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Author: andras vladar

Displaying records 121 to 130 of 148 records.
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121. Applications of SEM Monte Carlo Modeling to Geometry Determination in Single-Crystal Silicon Test Patterns
Published: 5/1/2000
Authors: John S Villarrubia, Andras Vladar, J R. Lowney, Samuel N Jones, Michael T Postek
Abstract: Width measurements pose a particularly problematic calibration problem. The measurement entails determining the distance between inherently dissimilar edges. Even in the simplest imaginable case, an ideal line of rectangular cross section, the left a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820987

122. SEM Sentinel - SEM Performance Measurement System, Part 1
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6498
Published: 4/1/2000
Authors: Alice V. Ling, Andras Vladar, Bradley N Damazo, M Alkan Donmez, Michael T Postek
Abstract: This report describes the current design of a system for monitoring the performance of several major subsystems of a scanning electron microscope (SEM). The following subsystems and the associated functional parameters will be monitored. 1) Vacuum sy ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821786

123. Potentials of Online Scanning Electron Microscope Performance Analysis Using NIST Reference Material 8091
Published: 3/1/2000
Authors: Michael T Postek, Andras Vladar, Nien F Zhang, Robert D. Larrabee
Abstract: Fully automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an important aspect ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823128

124. Unified Advanced CD-SEM specification for Sub-0.18um Technology (1999 Version)
Published: 1/31/2000
Authors: J Allgair, C Archie, W Banke, H Bogardus, A Delaporte, Michael T Postek, J Schlesinger, B Singh, Andras Vladar, A Yanof
Abstract: The Advanced Metrology Advisory Group (AMAG) comprised of representatives from: the International SEMATECH (ISEMATECH) consortium member companies; the National Institute of Standards and Technology; and ISEMATECH assignees have joined to develop a u ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823125

125. Final Report, 1998-1999 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-Dimension Meetrology for Semiconductor Manufacturing
Published: 12/14/1999
Authors: Andras Vladar, Michael T Postek
Abstract: Beginning on or about January 15, 1999, researchers at the National Institute of Standards and Technology (NIST) received partial support from ISEMATECH to collaborate in a mutually defined program designated 1998-1999 NIST/ISEMATECH Collaboration fo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823124

126. Image Sharpness Measurement in Scanning Electron Microscope - Part III
Published: 7/1/1999
Authors: Samuel N Jones, Robert D. Larrabee, Michael T Postek, Andras Vladar, Nien F Zhang
Abstract: Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821795

127. Toward a Unified Advanced CD-SEM Specification for Sub 0.18 Micrometer Technology
Published: 6/1/1998
Authors: J Allgair, C Archie, W Banke, H Bogardus, J Griffith, H Marchman, Michael T Postek, L Saraf, J Schlesinger, B Singh, N. Sullivan, L Trimble, Andras Vladar, A Yanof
Abstract: The stringent critical dimension (CD) control requirements in cutting edge device facilities have placed significant demands on metrologists and upon the tools they use. We are developing a unified, advanced critical dimension scanning electron micro ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823089

128. Inverse Electron Beam Modeling and Metrology Research
Published: 4/1/1998
Authors: Michael T Postek, Andras Vladar, J R. Lowney, Robert D. Larrabee, William J. Keery
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821790

129. Final Report, 1997-1998 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-dimension Metrology for Semiconductor Manufacturing
Published: 3/30/1998
Authors: Andras Vladar, Michael T Postek
Abstract: Beginning on or about April 1, 1997, the National Institute of Standards and Technology (NIST) received partial support from SEMATECH to collaborate in a program designated 1997-1998 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critic ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823100

130. Image Sharpness Measurement in Scanning Electron Microscopy - Part I
Published: 1/1/1998
Authors: Michael T Postek, Andras Vladar
Abstract: This study introduces the idea of the sharpness concept in relationship to the determination of scanning electron microscope (SEM) perfomance. Scanning electron microscopes are routinely used in many manufacturing environments. Fully automated or sem ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820906



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