NIST logo

Publications Portal

You searched on:
Author: andras vladar

Displaying records 121 to 130 of 145 records.
Resort by: Date / Title


121. Unified Advanced CD-SEM specification for Sub-0.18um Technology (1999 Version)
Published: 1/31/2000
Authors: J Allgair, C Archie, W Banke, H Bogardus, A Delaporte, Michael T Postek, J Schlesinger, B Singh, Andras Vladar, A Yanof
Abstract: The Advanced Metrology Advisory Group (AMAG) comprised of representatives from: the International SEMATECH (ISEMATECH) consortium member companies; the National Institute of Standards and Technology; and ISEMATECH assignees have joined to develop a u ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823125

122. Final Report, 1998-1999 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-Dimension Meetrology for Semiconductor Manufacturing
Published: 12/14/1999
Authors: Andras Vladar, Michael T Postek
Abstract: Beginning on or about January 15, 1999, researchers at the National Institute of Standards and Technology (NIST) received partial support from ISEMATECH to collaborate in a mutually defined program designated 1998-1999 NIST/ISEMATECH Collaboration fo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823124

123. Image Sharpness Measurement in Scanning Electron Microscope - Part III
Published: 7/1/1999
Authors: Samuel N Jones, Robert D. Larrabee, Michael T Postek, Andras Vladar, Nien F Zhang
Abstract: Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821795

124. Toward a Unified Advanced CD-SEM Specification for Sub 0.18 Micrometer Technology
Published: 6/1/1998
Authors: J Allgair, C Archie, W Banke, H Bogardus, J Griffith, H Marchman, Michael T Postek, L Saraf, J Schlesinger, B Singh, N. Sullivan, L Trimble, Andras Vladar, A Yanof
Abstract: The stringent critical dimension (CD) control requirements in cutting edge device facilities have placed significant demands on metrologists and upon the tools they use. We are developing a unified, advanced critical dimension scanning electron micro ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823089

125. Inverse Electron Beam Modeling and Metrology Research
Published: 4/1/1998
Authors: Michael T Postek, Andras Vladar, J R. Lowney, Robert D. Larrabee, William J. Keery
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821790

126. Final Report, 1997-1998 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-dimension Metrology for Semiconductor Manufacturing
Published: 3/30/1998
Authors: Andras Vladar, Michael T Postek
Abstract: Beginning on or about April 1, 1997, the National Institute of Standards and Technology (NIST) received partial support from SEMATECH to collaborate in a program designated 1997-1998 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critic ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823100

127. Image Sharpness Measurement in Scanning Electron Microscopy - Part I
Published: 1/1/1998
Authors: Michael T Postek, Andras Vladar
Abstract: This study introduces the idea of the sharpness concept in relationship to the determination of scanning electron microscope (SEM) perfomance. Scanning electron microscopes are routinely used in many manufacturing environments. Fully automated or sem ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820906

128. Fourier Transform Feedback for Scanning Electron Microscopes Used in Semiconductor Metrology
Published: 7/1/1997
Authors: Michael T Postek, Andras Vladar, M P Davidson
Abstract: The utility of the sharpness concept for use on metrology scanning electron microscopes (SEM) as implemented through the Fourier transform technique has been clearly demonstrated and documented. The original methods for sharpness analysis were labor- ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820866

129. Inexpensive Digital Imaging?
Published: 6/1/1997
Authors: Michael T Postek, Andras Vladar
Abstract: The capture of digital images through the use of a frame grabber provides tremendous advantages to scanning electron microscopy. Accessory frame grabbers can range in price from very inexpensive to several thousand dollars. This work investigates the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820865

130. Performance Analysis Tool for Scanning Electron Microscopes Used in Semiconductor Metrology
Published: 4/1/1997
Authors: Michael T Postek, Andras Vladar, M P Davidson
Abstract: Scanning electron microscopes (SEM) are being utilized extensively in the production environment, and these instruments are approaching full automation. Once a human operator is no longer monitoring the instrument''s performance and multiple instrume ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820867



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series