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You searched on: Author: richard silver

Displaying records 101 to 110 of 121 records.
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101. Optical Linewidth Models - Then and Now
Published: 3/1/1999
Authors: Robert D. Larrabee, Richard M Silver, M P Davidson
Abstract: In the late 1970's Dr. Diana Nyyssonen demonstrated that the National Institute of Standards and Technology (NIST) could optically calibrate photomask linewidth standards that were narrower than the classical resolution limit of a conventional bright ...

102. Developing a Method to Determine Linewidth Based on Counting the Atom-Spacings Across a Line
Published: 6/1/1998
Authors: Richard M Silver, Carsten P. Jensen, V W. Tsai, Joseph Fu, John S Villarrubia, E Clayton Teague
Abstract: We are developing the instrumentation and prototype samples at NIST to enable the counting of atom-spacings across linewidth features etched in silicon. This is an effort to allow the accurate counting of atom-spacings across a feature in a controlle ...

103. Technical Directions of the NIST Precision Engineering Division: 1997-2001
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6218
Published: 1/1/1998
Authors: Dennis A Swyt, Howard H. Harary, Michael T Postek, Richard M Silver, Theodore Vincent Vorburger
Abstract: This report, based on U.S. industry roadmaps and related National Institute of Standards and Technology studies, is a product of the process of strategic planning for the NIST Precision Engineering Division (PED) and presents the major technological ...

104. The Study of Silicon Stepped Surfaces as Atomic Force Microscope Calibration Standards With a Calibrated AFM at NIST
Published: 1/1/1998
Authors: V W. Tsai, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, R Koning, Richard M Silver, E. C. Williams
Abstract: Due to the limitations of modern manufacturing technology, there is no commercial height artifact at the sub-nanometer scale currently available. The single-atom steps on a cleaned silicon (111) surface with a height of 0.314 nm, derived from the lat ...

105. A Method to Characterize Overlay Tool Misalignments and Distortions
Published: 7/1/1997
Authors: Richard M Silver, James Edward Potzick, Fredric Scire, Christopher J. Evans, Michael L McGlauflin, Edward A Kornegay, Robert D. Larrabee
Abstract: A new optical alignment artifact under development at NIST is described. This structure, referred to as a stepped microcone, is designed to assist users and manufacturers of overlay metrology tools in the reduction of tool-induced measurement errors. ...

106. Benchmarking the Length Measurement Capabilities of the National Institute of Standards and Technology
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6036
Published: 1/1/1997
Authors: Richard M Silver, J Land, Jack A Stone Jr., Ronald G Dixson, Bryon S. Faust, James Edward Potzick, Michael T Postek, et al
Abstract: A cross-section of measurements from the Precision Engineering Division within the National Institute of Standards and Technology is benchmarked against other leading National Measurement Institutes. We present a variety of length-related calibration ...

107. Experimental Results of Blind Reconstruction of STM Tips
Published: 1/1/1997
Authors: Carsten P. Jensen, Richard M Silver, John S Villarrubia
Abstract: Abstract not available.

108. High Accuracy Overlay Measurements
Published: 5/1/1996
Authors: Richard M Silver, James Edward Potzick, Fredric Scire, Robert D. Larrabee
Abstract: The reduced critical dimensions of semiconductor devices place more stringent requirements on the precision and accuracy of overlay metrology tools used to monitor stepper feature placement. The use of mix and match stepper techniques and step and sc ...

109. Height Calibration of Atomic Force Microscopes Using Silicon Atomic Step Artifacts
Published: 1/1/1996
Authors: V W. Tsai, Theodore Vincent Vorburger, P Sullivan, Ronald G Dixson, Richard M Silver, Edwin Ross Williams, J Schneir
Abstract: The decreasing feature dimensions required in the semiconductor manufacturing industry are placing ever increasing demands upon metrology instruments. Atomic force microscopes (AFMs), which can have ~1 nm lateral resolution and sub-angstrom vertical ...

110. Optical Overlay Metrology at NIST
Published: 1/1/1996
Authors: Richard M Silver, Amy Singer, L Carroll, S Berg-cross, James Edward Potzick
Abstract: Many of the significant challenges in making accurate overlay registration measurements are discussed. An understanding of the causes of the errors affecting these measurements is a prerequisite to improving accuracy and also for the design of standa ...

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