: Fully automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an important aspect ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820975

123. Applications of SEM Monte Carlo Modeling to Geometry Determination in Single-Crystal Silicon Test Patterns
Published: 5/1/2000
Authors: John S Villarrubia, Andras Vladar, J R. Lowney, Samuel N Jones, Michael T Postek
Abstract: Width measurements pose a particularly problematic calibration problem. The measurement entails determining the distance between inherently dissimilar edges. Even in the simplest imaginable case, an ideal line of rectangular cross section, the left a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820987

124. SEM Sentinel - SEM Performance Measurement System, Part 1
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6498
Published: 4/1/2000
Authors: Alice V. Ling, Andras Vladar, Bradley N Damazo, M. Alkan Donmez, Michael T Postek
Abstract: This report describes the current design of a system for monitoring the performance of several major subsystems of a scanning electron microscope (SEM). The following subsystems and the associated functional parameters will be monitored. 1) Vacuum sy ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821786

125. Potentials of Online Scanning Electron Microscope Performance Analysis Using NIST Reference Material 8091
Published: 3/1/2000
Authors: Michael T Postek, Andras Vladar, Nien F Zhang, Robert D. Larrabee
Abstract: Fully automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an important aspect ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823128

126. Unified Advanced CD-SEM specification for Sub-0.18um Technology (1999 Version)
Published: 1/31/2000
Authors: J Allgair, C Archie, W Banke, H Bogardus, A Delaporte, Michael T Postek, J Schlesinger, B Singh, Andras Vladar, A Yanof
Abstract: The Advanced Metrology Advisory Group (AMAG) comprised of representatives from: the International SEMATECH (ISEMATECH) consortium member companies; the National Institute of Standards and Technology; and ISEMATECH assignees have joined to develop a u ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823125

127. Final Report, 1998-1999 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-Dimension Meetrology for Semiconductor Manufacturing
Published: 12/14/1999
Authors: Andras Vladar, Michael T Postek
Abstract: Beginning on or about January 15, 1999, researchers at the National Institute of Standards and Technology (NIST) received partial support from ISEMATECH to collaborate in a mutually defined program designated 1998-1999 NIST/ISEMATECH Collaboration fo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823124

128. Image Sharpness Measurement in Scanning Electron Microscope - Part III
Published: 7/1/1999
Authors: Samuel N Jones, Robert D. Larrabee, Michael T Postek, Andras Vladar, Nien F Zhang
Abstract: Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821795

129. Toward a Unified Advanced CD-SEM Specification for Sub 0.18 Micrometer Technology
Published: 6/1/1998
Authors: J Allgair, C Archie, W Banke, H Bogardus, J Griffith, H Marchman, Michael T Postek, L Saraf, J Schlesinger, B Singh, N. Sullivan, L Trimble, Andras Vladar, A Yanof
Abstract: The stringent critical dimension (CD) control requirements in cutting edge device facilities have placed significant demands on metrologists and upon the tools they use. We are developing a unified, advanced critical dimension scanning electron micro ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823089

130. Inverse Electron Beam Modeling and Metrology Research
Published: 4/1/1998
Authors: Michael T Postek, Andras Vladar, J R. Lowney, Robert D. Larrabee, William J. Keery
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821790



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