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Author: vivek prabhu

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71. Chemically Amplified Resist Fundamentals Studies by Combinatorial approaches
Published: 3/1/2003
Authors: M Wang, Vivek M Prabhu, Eric K Lin, Michael J Fasolka, Alamgir Karim
Abstract: Sub-100 nm lithography requires more understanding of photoresist material properties and processing conditions to achieve necessary critical dimension control of patterned structures. As resist thickness and feature linewidth decrease, fundamental ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852278

72. Polymer Dynamics and Diffusive Properties in Ultra-Thin Photoresist Films
Published: 2/1/2003
Authors: Christopher Soles, Ronald Leland Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Vivek M Prabhu, Wen-Li Wu, Eric K Lin, D L Goldfarb, M Angelopoulos
Abstract: A series of experiments are presented to demonstrate thin film confinement effects on the diffusive properties in poly(tert-butoxycarboxystyrene) (PBOCSt). Bilayer diffusion couple measurements reveal that as the thickness of a PBOCSt film is decrea ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852201

73. Polyelectrolyte Effects in Model Photoresist Developer Solutions: Roles of Base Concentration and Added Salts
Published: 1/1/2003
Authors: Vivek M Prabhu, Ronald Leland Jones, Eric K Lin, Christopher Soles, Wen-Li Wu, D L Goldfarb, M Angelopoulos
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853867

74. Reaction Front Induced Roughness in Chemically Amplified Photoresists
Published: 8/1/2002
Authors: Vivek M Prabhu, Ronald Leland Jones, Eric K Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Christopher Soles, Wen-Li Wu, D L Goldfarb, M Angelopoulos
Abstract: We have examined, with tapping mode atomic force microscopy(AFM), the effect of post-exposure bake times and developer on surface roughness using model bilayer interfaces of deuterium-labeled poly(tert-butyloxycarbonyloxy styrene) and poly(hydroxysty ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852008

75. Additive-Containing Rinses for LER and Defectivity Control During High-Resolution Resist Patterning
Published: Date unknown
Authors: D L Goldfarb, S D Burns, M Angelopolous, S Skordas, R L Burns, M C Lawson, C J Brodsky, V Vishnu, E Jablonski, Vivek M Prabhu, Ronald Leland Jones, B D. Vogt, Christopher Soles, Eric K Lin, Wen-Li Wu
Abstract: The addition of a surface conditioning agent to the de-ionized water rinse used to quench the photoresist development process is an attractive methodology that can afford a controlled decrease in resist line edge roughness (LER) or a reduction in def ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852849

76. Chemical Force Microscopy for Imaging Chemical Distributions in Undeveloped Resists
Published: Date unknown
Authors: John Taylor Woodward IV, Jeeseong Hwang, Bryan D. Vogt, Vivek M Prabhu, Eric K Lin, Kwang-Woo Choi, Harun Solak, Michael Leeson
Abstract: Controlling line width roughness (LWR) is a critical problem in the development of EUV resists. Contributing to the difficulty of reducing LWR is the limited knowledge of the nanoscale morphology of the resist film throughout the process. Generally ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841144

77. Fluorescence Correlation Spectroscopy Investigation of Growth Factor Dynamics in Three Dimensional Extracellular Matrices
Published: Date unknown
Authors: Michael Weir, Chengqing C. Wang, Vivek M Prabhu, Eric K Lin, K Yamada, N Washburn
Abstract: Fluorescence correlation spectroscopy was used to measure the binding and diffusion of growth factors in model extracellular matrices in order to investigate the importance of protein-matrix interactions in regulating signaling molecules within a thr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852367

78. Photoacid Generator Dispersion in Partially Fluorinated Photoresist Polymers and their Blends
Published: Date unknown
Authors: David Lloyd VanderHart, Vivek M Prabhu
Abstract: Solid state proton NMR methods are used to probe the intimacy of mixing in materials relevant to photoresist applications. Bulk blends, made solvent casting, consisted of partially fluorinated polymers and the photoacid generator, di(t-butylphenyl) ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852494



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