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Author: benjamin tsai

Displaying records 11 to 20 of 96 records.
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11. In Situ Calibration of Lightpipe Radiometers in Rapid Thermal Processing Between 300 C to 700 C
Published: 9/15/2004
Authors: William Andrew Kimes, Kenneth Gruber Kreider, Dean C Ripple, Benjamin K Tsai
Abstract: Many Rapid Thermal Processing (RTP) tools are currently monitored and controlled with lightpipe radiometers (LPRTs), which have been limited to measuring temperatures above 500 C because of the low signal level below 500 C. New commercial LPRTs co ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830903

12. Emissivity Compensated Pyrometry for Specular Silicon Surfaces on the NIST RTP Test Bed
Published: 9/1/2004
Authors: Benjamin K Tsai, J Bodycomb, D P DeWitt, Kenneth Gruber Kreider, William Andrew Kimes
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841857

13. Comparing the Transient Response of a Resistive-Type Sensor With a Thin Film Thermocouple During the Post-Exposure Bake Process
Published: 4/1/2004
Authors: Kenneth Gruber Kreider, D P DeWitt, J B Fowler, J E Proctor, William Andrew Kimes, Dean C Ripple, Benjamin K Tsai
Abstract: Recent studies on dynamic temperature profiling and lithographic performance modeling of the post-exposure bake (PEB) process have demonstrated that the rate of heating and cooling may have an important influence on resist lithographic response. Gen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830864

14. Comparing the Transient Response of a Resistive-Type Sensor with a Thin-Film Thermocouple During the Post-Exposure Bake Process, Data Analysis and Modeling for Process Control
Published: 1/1/2004
Authors: K G Kreider, D P DeWitt, J B Fowler, J E Proctor, W A. Kimes, D C Ripple, Benjamin K Tsai
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104578

15. Emissivity Compensated Pyrometry for Specular Silicon Surfaces on the NIST RTP Test Bed
Published: 1/1/2004
Authors: Benjamin K Tsai, J Bodycomb, D P DeWitt, K G Kreider, W A. Kimes
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104787

16. Emissivity Compensated Pyrometry for Specular Silicon Surfaces on the NIST RTP Test Bed
Published: 1/1/2004
Authors: J Bodycomb, D P DeWitt, W A. Kimes, K G Kreider, Benjamin K Tsai
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104323

17. Heat-Flux Sensor Calibration
Series: Special Publication (NIST SP)
Published: 1/1/2004
Authors: Benjamin K Tsai, Charles E Gibson, M V Annageri, D P DeWitt, Robert D. Saunders
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104786

18. In Situ Calibration of Lightpipe Radiometers for Rapid Thermal Processing between 300 {degree} C to 700 {degree} C
Published: 1/1/2004
Authors: W A. Kimes, K G Kreider, D C Ripple, Benjamin K Tsai
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104572

19. Calibration of Radiation Thermometers in Rapid Thermal Processing Tools Using Si Wafers with Thin Film Thermocouples
Published: 10/1/2003
Authors: Kenneth Gruber Kreider, William Andrew Kimes, Christopher W Meyer, Dean C Ripple, Benjamin K Tsai, D H Chen, D P DeWitt
Abstract: Rapid thermal processing (RTP) tools are currently monitored and controlled with lightpipe radiation thermometers (LPRTs) which have been calibrated with thermocouple instrumented wafers. We have developed a thin-film thermocouple wafer that enables ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830794

20. Characterization and Calibration of Lightpipe Radiation Thermometers for Use in Rapid Thermal Processing
Published: 9/1/2003
Authors: Benjamin K Tsai, D P DeWitt
Abstract: Lightpipe radiation thermometers (LPRTs) are the sensor of choice for temperature measurements in Rapid Thermal Processing (RTP) applications. At the National Institute of Standards and Technology (NIST), we have developed protocols for calibrating ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841652



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