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Author: john villarrubia

Displaying records 51 to 60 of 88 records.
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51. Is a Production Level Scanning Electron Microscope Linewidth Standard Possible?
Published: 6/1/2000
Authors: Michael T Postek, Andras Vladar, John S Villarrubia
Abstract: Metrology will remain a pricipal enabler for the development and manufacture of future generations of semiconductor devices. With the potential of 130 nm and 100 nm linewidths and high aspect ratio structures, the scanning electron microscope (SEM) r ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823127

52. Is a Production-Level Scanning Electron Microscope Linewidth Standard Possible?
Published: 6/1/2000
Authors: Michael T Postek, Andras Vladar, John S Villarrubia
Abstract: Metrology will remain a principal enabler for the development and manufacture of future generations of semiconductor devices. With the potential of 130 and l00-nanometer linewidths and high aspect ratio structures, the scanning electron microscope (S ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820974

53. Linewidth Measurement Intercomparison on a BESOI Sample
Published: 6/1/2000
Authors: John S Villarrubia, Andras Vladar, J R. Lowney, Michael T Postek, Richard A Allen, Michael W Cresswell, Rathindra Ghoshtagore
Abstract: The effect of the instrument on the measurement must be known in order to generate an accurate linewidth measurement. Although instrument models exist for a variety of techniques, how does one assess the accuracy of these models? Intercomparisons bet ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820989

54. Recent Progress in Nanoscale Indentation of Polymers Using the AFM
Published: 6/1/2000
Authors: Mark R VanLandingham, John S Villarrubia, G F Meyers
Abstract: Regardless of the type of test, reliable indentation measurements require knowledge of the shape of the indenter tip. For indentation measurements involving sub-micrometer scale contacts, accurate knowledge of the tip shape can be difficult to achie ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=860274

55. Applications of SEM Monte Carlo Modeling to Geometry Determination in Single-Crystal Silicon Test Patterns
Published: 5/1/2000
Authors: John S Villarrubia, Andras Vladar, J R. Lowney, Samuel N Jones, Michael T Postek
Abstract: Width measurements pose a particularly problematic calibration problem. The measurement entails determining the distance between inherently dissimilar edges. Even in the simplest imaginable case, an ideal line of rectangular cross section, the left a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820987

56. Molecular Measuring Machine Design and Measurements
Published: 5/1/2000
Authors: John A Kramar, Jay Shi Jun, William B. Penzes, Fredric Scire, E Clayton Teague, John S Villarrubia
Abstract: We at the National Institute of Standards and Technology are building a metrology instrument called the Molecular Measuring Machine (M3) with the goal of performing nanometer-accuracy, two-dimensional, point-to-point measurements over a 50 mm by 50 m ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821763

57. Advancing Nanoscale Indentation Measurements Toward Quantitative Characterization of Polymer Properties
Published: 1/1/2000
Authors: Mark R VanLandingham, John S Villarrubia, G Meyers, M Dineen
Abstract: The ultimate objective of instrumented indentation testing is to obtain absolute measurements of material properties and behavior. To achieve this goal, accurate knowledge of the shape of the indenter tip is required. For indentation measurements inv ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820986

58. Experimental Test of Blind Tip Reconstruction for Scanning Probe Microscopy
Published: 1/1/2000
Authors: Samuel Dongmo, John S Villarrubia, Samuel N Jones, Thomas B Renegar, Michael T Postek, Jun-Feng Song
Abstract: Determination of the tip geometry is a prerequisite to converting the scanning probe microscope (SPM) from a simple imaging instrument to a tool that can perform width measurements accurately. Recently we developed blind reconstruction, a method to c ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820960

59. Final Report: 1998-1999 NIST/SEMATECH Project on Intercomparison of Linewidth Measurement Methods
Published: 1/1/2000
Authors: John S Villarrubia, Ronald G Dixson, Samuel N Jones, J R. Lowney, Michael T Postek
Abstract: Abstract unavailable.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820988

60. Nanoindentation of Polymers: Tip Shape Calibration and Uncertainty Issues
Published: 1/1/2000
Authors: Mark R VanLandingham, John S Villarrubia, G Meyers
Abstract: Indentation measurements made with atomic force microscopy (AFM) probes are relative measurements, largely due to the lack of information regarding the tip shape of the AFM probes. Also, current tip shape calibration procedures used in depth-sensing ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820984



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