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You searched on: Author: andras vladar

Displaying records 121 to 130 of 163 records.
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121. SEM Sentinel-SEM Performance Measurement System
Published: 8/1/2001
Authors: Bradley N Damazo, Andras Vladar, Alice V. Ling, M Alkan Donmez, Michael T Postek, Crossley E Jayewardene
Abstract: This paper describes the design and implementation of a system for monitoring the performance of a critical dimension measurement scanning electron microscope (CD-SEM). Experiments were performed for tests involving diagnosis of the vacuum system and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821586

122. Critical Dimension Metrology in the Scanning Electron Microscope
Published: 6/29/2001
Authors: Michael T Postek, Andras Vladar
Abstract: Metrology is a principal enabler for the development and manufacture of current and future generations of semiconductor devices. With the potential of 130, 100 nanometer and even smaller linewidths and high aspect ratio structures, the scanning elect ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820972

123. Report of Investigation: Reference Material 8091 - Scanning Electron Microscope Sharpness Standard
Published: 5/10/2001
Authors: Michael T Postek, Andras Vladar, Robert D. Larrabee
Abstract: Reference Material (RM 8091) is intended primarily for use in checking the sharpness performance of scanning electron microscopes. It is supplied as a small (2 rnrn x 2 rnm) diced semiconductor chip. This sample is capable of being mounted directly ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821789

124. Shape-Sensitive Linewidth Measurement with the SEM Using a Model-Based Library
Published: 3/1/2001
Authors: John S Villarrubia, Andras Vladar, J R. Lowney, Michael T Postek
Abstract: In semiconductor electronics manufacturing, device performance often depends upon size. For example, microprocessor speed is linked to the width of transistor gates. Accurate measurement of feature width is an important but challenging problem. When ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821590

125. NIST/SEMATECH Collaboration: Application of Nano-Tips to Production CD-SEMs
Published: 1/1/2001
Authors: Andras Vladar, Michael T Postek
Abstract: This is the final report of a two-part study about the application of nano-tips to critical dimension (CD) scanning electron microscope (SEMs) used in integrated circuit production. Nano-tips are essentially very sharp electron emitter tips that offe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822430

126. SEM Sentinel - SEM Performance Measurement System
Published: 1/1/2001
Authors: Bradley N Damazo, Andras Vladar, Alice V. Ling, M Alkan Donmez, Michael T Postek, Crossley E Jayewardene
Abstract: This paper describes the design and implementation of a system for monitoring the performance of a critical dimension measurement scanning electron microscope (CD-SEM). Experiments were performed for tests involving diagnosis of the vacuum system an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823137

127. Linewidth Measurement Intercomparison on a BESOI Sample
Published: 12/31/2000
Authors: A. E. Villarrubia, Andras Vladar, J R. Lowney, Michael T Postek, Richard A Allen, Michael W. Cresswell, Rathindra Ghoshtagore
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=2684

128. NIST/SEMATECH Collaboration: Application of Nano-Tips to Production CD-SEMs
Published: 11/15/2000
Authors: Andras Vladar, Michael T Postek
Abstract: This work documents the first part of a two-part study about the application of nano-tips to critical dimension (CD) scanning electron microscopes used in integrated circuit production.  Nano-tips, by comparison to all conventional cold, thermal ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823133

129. Linewidth Intercomparison on a Polysilicon Sample
Published: 11/1/2000
Authors: John S Villarrubia, Andras Vladar, Michael T Postek, Ronald G Dixson
Abstract: Not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821574

130. Benchmarking of Advanced CD-SEMs Against the New Unified Specification for Sub-0.18 Micrometer Lithography
Published: 8/18/2000
Authors: A Deleporte, J Allgair, C Archie, G Banke, Michael T Postek, J Schlesinger, Andras Vladar, A Yanof
Abstract: The Advanced Metrology Advisory Group (AMAG) comprised of representatives from International SEMATECH consortium member companies and the National Institute of Standards and Technology have joined to develop a new unified specification for an advance ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824620



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