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You searched on: Author: charles tarrio

Displaying records 11 to 20 of 106 records.
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11. A Novel Wafer-plane Dosimeter for EUV Lithography
Published: 11/1/2009
Authors: Steven E Grantham, Charles S Tarrio
Abstract: Extreme Ultraviolet Lithography (EUVL) incorporates 13.5 nm light for patterning wafers and requires in-situ wafer-plane dosimetry that can be tailored to the requirements of an EUVL stepper‰s environment. There are several types of detectors that a ...

12. Tracking down sources of carbon contamination in EUVL exposure tools
Published: 8/3/2009
Authors: Charles S Tarrio, Robert Edward Vest, Thomas B Lucatorto, R. Caudillo
Abstract: Optics in EUVL exposure tools are known to suffer reflectivity degradation, mostly from the buildup of carbon. The sources of this carbon have been difficult to identify. Vacuum cleanliness is normally monitored with a residual gas analyzer, but th ...

13. At-Wavelength Metrology for EUV Lithography at NIST
Published: 7/14/2009
Authors: Charles S Tarrio, Steven E Grantham, Robert Edward Vest, Thomas B Lucatorto
Abstract: The National Institute of Standards and Technology (NIST) is active in many areas of metrology impacting extreme ultraviolet lithography. We will describe our activities in the areas of reflectometry, pulsed radiometry, and long-term multiplayer mir ...

14. Method for the characterization of extreme-ultraviolet photoresist outgassing
Published: 5/1/2009
Author: Charles S Tarrio
Abstract: Outgassing from photoresists illuminated by extreme ultraviolet radiation can lead to degradation of the very expensive multilayer- coated optics in an extreme ultraviolet stepper. Reliable quantification of the various organic molecules outgassed b ...

15. EUVL dosimetry at NIST
Published: 3/13/2009
Authors: Charles S Tarrio, Steven E Grantham, Marc J Cangemi, Robert Edward Vest, Thomas B Lucatorto, Noreen Harned
Abstract: As part of its role in providing radiometric standards in support of industry, NIST has been active in advancing extreme ultraviolet dosimetry on various fronts. Recently, we undertook a major effort in accurately measuring the sensitivity of three ...

16. Quantitative Measurement of Outgas Products From EUV Photoresists
Published: 3/14/2008
Authors: Charles S Tarrio, Bruce A Benner Jr, Robert Edward Vest, Steven E Grantham, Shannon Bradley Hill, Thomas B Lucatorto, Jay H Hendricks, Patrick J Abbott, Greg Denbeaux, Alin Antohe, Chimaobi Mbanaso, Kevin Orbek
Abstract: The photon-stimulated emission of organic molecules from the photoresist during exposure is a serious problem for extreme- ultraviolet lithography (EUVL) because the adsorption of the outgassing products on the EUV optics can lead to carbonization an ...

17. Metrology for EUV Lithography Sources and Tools
Published: 7/3/2006
Authors: Steven E Grantham, Charles S Tarrio, Robert Edward Vest, Thomas B Lucatorto

18. EUV testing of multilayer mirrors: critical issues
Published: 1/1/2006
Authors: Shannon Bradley Hill, I Ermanoski, Steven E Grantham, Charles S Tarrio, Thomas B Lucatorto, T. E Madey, S Bajt, M Chandhok, P Yan, Obert Wood, S Wurm, N V Edwards

19. Effect of xenon bombardment on ruthenium coated grazing incidence collector lifetime for EUV lithography,
Published: 1/1/2006
Authors: M Nieto, J P Allain, V Titov, M R Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles S Tarrio, Yaniv Barad, Steven E Grantham, Thomas B Lucatorto, Bryan Rice

20. Metrology for EUVL Sources and Tools,ed. by V. Bakshi
Published: 1/1/2006
Authors: S Grantham, Charles S Tarrio, Robert Edward Vest, Thomas B Lucatorto

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